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Title: Dielectric properties of amorphous Ta-Ge-O and Ta-Si-O thin films

 [1];  [1]
  1. Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USA
Publication Date:
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Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Name: Journal of Applied Physics Journal Volume: 123 Journal Issue: 24; Journal ID: ISSN 0021-8979
American Institute of Physics
Country of Publication:
United States

Citation Formats

Naoi, T. A., and van Dover, R. B. Dielectric properties of amorphous Ta-Ge-O and Ta-Si-O thin films. United States: N. p., 2018. Web. doi:10.1063/1.5022336.
Naoi, T. A., & van Dover, R. B. Dielectric properties of amorphous Ta-Ge-O and Ta-Si-O thin films. United States. doi:
Naoi, T. A., and van Dover, R. B. Thu . "Dielectric properties of amorphous Ta-Ge-O and Ta-Si-O thin films". United States. doi:
title = {Dielectric properties of amorphous Ta-Ge-O and Ta-Si-O thin films},
author = {Naoi, T. A. and van Dover, R. B.},
abstractNote = {},
doi = {10.1063/1.5022336},
journal = {Journal of Applied Physics},
number = 24,
volume = 123,
place = {United States},
year = {2018},
month = {6}

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