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Title: Improved Coking Resistance of “Intelligent” Ni Catalysts Prepared by Atomic Layer Deposition

Conformal CaTiO 3 films were deposited onto MgAl 2O 4 by atomic layer deposition (ALD) and then examined as “intelligent” catalyst supports for Ni in the steam and CO 2 reforming of methane. CaTiO 3 films (1 nm) were characterized by scanning transmission electron microscopy and XRD and shown to be stable to at least 1073 K. Catalysts with 1 and 20 wt % Ni were studied, and it was found that, following calcination at 1073 K, the Ni-CaTiO 3/MgAl 2O 4 catalysts required high-temperature reduction to achieve activities comparable to that of their Ni/MgAl 2O 4 counterparts. However, the Ni-CaTiO 3/MgAl 2O 4 catalysts exhibited dramatically improved tolerance toward carbon-whisker formation. The carbon content on the 1 wt % Ni catalyst on CaTiO 3/MgAl 2O 4 was small even after heating the catalyst in a dry, 10% CH 4–90% He mixture at 1073 K for 12 h. As a result, possible mechanisms for the high carbon tolerance of the perovskite-containing catalysts are discussed.
ORCiD logo [1] ;  [1] ;  [2] ; ORCiD logo [1] ;  [1]
  1. Univ. of Pennsylvania, Philadelphia, PA (United States)
  2. Brookhaven National Lab. (BNL), Upton, NY (United States)
Publication Date:
Grant/Contract Number:
Accepted Manuscript
Journal Name:
ACS Catalysis
Additional Journal Information:
Journal Volume: 8; Journal ID: ISSN 2155-5435
American Chemical Society (ACS)
Research Org:
Univ. of Pennsylvania, Philadelphia, PA (United States)
Sponsoring Org:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
Country of Publication:
United States
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY; atomic layer feposition (ALD); CaTiO3; coking resistance; dry methane reforming; Ni catalyst; steam methane reforming; “intelligent” catalyst
OSTI Identifier: