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Title: Janus Membranes via Diffusion-Controlled Atomic Layer Deposition

Abstract

The first use of atomic layer deposition (ALD) to produce Janus membranes is reported, with an example system consisting of a compositional gradient ranging from hydrophilic Al 2O 3 on one face to hydrophobic poly(propylene) on the opposite face. Alternating pulses of trimethyl aluminum and water vapor lead to the growth of covalently bonded Al 2O 3 conforming to the membrane pore surfaces. Precise control of ALD parameters significantly affects the surface wetting of the modified membrane face and the depth of Al 2O 3 infiltration into the porosity. This depth control derives from slow precursor diffusion through the 200 nm membrane pores compared to much faster ALD surface reactions. For a given precursor exposure and purge time, increasing the number of ALD cycles decreases the water contact angle at the modified surface from hydrophobic to hydrophilic, until the water droplet is completely imbibed by the membrane. To demonstrate the utility of these Janus membranes, a hydrophilic/superaerophobic Janus treatment is shown to greatly reduce the size of air bubbles generated through the membrane, enabling faster mixing. This technique represents the first application of vapor-deposited covalently bonded metal oxides to form Janus membranes. Further opportunities are afforded by the ability tomore » laterally pattern Al 2O 3 across the membrane surface via physical masking.« less

Authors:
 [1];  [2];  [3];  [4];  [1];  [5];  [4];  [1];  [2];  [6]
  1. Univ. of Chicago, IL (United States). Inst. for Molecular Engineering
  2. (ANL), Argonne, IL (United States). Center for Nanoscale Materials
  3. Argonne National Lab. (ANL), Argonne, IL (United States). Center for Nanoscale Materials
  4. Argonne National Lab. (ANL), Argonne, IL (United States). Applied Materials Division
  5. (ANL), Argonne, IL (United States). Materials Science Division
  6. (ANL), Argonne, IL (United States). Inst. for Molecular Engineering
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1466309
Alternate Identifier(s):
OSTI ID: 1452659
Grant/Contract Number:  
AC02-06CH11357
Resource Type:
Accepted Manuscript
Journal Name:
Advanced Materials Interfaces
Additional Journal Information:
Journal Volume: 5; Journal Issue: 15; Journal ID: ISSN 2196-7350
Publisher:
Wiley-VCH
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY; atomic layer deposition; janus membranes; membranes; superaerophobic; wettability

Citation Formats

Waldman, Ruben Z., Argonne National Lab., Yang, Hao-Cheng, Mandia, David J., Nealey, Paul F., Argonne National Lab., Elam, Jeffrey W., Darling, Seth B., Argonne National Lab., and Argonne National Lab. Janus Membranes via Diffusion-Controlled Atomic Layer Deposition. United States: N. p., 2018. Web. doi:10.1002/admi.201800658.
Waldman, Ruben Z., Argonne National Lab., Yang, Hao-Cheng, Mandia, David J., Nealey, Paul F., Argonne National Lab., Elam, Jeffrey W., Darling, Seth B., Argonne National Lab., & Argonne National Lab. Janus Membranes via Diffusion-Controlled Atomic Layer Deposition. United States. doi:10.1002/admi.201800658.
Waldman, Ruben Z., Argonne National Lab., Yang, Hao-Cheng, Mandia, David J., Nealey, Paul F., Argonne National Lab., Elam, Jeffrey W., Darling, Seth B., Argonne National Lab., and Argonne National Lab. Tue . "Janus Membranes via Diffusion-Controlled Atomic Layer Deposition". United States. doi:10.1002/admi.201800658. https://www.osti.gov/servlets/purl/1466309.
@article{osti_1466309,
title = {Janus Membranes via Diffusion-Controlled Atomic Layer Deposition},
author = {Waldman, Ruben Z. and Argonne National Lab. and Yang, Hao-Cheng and Mandia, David J. and Nealey, Paul F. and Argonne National Lab. and Elam, Jeffrey W. and Darling, Seth B. and Argonne National Lab. and Argonne National Lab.},
abstractNote = {The first use of atomic layer deposition (ALD) to produce Janus membranes is reported, with an example system consisting of a compositional gradient ranging from hydrophilic Al2O3 on one face to hydrophobic poly(propylene) on the opposite face. Alternating pulses of trimethyl aluminum and water vapor lead to the growth of covalently bonded Al2O3 conforming to the membrane pore surfaces. Precise control of ALD parameters significantly affects the surface wetting of the modified membrane face and the depth of Al2O3 infiltration into the porosity. This depth control derives from slow precursor diffusion through the 200 nm membrane pores compared to much faster ALD surface reactions. For a given precursor exposure and purge time, increasing the number of ALD cycles decreases the water contact angle at the modified surface from hydrophobic to hydrophilic, until the water droplet is completely imbibed by the membrane. To demonstrate the utility of these Janus membranes, a hydrophilic/superaerophobic Janus treatment is shown to greatly reduce the size of air bubbles generated through the membrane, enabling faster mixing. This technique represents the first application of vapor-deposited covalently bonded metal oxides to form Janus membranes. Further opportunities are afforded by the ability to laterally pattern Al2O3 across the membrane surface via physical masking.},
doi = {10.1002/admi.201800658},
journal = {Advanced Materials Interfaces},
number = 15,
volume = 5,
place = {United States},
year = {2018},
month = {6}
}

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