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Title: X-ray diffraction gratings: Precise control of ultra-low blaze angle via anisotropic wet etching

Abstract

Here, diffraction gratings are used from micron to nanometer wavelengths as dispersing elements in optical instruments. At shorter wavelengths, crystals can be used as diffracting elements, but due to the 3D nature of the interaction with light are wavelength selective rather than wavelength dispersing. There is an urgent need to extend grating technology into the x-ray domain of wavelengths from 1 to 0.1 nm, but this requires the use of gratings that have a faceted surface in which the facet angles are very small, typically less than 1°. Small facet angles are also required in the extreme ultra-violet and soft x-ray energy ranges in free electron laser applications, in order to reduce power density below a critical damage threshold. In this work, we demonstrate a technique based on anisotropic etching of silicon designed to produce very small angle facets with a high degree of perfection.

Authors:
 [1];  [2];  [1];  [1];  [1];  [1]
  1. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
  2. Univ. of California, Berkeley, CA (United States)
Publication Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1472027
Alternate Identifier(s):
OSTI ID: 1275973
Grant/Contract Number:  
AC02-05CH11231
Resource Type:
Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 109; Journal Issue: 4; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics (AIP)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY

Citation Formats

Voronov, Dmitriy L., Lum, Paul, Naulleau, Patrick, Gullikson, Eric M., Fedorov, Alexei V., and Padmore, Howard A. X-ray diffraction gratings: Precise control of ultra-low blaze angle via anisotropic wet etching. United States: N. p., 2016. Web. doi:10.1063/1.4960203.
Voronov, Dmitriy L., Lum, Paul, Naulleau, Patrick, Gullikson, Eric M., Fedorov, Alexei V., & Padmore, Howard A. X-ray diffraction gratings: Precise control of ultra-low blaze angle via anisotropic wet etching. United States. doi:10.1063/1.4960203.
Voronov, Dmitriy L., Lum, Paul, Naulleau, Patrick, Gullikson, Eric M., Fedorov, Alexei V., and Padmore, Howard A. Mon . "X-ray diffraction gratings: Precise control of ultra-low blaze angle via anisotropic wet etching". United States. doi:10.1063/1.4960203. https://www.osti.gov/servlets/purl/1472027.
@article{osti_1472027,
title = {X-ray diffraction gratings: Precise control of ultra-low blaze angle via anisotropic wet etching},
author = {Voronov, Dmitriy L. and Lum, Paul and Naulleau, Patrick and Gullikson, Eric M. and Fedorov, Alexei V. and Padmore, Howard A.},
abstractNote = {Here, diffraction gratings are used from micron to nanometer wavelengths as dispersing elements in optical instruments. At shorter wavelengths, crystals can be used as diffracting elements, but due to the 3D nature of the interaction with light are wavelength selective rather than wavelength dispersing. There is an urgent need to extend grating technology into the x-ray domain of wavelengths from 1 to 0.1 nm, but this requires the use of gratings that have a faceted surface in which the facet angles are very small, typically less than 1°. Small facet angles are also required in the extreme ultra-violet and soft x-ray energy ranges in free electron laser applications, in order to reduce power density below a critical damage threshold. In this work, we demonstrate a technique based on anisotropic etching of silicon designed to produce very small angle facets with a high degree of perfection.},
doi = {10.1063/1.4960203},
journal = {Applied Physics Letters},
number = 4,
volume = 109,
place = {United States},
year = {2016},
month = {7}
}

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Works referenced in this record:

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