Ordering and Grain Growth in Charged Block Copolymer Bulk Films: A Comparison of Solvent-Related Processes

Ryan, Justin J.; Mineart, Kenneth P.; Lee, Byeongdu; Spontak, Richard J.

doi:10.1002/admi.201701667

Title: Ordering and Grain Growth in Charged Block Copolymer Bulk Films: A Comparison of Solvent-Related Processes

Journal Article · 08 February 2018 · Advanced Materials Interfaces

DOI: https://doi.org/10.1002/admi.201701667 · OSTI ID:1461339

Ryan, Justin J. ^[1]; Mineart, Kenneth P. ^[2]; Lee, Byeongdu ^[3];

^[4]

North Carolina State Univ., Raleigh, NC (United States)
Bucknell Univ., Lewisburg, PA (United States)
Argonne National Lab. (ANL), Argonne, IL (United States)
North Carolina State Univ., Raleigh, NC (United States); Humboldt-Univ. zu Berlin, Berlin (Germany)

While prior efforts have demonstrated that the morphologies of block copolymer (BC) bulk films can be controlled through judicious chemical design and thermal annealing, recent interest has focused on regulating the orientation of BC nanostructures and minimizing defects. Thermal processes developed to achieve this purpose for nonpolar BCs are not, however, suitable for orienting microphase-ordered BCs composed of at least one block with charged moieties that can form thermally stable ionic clusters. To overcome this challenge, we have previously applied solvent-vapor (SV) annealing to block ionomer (BI) bulk films composed of midblock-sulfonated pentablock copolymers and established that this approach yields highly ordered morphologies that display evidence of improved in-plane orientation. Here, we employ small-angle X-ray scattering to compare the effectiveness of three solvent-related processes-SV annealing, SV permeation, and SV sorption-on BI ordering and grain growth, and offer explanations for observed differences on the basis of thermodynamic- and transport-related considerations. As a result, differences in the experimental design of these solvent-related processes are found to affect nanostructural development, as evidenced by the extent of in-plane grain growth.

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Research Organization:: Argonne National Lab. (ANL), Argonne, IL (United States)

Sponsoring Organization:: Nonwovens Institute (NWI); Freudenberg Group - Performance Materials; Deutsche Forschungsgemeinschaft (DFG); Bucknell University; USDOE

Grant/Contract Number:: AC02-06CH11357

OSTI ID:: 1461339

Alternate ID(s):: OSTI ID: 1419992

Journal Information:: Advanced Materials Interfaces, Journal Name: Advanced Materials Interfaces Journal Issue: 8 Vol. 5; ISSN 2196-7350

Publisher:: Wiley-VCHCopyright Statement

Country of Publication:: United States

Language:: English

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36 MATERIALS SCIENCE
block ionomers
lamellar orientation
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solvent-vapor annealing
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Title: Ordering and Grain Growth in Charged Block Copolymer Bulk Films: A Comparison of Solvent-Related Processes

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