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This content will become publicly available on August 22, 2019

Title: Enhanced thermoelectric efficiency in topological insulator Bi 2 Te 3 nanoplates via atomic layer deposition-based surface passivation

Authors:
 [1] ; ORCiD logo [2] ;  [1] ;  [1] ; ORCiD logo [3] ;  [4] ; ORCiD logo [2] ; ORCiD logo [5]
  1. Ming Hsieh Department of Electrical Engineering, University of Southern California, Los Angeles, California 90089, USA
  2. Department of Mechanical Engineering and Texas Materials Institute, University of Texas, Austin, Texas 78712, USA
  3. Mork Family Department of Chemical Engineering and Materials Science, University of Southern California, Los Angeles, California 90089, USA
  4. Department of Chemistry, University of Southern California, Los Angeles, California 90089, USA
  5. Ming Hsieh Department of Electrical Engineering, University of Southern California, Los Angeles, California 90089, USA, Department of Chemistry, University of Southern California, Los Angeles, California 90089, USA, Department of Physics and Astronomy, University of Southern California, Los Angeles, California 90089, USA
Publication Date:
Grant/Contract Number:
FG02-07ER46376; FG02-07ER46377
Type:
Publisher's Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Name: Applied Physics Letters Journal Volume: 113 Journal Issue: 8; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1465902

Chen, Jihan, Kim, Jaehyun, Poudel, Nirakar, Hou, Bingya, Shen, Lang, Shi, Haotian, Shi, Li, and Cronin, Stephen. Enhanced thermoelectric efficiency in topological insulator Bi 2 Te 3 nanoplates via atomic layer deposition-based surface passivation. United States: N. p., Web. doi:10.1063/1.5030674.
Chen, Jihan, Kim, Jaehyun, Poudel, Nirakar, Hou, Bingya, Shen, Lang, Shi, Haotian, Shi, Li, & Cronin, Stephen. Enhanced thermoelectric efficiency in topological insulator Bi 2 Te 3 nanoplates via atomic layer deposition-based surface passivation. United States. doi:10.1063/1.5030674.
Chen, Jihan, Kim, Jaehyun, Poudel, Nirakar, Hou, Bingya, Shen, Lang, Shi, Haotian, Shi, Li, and Cronin, Stephen. 2018. "Enhanced thermoelectric efficiency in topological insulator Bi 2 Te 3 nanoplates via atomic layer deposition-based surface passivation". United States. doi:10.1063/1.5030674.
@article{osti_1465902,
title = {Enhanced thermoelectric efficiency in topological insulator Bi 2 Te 3 nanoplates via atomic layer deposition-based surface passivation},
author = {Chen, Jihan and Kim, Jaehyun and Poudel, Nirakar and Hou, Bingya and Shen, Lang and Shi, Haotian and Shi, Li and Cronin, Stephen},
abstractNote = {},
doi = {10.1063/1.5030674},
journal = {Applied Physics Letters},
number = 8,
volume = 113,
place = {United States},
year = {2018},
month = {8}
}

Works referenced in this record:

Thermoelectric figure of merit of a one-dimensional conductor
journal, June 1993

Nanoscale thermal transport
journal, January 2003
  • Cahill, David G.; Ford, Wayne K.; Goodson, Kenneth E.
  • Journal of Applied Physics, Vol. 93, Issue 2, p. 793-818
  • DOI: 10.1063/1.1524305