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Title: Unraveling thickness-dependent spin relaxation in colossal magnetoresistance manganite films

Abstract

In this paper, we used ultrafast optical spectroscopy to study photoinduced spin relaxation in 10–100 nm thick La0.7Ca0.3MnO3 films. The spin-lattice relaxation time displays a strong dependence on thickness below the Curie temperature. Our simulations show that the observed thickness-dependent relaxation results from much faster thermal decay through the substrate in thinner films that leads to artificially faster demagnetization. Furthermore, we provide an analytical approach to gain insight into the spin-lattice relaxation time for highly thermal dissipative films. Finally, our study strongly suggests that careful consideration of the influence of transient thermal variations on photoinduced demagnetization is mandatory when incorporating absorbing thin magnetic films into heterostructures and devices.

Authors:
ORCiD logo [1];  [2]; ORCiD logo [2];  [3];  [2];  [2]
+ Show Author Affiliations
  1. National Chiao Tung Univ., Hsinchu (Taiwan). Dept. of Electrophysics. Center for Emergent Functional Matter Science
  2. Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
  3. Univ. at Buffalo, NY (United States). Dept. of Materials Design and Innovation; Konkuk Univ., Seoul (Korea, Republic of). Division of Quantum Phases and Devices. Dept. of Physics
Publication Date:
Research Org.:
Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES); USDOE National Nuclear Security Administration (NNSA); Ministry of Science and Technology (MOST) (Taiwan); Ministry of Education (MOE) (Taiwan)
OSTI Identifier:
1463486
Alternate Identifier(s):
OSTI ID: 1459235
Report Number(s):
LA-UR-17-30701
Journal ID: ISSN 0003-6951
Grant/Contract Number:  
AC52-06NA25396; 104-2112-M-009-023-MY3
Resource Type:
Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 113; Journal Issue: 1; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics (AIP)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; Material Science

Citation Formats

Sheu, Y. M., Trugman, S. A., Chen, A. P., Jia, Q. X., Taylor, A. J., and Prasankumar, R. P. Unraveling thickness-dependent spin relaxation in colossal magnetoresistance manganite films. United States: N. p., 2018. Web. doi:10.1063/1.5013258.
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Sheu, Y. M., Trugman, S. A., Chen, A. P., Jia, Q. X., Taylor, A. J., & Prasankumar, R. P. Unraveling thickness-dependent spin relaxation in colossal magnetoresistance manganite films. United States. https://doi.org/10.1063/1.5013258
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Sheu, Y. M., Trugman, S. A., Chen, A. P., Jia, Q. X., Taylor, A. J., and Prasankumar, R. P. Fri . "Unraveling thickness-dependent spin relaxation in colossal magnetoresistance manganite films". United States. https://doi.org/10.1063/1.5013258. https://www.osti.gov/servlets/purl/1463486.
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@article{osti_1463486,
title = {Unraveling thickness-dependent spin relaxation in colossal magnetoresistance manganite films},
author = {Sheu, Y. M. and Trugman, S. A. and Chen, A. P. and Jia, Q. X. and Taylor, A. J. and Prasankumar, R. P.},
abstractNote = {In this paper, we used ultrafast optical spectroscopy to study photoinduced spin relaxation in 10–100 nm thick La0.7Ca0.3MnO3 films. The spin-lattice relaxation time displays a strong dependence on thickness below the Curie temperature. Our simulations show that the observed thickness-dependent relaxation results from much faster thermal decay through the substrate in thinner films that leads to artificially faster demagnetization. Furthermore, we provide an analytical approach to gain insight into the spin-lattice relaxation time for highly thermal dissipative films. Finally, our study strongly suggests that careful consideration of the influence of transient thermal variations on photoinduced demagnetization is mandatory when incorporating absorbing thin magnetic films into heterostructures and devices.},
doi = {10.1063/1.5013258},
journal = {Applied Physics Letters},
number = 1,
volume = 113,
place = {United States},
year = {Fri Jul 06 00:00:00 EDT 2018},
month = {Fri Jul 06 00:00:00 EDT 2018}
}
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Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1063/1.5013258
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Cited by: 2 works
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Figures / Tables:

Figure 1 Figure 1: Photoinduced transient reflectivity data taken on 10, 50, and 100 nm LCMO films grown on STO, measured at (a) 10 K and (b) 250 K, with pump fluence ~24 lJ/cm2. The solid lines show the measured data, the dashed/dot- ted lines are obtained from simulations of 1D thermalmore » diffusion, and the arrows indicate the conventional assignments of $\tau_2$ and $\tau_3$, as discussed in the text. The insets show the early time dynamics, normalized near t 0, below and above the transition. (c) Simple exponential fits for $\tau_2$ and $\tau_3$ versus film thickness at 10 K. These fits can result in an artificially faster s-l time, as discussed in the main text.« less
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    Picosecond Creation of Switchable Optomagnets from a Polar Antiferromagnet with Giant Photoinduced Kerr Rotations
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