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This content will become publicly available on June 27, 2019

Title: Dielectric properties of amorphous Ta-Ge-O and Ta-Si-O thin films

Authors:
 [1] ;  [1]
  1. Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USA
Publication Date:
Grant/Contract Number:
FG02-06ER06-15
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 123; Journal Issue: 24; Related Information: CHORUS Timestamp: 2018-06-27 10:09:39; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1457478