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Title: Atomic layer deposition of CeO 2 using a heteroleptic cyclopentadienyl-amidinate precursor

Authors:
 [1] ;  [1] ;  [1] ;  [2] ;  [2] ;  [2] ;  [1]
  1. Sonata LLC, 25 Francis J Clarke Circle, Bethel, Connecticut 06801
  2. Air Liquide, Yonsei Engineering Research Park, 50 Yonsei-ro, Seodaemun-gu, Seoul 03722, Korea
Publication Date:
Grant/Contract Number:
SC0013116
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Volume: 36; Journal Issue: 5; Related Information: CHORUS Timestamp: 2018-07-16 12:40:08; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1460497

Golalikhani, Maryam, James, Trevor, Van Buskirk, Peter, Noh, Wontae, Lee, Jooho, Wang, Ziyun, and Roeder, Jeffrey F. Atomic layer deposition of CeO 2 using a heteroleptic cyclopentadienyl-amidinate precursor. United States: N. p., Web. doi:10.1116/1.5026405.
Golalikhani, Maryam, James, Trevor, Van Buskirk, Peter, Noh, Wontae, Lee, Jooho, Wang, Ziyun, & Roeder, Jeffrey F. Atomic layer deposition of CeO 2 using a heteroleptic cyclopentadienyl-amidinate precursor. United States. doi:10.1116/1.5026405.
Golalikhani, Maryam, James, Trevor, Van Buskirk, Peter, Noh, Wontae, Lee, Jooho, Wang, Ziyun, and Roeder, Jeffrey F. 2018. "Atomic layer deposition of CeO 2 using a heteroleptic cyclopentadienyl-amidinate precursor". United States. doi:10.1116/1.5026405.
@article{osti_1460497,
title = {Atomic layer deposition of CeO 2 using a heteroleptic cyclopentadienyl-amidinate precursor},
author = {Golalikhani, Maryam and James, Trevor and Van Buskirk, Peter and Noh, Wontae and Lee, Jooho and Wang, Ziyun and Roeder, Jeffrey F.},
abstractNote = {},
doi = {10.1116/1.5026405},
journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
number = 5,
volume = 36,
place = {United States},
year = {2018},
month = {9}
}