Efficient Fresnel zoneplate pattern data preparation for high-resolution nanofabrication
Abstract
A Fresnel zoneplate is a diffractive optical element consisting of concentric rings (zones) for which the transmitted light produces a focal spot that is used in all wavelength regimes, including X-rays. The pattern of transmission openings determines the location of the spot and the sub-half wavelength size of the openings can adjust the intensity. Today, very general transmission zoneplate patterns are used for many special imaging and image compensation purposes. Manufacturing zoneplates require a zoneplate pattern file, which precisely describes the size, shape, and contour of the rings based on the desired optical properties of the lens. Generating such a pattern requires the delicate balance of achieving the required optical performance while maintaining manageable file sizes and computation times. Here we describe a new algorithm meeting these needs. In conclusion, by precisely controlling the number of shapes in each zone, the algorithm simultaneously optimizes the desired optical tolerances with the pattern file size.
- Authors:
-
- Univ. of California, Berkeley, CA (United States); Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Publication Date:
- Research Org.:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22). Materials Sciences & Engineering Division; USDOE
- OSTI Identifier:
- 1466708
- Alternate Identifier(s):
- OSTI ID: 1550168
- Grant/Contract Number:
- AC02-05CH11231
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Optics Communications
- Additional Journal Information:
- Journal Volume: 402; Journal Issue: C; Related Information: © 2017 Elsevier B.V.; Journal ID: ISSN 0030-4018
- Publisher:
- Elsevier
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 47 OTHER INSTRUMENTATION; Fresnel zoneplate; Zoneplate pattern data preparation; X-ray; Extreme ultraviolet (EUV)
Citation Formats
Wang, Yow -Gwo, Miyakawa, Ryan H., Chao, Weilun, and Naulleau, Patrick P. Efficient Fresnel zoneplate pattern data preparation for high-resolution nanofabrication. United States: N. p., 2017.
Web. doi:10.1016/j.optcom.2017.05.060.
Wang, Yow -Gwo, Miyakawa, Ryan H., Chao, Weilun, & Naulleau, Patrick P. Efficient Fresnel zoneplate pattern data preparation for high-resolution nanofabrication. United States. https://doi.org/10.1016/j.optcom.2017.05.060
Wang, Yow -Gwo, Miyakawa, Ryan H., Chao, Weilun, and Naulleau, Patrick P. Wed .
"Efficient Fresnel zoneplate pattern data preparation for high-resolution nanofabrication". United States. https://doi.org/10.1016/j.optcom.2017.05.060. https://www.osti.gov/servlets/purl/1466708.
@article{osti_1466708,
title = {Efficient Fresnel zoneplate pattern data preparation for high-resolution nanofabrication},
author = {Wang, Yow -Gwo and Miyakawa, Ryan H. and Chao, Weilun and Naulleau, Patrick P.},
abstractNote = {A Fresnel zoneplate is a diffractive optical element consisting of concentric rings (zones) for which the transmitted light produces a focal spot that is used in all wavelength regimes, including X-rays. The pattern of transmission openings determines the location of the spot and the sub-half wavelength size of the openings can adjust the intensity. Today, very general transmission zoneplate patterns are used for many special imaging and image compensation purposes. Manufacturing zoneplates require a zoneplate pattern file, which precisely describes the size, shape, and contour of the rings based on the desired optical properties of the lens. Generating such a pattern requires the delicate balance of achieving the required optical performance while maintaining manageable file sizes and computation times. Here we describe a new algorithm meeting these needs. In conclusion, by precisely controlling the number of shapes in each zone, the algorithm simultaneously optimizes the desired optical tolerances with the pattern file size.},
doi = {10.1016/j.optcom.2017.05.060},
journal = {Optics Communications},
number = C,
volume = 402,
place = {United States},
year = {Wed Jun 14 00:00:00 EDT 2017},
month = {Wed Jun 14 00:00:00 EDT 2017}
}
Free Publicly Available Full Text
Publisher's Version of Record
Other availability
Search WorldCat to find libraries that may hold this journal
Cited by: 2 works
Citation information provided by
Web of Science
Web of Science
Save to My Library
You must Sign In or Create an Account in order to save documents to your library.
Works referenced in this record:
Soft X-ray microscopy at a spatial resolution better than 15 nm
journal, June 2005
- Chao, Weilun; Harteneck, Bruce D.; Liddle, J. Alexander
- Nature, Vol. 435, Issue 7046
Application of X-ray mask fabrication technologies to high resolution, large diameter Ta Fresnel zone plates
journal, February 1997
- Ozawa, A.; Tamamura, T.; Ishii, T.
- Microelectronic Engineering, Vol. 35, Issue 1-4
Process optimization for production of sub-20 nm soft x-ray zone plates
journal, November 1997
- Spector, S. J.
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 15, Issue 6
Nanofabrication of high aspect ratio 24 nm x-ray zone plates for x-ray imaging applications
journal, January 2007
- Feng, Yan; Feser, Michael; Lyon, Alan
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 25, Issue 6
Commissioning an EUV mask microscope for lithography generations reaching 8 nm
conference, April 2013
- Goldberg, Kenneth A.; Mochi, Iacopo; Benk, Markus
- SPIE Advanced Lithography, SPIE Proceedings
Zone-plate X-ray microscopy
journal, August 1980
- Schmahl, G.; Rudolph, D.; Niemann, B.
- Quarterly Reviews of Biophysics, Vol. 13, Issue 3
Using apodization functions to reduce sidelobes in rugate filters
journal, January 1989
- Southwell, William H.
- Applied Optics, Vol. 28, Issue 23
New ways of looking at masks with the SHARP EUV microscope
conference, March 2015
- Goldberg, Kenneth A.; Benk, Markus P.; Wojdyla, Antoine
- SPIE Advanced Lithography, SPIE Proceedings
Zernike phase contrast microscope for EUV mask inspection
conference, April 2014
- Wang, Yow-Gwo; Miyakawa, Ryan; Neureuther, Andrew
- SPIE Advanced Lithography, SPIE Proceedings
Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection
conference, March 2015
- Wang, Yow-Gwo; Miyakawa, Ryan; Chao, Weilun
- SPIE Advanced Lithography, SPIE Proceedings
Electro-optical system for scanning microscopy of extreme ultraviolet masks with a high harmonic generation source
journal, January 2014
- Naulleau, Patrick P.; Anderson, Christopher N.; Anderson, Erik H.
- Optics Express, Vol. 22, Issue 17
Works referencing / citing this record:
Switchable resolution in soft x-ray tomography of single cells
journal, January 2020
- Weinhardt, Venera; Chen, Jian-Hua; Ekman, Axel A.
- PLOS ONE, Vol. 15, Issue 1
Switchable resolution in soft x-ray tomography of single cells
journal, January 2020
- Weinhardt, Venera; Chen, Jian-Hua; Ekman, Axel A.
- PLOS ONE, Vol. 15, Issue 1