Double-Layer Morphologies from a Silicon-Containing ABA Triblock Copolymer

Lee, Sangho; Cheng, Li-Chen; Gadelrab, Karim R.; Ntetsikas, Konstantinos; Moschovas, Dimitrios; Yager, Kevin G.; Avgeropoulos, Apostolos; Alexander-Katz, Alfredo; Ross, Caroline A.

doi:10.1021/acsnano.8b02851

Title: Double-Layer Morphologies from a Silicon-Containing ABA Triblock Copolymer

Journal Article · 31 May 2018 · ACS Nano

DOI: https://doi.org/10.1021/acsnano.8b02851 · OSTI ID:1467847

^[1];

^[2]; Moschovas, Dimitrios ^[2];

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^[2]; Alexander-Katz, Alfredo ^[1];

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Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States). Dept. of Materials Science and Engineering
Univ. of Ioannina (Greece). Dept. of Materials Science and Engineering
Brookhaven National Lab. (BNL), Upton, NY (United States). Center for Functional Nanomaterials (CFN)

A combined experimental and self-consistent-field theoretical (SCFT) investigation of the phase behavior of poly(stryrene-b-dimethylsiloxane-b-styrene) (PS-b-PDMS-b-PS, or SDS32) thin films during solvent vapor annealing is presented. The morphology of the triblock copolymer is described as a function of the as-cast film thickness and the ratio of two different solvent vapors, toluene and heptane. SDS32 formed terraced bilayer morphologies even when the film thickness was much lower than the commensurate thickness. The morphology transitioned between bilayer cylinders, bilayer perforated lamellae, and bilayer lamellae, including mixed structures such as a perforated lamella on top of a layer of in-plane cylinders, as the heptane fraction during solvent annealing increased. SCFT modeling showed the same morphological trends as a function of the block volume fraction. In comparison with diblock PS-b-PDMS with the same molecular weight, the SDS32 offers a simple route to produce a diversity of well-ordered bilayer structures with smaller feature sizes, including the formation of bilayer perforated lamellae over a large process window.

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Research Organization:: Brookhaven National Laboratory (BNL), Upton, NY (United States)

Sponsoring Organization:: National Science Foundation (NSF); USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22). Materials Sciences & Engineering Division

Grant/Contract Number:: SC0012704

OSTI ID:: 1467847

Report Number(s):: BNL-208016-2018-JAAM

Journal Information:: ACS Nano, Journal Name: ACS Nano Journal Issue: 6 Vol. 12; ISSN 1936-0851

Publisher:: American Chemical Society (ACS)Copyright Statement

Country of Publication:: United States

Language:: English

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36 MATERIALS SCIENCE
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ABA triblock copolymer
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self-consistent-field theory
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thin film

Title: Double-Layer Morphologies from a Silicon-Containing ABA Triblock Copolymer

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