Evaluation of Thermal and Radiation Induced Chemistries of Metal Oxo–Hydroxo Clusters for Next-Generation Nanoscale Inorganic Resists

Ruther, Rose E.; Oleksak, Richard P.; Luo, Feixiang; Amador, Jennie M.; Decker, Shawn R.; Jackson, Milton N.; Motley, Joshua R.; Stowers, Jason K.; Johnson, Darren W.; Garfunkel, Eric L.; Keszler, Douglas A.; Herman, Gregory S.

doi:10.1021/acsanm.8b00865

Title: Evaluation of Thermal and Radiation Induced Chemistries of Metal Oxo–Hydroxo Clusters for Next-Generation Nanoscale Inorganic Resists

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Abstract

Thin films formed by the condensation of metal oxo–hydroxo clusters offer a promising approach to ultrahigh-resolution patterning including next-generation photolithography using extreme ultraviolet (EUV) radiation and electron-beam lithography. In this work, we elucidate the thermal and radiative mechanisms that drive the chemical transformations in these materials and therefore control the patterning performance. Beginning from aqueous hafnium clusters, peroxide and sulfate additions serve to modify the clusters and, upon spin coating to form a thin film, provide the chemical contrast necessary to create resist. The coordination and functionality of peroxide and sulfate in hafnium-based metal oxo–hydroxo clusters were monitored at various stages of the patterning process which provided insight into the chemical and structural evolution of the material. Peroxide serves as the radiation sensitive species while sulfate enhances solubility and controls the concentration of hydroxide in the films. In conclusion, peroxide and hydroxide species decompose via radiative and thermal energy, respectively, to form hafnium oxide; controlling these processes is central to the function of the resist.

Authors:

Ruther, Rose E. ^[1]; Oleksak, Richard P. ^[1]; Luo, Feixiang ^[2]; Amador, Jennie M. ^[1]; Decker, Shawn R. ^[1]; Jackson, Milton N. ^[3]; Motley, Joshua R. ^[1]; Stowers, Jason K. ^[1]; Johnson, Darren W. ^[3]; Garfunkel, Eric L. ^[2]; Keszler, Douglas A. ^[1]; Herman, Gregory S. ^[1]

Oregon State Univ., Corvallis, OR (United States)
Rutgers Univ., Piscataway, NJ (United States)
Univ. of Oregon, Eugene, OR (United States)

Publication Date:: Mon Aug 20 00:00:00 EDT 2018

Research Org.:: Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 1468007

Grant/Contract Number:: AC05-00OR22725

Resource Type:: Accepted Manuscript

Journal Name:: ACS Applied Nano Materials

Additional Journal Information:: Journal Volume: 1; Journal Issue: 9; Journal ID: ISSN 2574-0970

Publisher:: American Chemical Society (ACS)

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE; cluster; inorganic photoresist; lithography; metal oxide photoresist; nanopatterning; polyoxometalate

Citation Formats


                    Ruther, Rose E., Oleksak, Richard P., Luo, Feixiang, Amador, Jennie M., Decker, Shawn R., Jackson, Milton N., Motley, Joshua R., Stowers, Jason K., Johnson, Darren W., Garfunkel, Eric L., Keszler, Douglas A., and Herman, Gregory S. Evaluation of Thermal and Radiation Induced Chemistries of Metal Oxo–Hydroxo Clusters for Next-Generation Nanoscale Inorganic Resists.  United States: N. p., 2018. 
Web.  doi:10.1021/acsanm.8b00865.

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                    Ruther, Rose E., Oleksak, Richard P., Luo, Feixiang, Amador, Jennie M., Decker, Shawn R., Jackson, Milton N., Motley, Joshua R., Stowers, Jason K., Johnson, Darren W., Garfunkel, Eric L., Keszler, Douglas A., & Herman, Gregory S. Evaluation of Thermal and Radiation Induced Chemistries of Metal Oxo–Hydroxo Clusters for Next-Generation Nanoscale Inorganic Resists.  United States.  https://doi.org/10.1021/acsanm.8b00865

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                    Ruther, Rose E., Oleksak, Richard P., Luo, Feixiang, Amador, Jennie M., Decker, Shawn R., Jackson, Milton N., Motley, Joshua R., Stowers, Jason K., Johnson, Darren W., Garfunkel, Eric L., Keszler, Douglas A., and Herman, Gregory S. Mon .  
"Evaluation of Thermal and Radiation Induced Chemistries of Metal Oxo–Hydroxo Clusters for Next-Generation Nanoscale Inorganic Resists".  United States.  https://doi.org/10.1021/acsanm.8b00865.  https://www.osti.gov/servlets/purl/1468007.

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@article{osti_1468007,

  title        = {Evaluation of Thermal and Radiation Induced Chemistries of Metal Oxo–Hydroxo Clusters for Next-Generation Nanoscale Inorganic Resists},

  author       = {Ruther, Rose E. and Oleksak, Richard P. and Luo, Feixiang and Amador, Jennie M. and Decker, Shawn R. and Jackson, Milton N. and Motley, Joshua R. and Stowers, Jason K. and Johnson, Darren W. and Garfunkel, Eric L. and Keszler, Douglas A. and Herman, Gregory S.},

  abstractNote = {Thin films formed by the condensation of metal oxo–hydroxo clusters offer a promising approach to ultrahigh-resolution patterning including next-generation photolithography using extreme ultraviolet (EUV) radiation and electron-beam lithography. In this work, we elucidate the thermal and radiative mechanisms that drive the chemical transformations in these materials and therefore control the patterning performance. Beginning from aqueous hafnium clusters, peroxide and sulfate additions serve to modify the clusters and, upon spin coating to form a thin film, provide the chemical contrast necessary to create resist. The coordination and functionality of peroxide and sulfate in hafnium-based metal oxo–hydroxo clusters were monitored at various stages of the patterning process which provided insight into the chemical and structural evolution of the material. Peroxide serves as the radiation sensitive species while sulfate enhances solubility and controls the concentration of hydroxide in the films. In conclusion, peroxide and hydroxide species decompose via radiative and thermal energy, respectively, to form hafnium oxide; controlling these processes is central to the function of the resist.},

  doi          = {10.1021/acsanm.8b00865},

  journal      = {ACS Applied Nano Materials},

  number       = 9,

  volume       = 1,

  place        = {United States},

  year         = {Mon Aug 20 00:00:00 EDT 2018},

  month        = {Mon Aug 20 00:00:00 EDT 2018}

}

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