Ultra-low blaze angle gratings for synchrotron and free electron laser applications
Abstract
We have developed a method for the manufacture of x-ray diffraction gratings with arbitrarily small blaze angles. These gratings are made by a process in which a high blaze angle grating made by anisotropic etching of Si (111) is subjected to planarization and reactive ion etching. Differential etching of the planarization medium and silicon ensures reduction of the blaze angle. Repeated application of this process leads to gratings of increasing perfection with an arbitrarily small blaze angle. This opens the way to highly efficient low line density gratings, to damage resistant gratings for ultra-high power applications such as free electron lasers, and for extension of the use of gratings into the hard x-ray energy range for dispersive spectroscopy.
- Authors:
- Publication Date:
- Research Org.:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- OSTI Identifier:
- 1463933
- Alternate Identifier(s):
- OSTI ID: 1480808
- Grant/Contract Number:
- AC02-05CH11231
- Resource Type:
- Published Article
- Journal Name:
- Optics Express
- Additional Journal Information:
- Journal Name: Optics Express Journal Volume: 26 Journal Issue: 17; Journal ID: ISSN 1094-4087
- Publisher:
- Optical Society of America
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 47 OTHER INSTRUMENTATION
Citation Formats
Voronov, D. L., Gullikson, E. M., and Padmore, H. A. Ultra-low blaze angle gratings for synchrotron and free electron laser applications. United States: N. p., 2018.
Web. doi:10.1364/OE.26.022011.
Voronov, D. L., Gullikson, E. M., & Padmore, H. A. Ultra-low blaze angle gratings for synchrotron and free electron laser applications. United States. https://doi.org/10.1364/OE.26.022011
Voronov, D. L., Gullikson, E. M., and Padmore, H. A. Thu .
"Ultra-low blaze angle gratings for synchrotron and free electron laser applications". United States. https://doi.org/10.1364/OE.26.022011.
@article{osti_1463933,
title = {Ultra-low blaze angle gratings for synchrotron and free electron laser applications},
author = {Voronov, D. L. and Gullikson, E. M. and Padmore, H. A.},
abstractNote = {We have developed a method for the manufacture of x-ray diffraction gratings with arbitrarily small blaze angles. These gratings are made by a process in which a high blaze angle grating made by anisotropic etching of Si (111) is subjected to planarization and reactive ion etching. Differential etching of the planarization medium and silicon ensures reduction of the blaze angle. Repeated application of this process leads to gratings of increasing perfection with an arbitrarily small blaze angle. This opens the way to highly efficient low line density gratings, to damage resistant gratings for ultra-high power applications such as free electron lasers, and for extension of the use of gratings into the hard x-ray energy range for dispersive spectroscopy.},
doi = {10.1364/OE.26.022011},
journal = {Optics Express},
number = 17,
volume = 26,
place = {United States},
year = {Thu Aug 09 00:00:00 EDT 2018},
month = {Thu Aug 09 00:00:00 EDT 2018}
}
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https://doi.org/10.1364/OE.26.022011
https://doi.org/10.1364/OE.26.022011
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Works referenced in this record:
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Large area nanoimprint enables ultra-precise x-ray diffraction gratings
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Gratings with Blaze Angles Down to 0.1° for Photon Energies up to 10 keV
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Works referencing / citing this record:
On smart optimization of blazed soft X-ray gratings
journal, June 2019
- Jark, Werner
- Journal of Synchrotron Radiation, Vol. 26, Issue 4
On smart optimization of blazed soft X-ray gratings
journal, June 2019
- Jark, Werner
- Journal of Synchrotron Radiation, Vol. 26, Issue 4