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Title: Thin film confinement reduces compatibility in symmetric ternary block copolymer/homopolymer blends: Thin Film Confinement Reduces Compatibility in Symmetric Ternary Block Copolymer/Homopolymer Blends

Authors:
 [1] ;  [2] ;  [1] ;  [1] ;  [1] ; ORCiD logo [1]
  1. Department of Chemical and Biomolecular Engineering, Tulane University, New Orleans Louisiana 70118
  2. X-Ray Science Division, Argonne National Laboratory, Argonne Illinois 60439
Publication Date:
Grant/Contract Number:
AC02-06CH11357
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Polymer Science. Part B, Polymer Physics
Additional Journal Information:
Journal Name: Journal of Polymer Science. Part B, Polymer Physics; Journal ID: ISSN 0887-6266
Publisher:
Wiley Blackwell (John Wiley & Sons)
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1472190

Uddin, Md Fakar, Jiang, Zhang, Raymond, Andrew, Goodson, Amy D., Lwoya, Baraka S., and Albert, Julie N. L.. Thin film confinement reduces compatibility in symmetric ternary block copolymer/homopolymer blends: Thin Film Confinement Reduces Compatibility in Symmetric Ternary Block Copolymer/Homopolymer Blends. United States: N. p., Web. doi:10.1002/polb.24732.
Uddin, Md Fakar, Jiang, Zhang, Raymond, Andrew, Goodson, Amy D., Lwoya, Baraka S., & Albert, Julie N. L.. Thin film confinement reduces compatibility in symmetric ternary block copolymer/homopolymer blends: Thin Film Confinement Reduces Compatibility in Symmetric Ternary Block Copolymer/Homopolymer Blends. United States. doi:10.1002/polb.24732.
Uddin, Md Fakar, Jiang, Zhang, Raymond, Andrew, Goodson, Amy D., Lwoya, Baraka S., and Albert, Julie N. L.. 2018. "Thin film confinement reduces compatibility in symmetric ternary block copolymer/homopolymer blends: Thin Film Confinement Reduces Compatibility in Symmetric Ternary Block Copolymer/Homopolymer Blends". United States. doi:10.1002/polb.24732.
@article{osti_1472190,
title = {Thin film confinement reduces compatibility in symmetric ternary block copolymer/homopolymer blends: Thin Film Confinement Reduces Compatibility in Symmetric Ternary Block Copolymer/Homopolymer Blends},
author = {Uddin, Md Fakar and Jiang, Zhang and Raymond, Andrew and Goodson, Amy D. and Lwoya, Baraka S. and Albert, Julie N. L.},
abstractNote = {},
doi = {10.1002/polb.24732},
journal = {Journal of Polymer Science. Part B, Polymer Physics},
number = ,
volume = ,
place = {United States},
year = {2018},
month = {9}
}

Works referenced in this record:

Block Copolymer Lithography
journal, November 2013
  • Bates, Christopher M.; Maher, Michael J.; Janes, Dustin W.
  • Macromolecules, Vol. 47, Issue 1, p. 2-12
  • DOI: 10.1021/ma401762n

Controlling Polymer-Surface Interactions with Random Copolymer Brushes
journal, March 1997

Self-assembly of block copolymer thin films
journal, June 2010

Polymer-Polymer Phase Behavior
journal, February 1991

Block Copolymer Lithography: Merging “Bottom-Up” with “Top-Down” Processes
journal, December 2005
  • Hawker, Craig J.; Russell, Thomas P.
  • MRS Bulletin, Vol. 30, Issue 12, p. 952-966
  • DOI: 10.1557/mrs2005.249