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Title: Chemical sputtering of boronized and oxidized carbon surfaces irradiated by low-energy deuterium atoms

We use molecular dynamics to study the chemical sputtering of boronized and oxidized amorphous carbon surfaces by deuterium irradiation in the range of impact energies of 5–30 eV. We report the sputtering yield as well as mass, energy, and angular spectra of ejected atoms and molecules of both virgin and deuterium saturated BCO surfaces and compare them with our data for a deuterated BC surface and existing theoretical and experimental results for amorphous C:D surfaces. Boron significantly suppresses the erosion of carbon, while the presence of oxygen results in further suppression.
Authors:
 [1] ;  [1]
  1. Stony Brook Univ., NY (United States). Inst. for Advanced Computational Science
Publication Date:
Grant/Contract Number:
SC0013752
Type:
Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 121; Journal Issue: 21; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics (AIP)
Research Org:
Research Foundation for the State Univ. of New York (SUNY), Stony Brook, NY (United States)
Sponsoring Org:
USDOE Office of Science (SC); National Council for Science and Technology of Mexico (CONACyT)
Country of Publication:
United States
Language:
English
Subject:
74 ATOMIC AND MOLECULAR PHYSICS
OSTI Identifier:
1465337
Alternate Identifier(s):
OSTI ID: 1366559