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Title: Fundamentally fastest optical processes at the surface of a topological insulator

Authors:
; ; ;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1471149
Grant/Contract Number:  
SC0007043
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Physical Review B
Additional Journal Information:
Journal Name: Physical Review B Journal Volume: 98 Journal Issue: 12; Journal ID: ISSN 2469-9950
Publisher:
American Physical Society
Country of Publication:
United States
Language:
English

Citation Formats

Oliaei Motlagh, S. Azar, Wu, Jhih-Sheng, Apalkov, Vadym, and Stockman, Mark I. Fundamentally fastest optical processes at the surface of a topological insulator. United States: N. p., 2018. Web. doi:10.1103/PhysRevB.98.125410.
Oliaei Motlagh, S. Azar, Wu, Jhih-Sheng, Apalkov, Vadym, & Stockman, Mark I. Fundamentally fastest optical processes at the surface of a topological insulator. United States. doi:10.1103/PhysRevB.98.125410.
Oliaei Motlagh, S. Azar, Wu, Jhih-Sheng, Apalkov, Vadym, and Stockman, Mark I. Mon . "Fundamentally fastest optical processes at the surface of a topological insulator". United States. doi:10.1103/PhysRevB.98.125410.
@article{osti_1471149,
title = {Fundamentally fastest optical processes at the surface of a topological insulator},
author = {Oliaei Motlagh, S. Azar and Wu, Jhih-Sheng and Apalkov, Vadym and Stockman, Mark I.},
abstractNote = {},
doi = {10.1103/PhysRevB.98.125410},
journal = {Physical Review B},
number = 12,
volume = 98,
place = {United States},
year = {2018},
month = {9}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1103/PhysRevB.98.125410

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Cited by: 3 works
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