Double sided grating fabrication for high energy X-ray phase contrast imaging

Hollowell, Andrew E.; Arrington, Christian L.; Finnegan, Patrick; Musick, Kate; Resnick, Paul; Volk, Steve; Dagel, Amber L.

doi:10.1016/j.mssp.2018.04.016

Title: Double sided grating fabrication for high energy X-ray phase contrast imaging

Abstract

State of the art grating fabrication currently limits the maximum source energy that can be used in lab based x-ray phase contrast imaging (XPCI) systems. In order to move to higher source energies, and image high density materials or image through encapsulating barriers, new grating fabrication methods are needed. In this work we have analyzed a new modality for grating fabrication that involves precision alignment of etched gratings on both sides of a substrate, effectively doubling the thickness of the grating. Furthermore, we have achieved a front-to-backside feature alignment accuracy of 0.5 µm demonstrating a methodology that can be applied to any grating fabrication approach extending the attainable aspect ratios allowing higher energy lab based XPCI systems.

Authors:

Hollowell, Andrew E. ^[1]; Arrington, Christian L. ^[1]; Finnegan, Patrick ^[1]; Musick, Kate ^[1]; Resnick, Paul ^[1]; Volk, Steve ^[1]; Dagel, Amber L. ^[1]

Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)

Publication Date:: 2018-04-19

Research Org.:: Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)

Sponsoring Org.:: USDOE National Nuclear Security Administration (NNSA)

OSTI Identifier:: 1457363

Alternate Identifier(s):: OSTI ID: 1875608

Report Number(s):: SAND-2018-0961J
Journal ID: ISSN 1369-8001; PII: S1369800118301756

Grant/Contract Number:: AC04-94AL85000; NA-0003525; SAND2018–0961J

Resource Type:: Accepted Manuscript

Journal Name:: Materials Science in Semiconductor Processing

Additional Journal Information:: Journal Volume: 92; Journal Issue: 2019; Journal ID: ISSN 1369-8001

Publisher:: Elsevier

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE; XPCI; Silicon deep reactive ion etch; Front-to-back alignment; Gratings; Electrocoating; Conformal plating

Citation Formats


                    Hollowell, Andrew E., Arrington, Christian L., Finnegan, Patrick, Musick, Kate, Resnick, Paul, Volk, Steve, and Dagel, Amber L. Double sided grating fabrication for high energy X-ray phase contrast imaging.  United States: N. p., 2018. 
Web.  doi:10.1016/j.mssp.2018.04.016.

Copy to clipboard


                    Hollowell, Andrew E., Arrington, Christian L., Finnegan, Patrick, Musick, Kate, Resnick, Paul, Volk, Steve, & Dagel, Amber L. Double sided grating fabrication for high energy X-ray phase contrast imaging.  United States.  https://doi.org/10.1016/j.mssp.2018.04.016

Copy to clipboard


                    Hollowell, Andrew E., Arrington, Christian L., Finnegan, Patrick, Musick, Kate, Resnick, Paul, Volk, Steve, and Dagel, Amber L. Thu .  
"Double sided grating fabrication for high energy X-ray phase contrast imaging".  United States.  https://doi.org/10.1016/j.mssp.2018.04.016.  https://www.osti.gov/servlets/purl/1457363.

Copy to clipboard


                    
@article{osti_1457363,

  title        = {Double sided grating fabrication for high energy X-ray phase contrast imaging},

  author       = {Hollowell, Andrew E. and Arrington, Christian L. and Finnegan, Patrick and Musick, Kate and Resnick, Paul and Volk, Steve and Dagel, Amber L.},

  abstractNote = {State of the art grating fabrication currently limits the maximum source energy that can be used in lab based x-ray phase contrast imaging (XPCI) systems. In order to move to higher source energies, and image high density materials or image through encapsulating barriers, new grating fabrication methods are needed. In this work we have analyzed a new modality for grating fabrication that involves precision alignment of etched gratings on both sides of a substrate, effectively doubling the thickness of the grating. Furthermore, we have achieved a front-to-backside feature alignment accuracy of 0.5 µm demonstrating a methodology that can be applied to any grating fabrication approach extending the attainable aspect ratios allowing higher energy lab based XPCI systems.},

  doi          = {10.1016/j.mssp.2018.04.016},

  journal      = {Materials Science in Semiconductor Processing},

  number       = 2019,

  volume       = 92,

  place        = {United States},

  year         = {2018},

  month        = {4}

}

Copy to clipboard

Journal Article:

Free Publicly Available Full Text

Accepted Manuscript (Publisher)

Accepted Manuscript (DOE)

Publisher's Version of Record

https://doi.org/10.1016/j.mssp.2018.04.016

Other availability

Search WorldCat to find libraries that may hold this journal

Citation Metrics:

Cited by: 2 works

Citation information provided by
Web of Science

Figures / Tables:

Figure 1: Integration approach for front to back aligned XPCI gratings. (a) Align, pattern and etch front and backside alignment marks. (b) Etch topside Si grating and fill with oxide to support fragile Si bars. (c) Flip substrate, pattern and etch backside Si grating. (d) Selectively etch oxide. (e) Depositmore »

All figures and tables (8 total)

Save / Share:

Export Metadata

Save to My Library

Figures / Tables found in this record:

Figures/Tables have been extracted from DOE-funded journal article accepted manuscripts.

Similar Records in DOE PAGES and OSTI.GOV collections:

High aspect ratio anisotropic silicon etching for x-ray phase contrast imaging grating fabrication

Journal Article Finnegan, Patrick S. ; Hollowell, Andrew E. ; Arrington, Christian L. ; ... - Materials Science in Semiconductor Processing

Lab based x-ray phase contrast imaging (XPCI) systems have historically focused on medical applications, but there is growing interest in material science applications for non-destructive analysis of low density materials. Extending this imaging technique to higher density materials or larger samples requires higher aspect ratio gratings, to allow the use of a higher energy x-ray source. Here, we demonstrate the use of anisotropic silicon (Si) etching in potassium hydroxide (KOH), to achieve extremely high aspect ratio gratings. This method has been shown to be effective in fabricating deep, uniform gratings by taking advantage of the etch selectivity of differing crystallinemore »« less
Cited by 4
https://doi.org/10.1016/j.mssp.2018.06.013

Full Text Available
Fabrication and characterization of the source grating for visibility improvement of neutron phase imaging with gratings

Journal Article Kim, Jongyul ; Nuclear and Quantum Engineering Department, Korea Advanced Institute of Science and Technology, Daejeon 305-701 ; Lee, Kye Hong ; ... - Review of Scientific Instruments

The fabrication of gratings including metal deposition processes for highly neutron absorbing lines is a critical issue to achieve a good visibility of the grating-based phase imaging system. The source grating for a neutron Talbot-Lau interferometer is an array of Gadolinium (Gd) structures that are generally made by sputtering, photo-lithography, and chemical wet etching. However, it is very challenging to fabricate a Gd structure with sufficient neutron attenuation of approximately more than 20 {mu}m using a conventional metal deposition method because of the slow Gd deposition rate, film stress, high material cost, and so on. In this article, we fabricatedmore »« less
https://doi.org/10.1063/1.4810014
Results from the first preclinical CT scanner with grating based phase contrast and a rotating gantry

Journal Article Bech, Martin ; Tapfer, Arne ; Velroyen, Astrid ; ... - AIP Conference Proceedings

After successful demonstrations of soft-tissue phase-contrast imaging with grating interferometers at synchrotron radiation sources and at laboratory based x-ray tubes, a first preclinical CT scanner with grating based phase contrast imaging modality has been constructed. The rotating gantry is equipped with a three-grating interferometer, a 50 watt tungsten anode source and a Hamamatsu flat panel detector. The total length of the interferometer is 45 cm, and the bed of the scanner is optimized for mice, with a scanning diameter of 35 mm. From one single scan both phase-contrast and standard attenuation based tomography can be attained, providing an overall gainmore » in image contrast.« less
https://doi.org/10.1063/1.4742281
Grating-based x-ray differential phase contrast imaging with twin peaks in phase-stepping curves—phase retrieval and dewrapping

Journal Article Yang, Yi ; Xie, Huiqiao ; Tang, Xiangyang ; ... - Medical Physics

Purpose: X-ray differential phase contrast CT implemented with Talbot interferometry employs phase-stepping to extract information of x-ray attenuation, phase shift, and small-angle scattering. Since inaccuracy may exist in the absorption grating G{sub 2} due to an imperfect fabrication, the effective period of G{sub 2} can be as large as twice the nominal period, leading to a phenomenon of twin peaks that differ remarkably in their heights. In this work, the authors investigate how to retrieve and dewrap the phase signal from the phase-stepping curve (PSC) with the feature of twin peaks for x-ray phase contrast imaging. Methods: Based on themore »« less
https://doi.org/10.1118/1.4948690
Fabrication and characterization of analyzer gratings with high aspect ratios for phase contrast imaging using a Talbot interferometer

Journal Article Kenntner, Johannes ; Altapova, Venera ; Grund, Thomas ; ... - AIP Conference Proceedings

In recent years, X-ray imaging based on the differential phase contrast gained more and more attention to be used in X-ray imaging. Among other techniques like crystal-based diffraction and propagation methods, the grating based Talbot interferometry offers an approach measuring phase modulations of X-rays while passing low absorbing objects. The Talbot interferometer yields for highly efficient X-ray imaging signals for hard X-rays with energies above 10 keV. One factor with high impact on the imaging performance of such grating interferometers is the gratings quality. We introduce a fabrication process allowing both, the fabrication of phase modulating and analyzer gratings withmore »« less
https://doi.org/10.1063/1.3703349

Similar Records