Double-Layer Morphologies from a Silicon-Containing ABA Triblock Copolymer
Abstract
A combined experimental and self-consistent-field theoretical (SCFT) investigation of the phase behavior of poly(stryrene-b-dimethylsiloxane-b-styrene) (PS-b-PDMS-b-PS, or SDS32) thin films during solvent vapor annealing is presented. The morphology of the triblock copolymer is described as a function of the as-cast film thickness and the ratio of two different solvent vapors, toluene and heptane. SDS32 formed terraced bilayer morphologies even when the film thickness was much lower than the commensurate thickness. The morphology transitioned between bilayer cylinders, bilayer perforated lamellae, and bilayer lamellae, including mixed structures such as a perforated lamella on top of a layer of in-plane cylinders, as the heptane fraction during solvent annealing increased. SCFT modeling showed the same morphological trends as a function of the block volume fraction. In comparison with diblock PS-b-PDMS with the same molecular weight, the SDS32 offers a simple route to produce a diversity of well-ordered bilayer structures with smaller feature sizes, including the formation of bilayer perforated lamellae over a large process window.
- Authors:
-
[1];
[1];
[1];
[2];
[3];
[2];
[1]
- Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States). Dept. of Materials Science and Engineering
- Univ. of Ioannina (Greece). Dept. of Materials Science and Engineering
- Brookhaven National Lab. (BNL), Upton, NY (United States). Center for Functional Nanomaterials (CFN)
- Publication Date:
- Research Org.:
- Brookhaven National Lab. (BNL), Upton, NY (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22). Materials Sciences & Engineering Division; National Science Foundation (NSF)
- OSTI Identifier:
- 1467847
- Report Number(s):
- BNL-208016-2018-JAAM
Journal ID: ISSN 1936-0851
- Grant/Contract Number:
- SC0012704; DMR-1606911; DMR-1419807; ER46919
- Resource Type:
- Accepted Manuscript
- Journal Name:
- ACS Nano
- Additional Journal Information:
- Journal Volume: 12; Journal Issue: 6; Journal ID: ISSN 1936-0851
- Publisher:
- American Chemical Society (ACS)
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 77 NANOSCIENCE AND NANOTECHNOLOGY; 36 MATERIALS SCIENCE; ABA triblock copolymer; PS-b-PDMS-b-PS; self-assembly; self-consistent-field theory; solvent vapor annealing; thin film
Citation Formats
Lee, Sangho, Cheng, Li-Chen, Gadelrab, Karim R., Ntetsikas, Konstantinos, Moschovas, Dimitrios, Yager, Kevin G., Avgeropoulos, Apostolos, Alexander-Katz, Alfredo, and Ross, Caroline A. Double-Layer Morphologies from a Silicon-Containing ABA Triblock Copolymer. United States: N. p., 2018.
Web. doi:10.1021/acsnano.8b02851.
Lee, Sangho, Cheng, Li-Chen, Gadelrab, Karim R., Ntetsikas, Konstantinos, Moschovas, Dimitrios, Yager, Kevin G., Avgeropoulos, Apostolos, Alexander-Katz, Alfredo, & Ross, Caroline A. Double-Layer Morphologies from a Silicon-Containing ABA Triblock Copolymer. United States. https://doi.org/10.1021/acsnano.8b02851
Lee, Sangho, Cheng, Li-Chen, Gadelrab, Karim R., Ntetsikas, Konstantinos, Moschovas, Dimitrios, Yager, Kevin G., Avgeropoulos, Apostolos, Alexander-Katz, Alfredo, and Ross, Caroline A. Fri .
"Double-Layer Morphologies from a Silicon-Containing ABA Triblock Copolymer". United States. https://doi.org/10.1021/acsnano.8b02851. https://www.osti.gov/servlets/purl/1467847.
@article{osti_1467847,
title = {Double-Layer Morphologies from a Silicon-Containing ABA Triblock Copolymer},
author = {Lee, Sangho and Cheng, Li-Chen and Gadelrab, Karim R. and Ntetsikas, Konstantinos and Moschovas, Dimitrios and Yager, Kevin G. and Avgeropoulos, Apostolos and Alexander-Katz, Alfredo and Ross, Caroline A.},
abstractNote = {A combined experimental and self-consistent-field theoretical (SCFT) investigation of the phase behavior of poly(stryrene-b-dimethylsiloxane-b-styrene) (PS-b-PDMS-b-PS, or SDS32) thin films during solvent vapor annealing is presented. The morphology of the triblock copolymer is described as a function of the as-cast film thickness and the ratio of two different solvent vapors, toluene and heptane. SDS32 formed terraced bilayer morphologies even when the film thickness was much lower than the commensurate thickness. The morphology transitioned between bilayer cylinders, bilayer perforated lamellae, and bilayer lamellae, including mixed structures such as a perforated lamella on top of a layer of in-plane cylinders, as the heptane fraction during solvent annealing increased. SCFT modeling showed the same morphological trends as a function of the block volume fraction. In comparison with diblock PS-b-PDMS with the same molecular weight, the SDS32 offers a simple route to produce a diversity of well-ordered bilayer structures with smaller feature sizes, including the formation of bilayer perforated lamellae over a large process window.},
doi = {10.1021/acsnano.8b02851},
journal = {ACS Nano},
number = 6,
volume = 12,
place = {United States},
year = {Fri Jun 01 00:00:00 EDT 2018},
month = {Fri Jun 01 00:00:00 EDT 2018}
}
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