Title: Plasmon-mediated energy relaxation in graphene

Journal Article · · Applied Physics Letters
DOI: https://doi.org/10.1063/1.4938760 · OSTI ID:1468794
ORCiD logo [1];  [2];  [3];  [3]
  1. Arizona State Univ., Tempe, AZ (United States). School of Electrical, Computer, and Energy Engineering; None
  2. King Mongkut’s Inst. of Technology, Bangkok (Thailand). Dept. of Physics
  3. State Univ. of New York (SUNY), Buffalo, NY (United States). Dept. of Electrical Engineering

Energy relaxation of hot carriers in graphene is studied at low temperatures, where the loss rate may differ significantly from that predicted for electron-phonon interactions. We show here that plasmons, important in the relaxation of energetic carriers in bulk semiconductors, can also provide a pathway for energy relaxation in transport experiments in graphene. We obtain a total loss rate to plasmons that results in energy relaxation times whose dependence on temperature and density closely matches that found experimentally.

Research Organization:
State Univ. of New York, Buffalo, NY (United States)
Sponsoring Organization:
Thailand Research Fund; USDOE
Grant/Contract Number:
FG02-04ER46180
OSTI ID:
1468794
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 26 Vol. 107; ISSN APPLAB; ISSN 0003-6951
Publisher:
American Institute of Physics (AIP)Copyright Statement
Country of Publication:
United States
Language:
English

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