Atomic layer deposition of CeO 2 using a heteroleptic cyclopentadienyl-amidinate precursor

doi:10.1116/1.5026405

This content will become publicly available on July 16, 2019

Title: Atomic layer deposition of CeO ₂ using a heteroleptic cyclopentadienyl-amidinate precursor

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Authors:

Golalikhani, Maryam ^[1] ; James, Trevor ^[1] ; Van Buskirk, Peter ^[1] ; Noh, Wontae ^[2] ; Lee, Jooho ^[2] ; Wang, Ziyun ^[2] ; Roeder, Jeffrey F. ^[1]

Sonata LLC, 25 Francis J Clarke Circle, Bethel, Connecticut 06801
Air Liquide, Yonsei Engineering Research Park, 50 Yonsei-ro, Seodaemun-gu, Seoul 03722, Korea

Publication Date:: 2018-09-01

Grant/Contract Number:: SC0013116

Type:: Publisher's Accepted Manuscript

Journal Name:: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films

Additional Journal Information:: Journal Volume: 36; Journal Issue: 5; Related Information: CHORUS Timestamp: 2018-07-16 12:40:08; Journal ID: ISSN 0734-2101

Publisher:: American Vacuum Society

Sponsoring Org:: USDOE

Country of Publication:: United States

Language:: English

OSTI Identifier:: 1460497


                    Golalikhani, Maryam, James, Trevor, Van Buskirk, Peter, Noh, Wontae, Lee, Jooho, Wang, Ziyun, and Roeder, Jeffrey F. Atomic layer deposition of CeO 2 using a heteroleptic cyclopentadienyl-amidinate precursor.  United States: N. p.,  
        Web.  doi:10.1116/1.5026405.

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                    Golalikhani, Maryam, James, Trevor, Van Buskirk, Peter, Noh, Wontae, Lee, Jooho, Wang, Ziyun, & Roeder, Jeffrey F. Atomic layer deposition of CeO 2 using a heteroleptic cyclopentadienyl-amidinate precursor.  United States.  doi:10.1116/1.5026405.

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                    Golalikhani, Maryam, James, Trevor, Van Buskirk, Peter, Noh, Wontae, Lee, Jooho, Wang, Ziyun, and Roeder, Jeffrey F. 2018.  
        "Atomic layer deposition of CeO 2 using a heteroleptic cyclopentadienyl-amidinate precursor".  United States.  
        doi:10.1116/1.5026405.

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@article{osti_1460497,

  title        = {Atomic layer deposition of CeO 2 using a heteroleptic cyclopentadienyl-amidinate precursor},

  author       = {Golalikhani, Maryam and James, Trevor and Van Buskirk, Peter and Noh, Wontae and Lee, Jooho and Wang, Ziyun and Roeder, Jeffrey F.},

  abstractNote = {},

  doi          = {10.1116/1.5026405},

  journal      = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},

  number       = 5,

  volume       = 36,

  place        = {United States},

  year         = {2018},

  month        = {9}

}

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Free Publicly Accessible Full Text
This content will become publicly available on July 16, 2019
Publisher's Version of Record
10.1116/1.5026405
https://doi.org/10.1116/1.5026405

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Title: Atomic layer deposition of CeO 2 using a heteroleptic cyclopentadienyl-amidinate precursor

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Title: Atomic layer deposition of CeO ₂ using a heteroleptic cyclopentadienyl-amidinate precursor