Double sided grating fabrication for high energy X-ray phase contrast imaging

Hollowell, Andrew E.; Arrington, Christian L.; Finnegan, Patrick; Musick, Kate; Resnick, Paul; Volk, Steve; Dagel, Amber L.

doi:10.1016/j.mssp.2018.04.016

Title: Double sided grating fabrication for high energy X-ray phase contrast imaging

Abstract

State of the art grating fabrication currently limits the maximum source energy that can be used in lab based x-ray phase contrast imaging (XPCI) systems. In order to move to higher source energies, and image high density materials or image through encapsulating barriers, new grating fabrication methods are needed. In this work we have analyzed a new modality for grating fabrication that involves precision alignment of etched gratings on both sides of a substrate, effectively doubling the thickness of the grating. Furthermore, we have achieved a front-to-backside feature alignment accuracy of 0.5 µm demonstrating a methodology that can be applied to any grating fabrication approach extending the attainable aspect ratios allowing higher energy lab based XPCI systems.

Authors:

Hollowell, Andrew E. ^[1]; Arrington, Christian L. ^[1]; Finnegan, Patrick ^[1]; Musick, Kate ^[1]; Resnick, Paul ^[1]; Volk, Steve ^[1]; Dagel, Amber L. ^[1]

Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)

Publication Date:: Thu Apr 19 00:00:00 EDT 2018

Research Org.:: Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)

Sponsoring Org.:: USDOE National Nuclear Security Administration (NNSA)

OSTI Identifier:: 1457363

Alternate Identifier(s):: OSTI ID: 1875608

Report Number(s):: SAND-2018-0961J
Journal ID: ISSN 1369-8001; PII: S1369800118301756

Grant/Contract Number:: AC04-94AL85000; NA-0003525; SAND2018–0961J

Resource Type:: Accepted Manuscript

Journal Name:: Materials Science in Semiconductor Processing

Additional Journal Information:: Journal Volume: 92; Journal Issue: 2019; Journal ID: ISSN 1369-8001

Publisher:: Elsevier

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE; XPCI; Silicon deep reactive ion etch; Front-to-back alignment; Gratings; Electrocoating; Conformal plating

Citation Formats


                    Hollowell, Andrew E., Arrington, Christian L., Finnegan, Patrick, Musick, Kate, Resnick, Paul, Volk, Steve, and Dagel, Amber L. Double sided grating fabrication for high energy X-ray phase contrast imaging.  United States: N. p., 2018. 
Web.  doi:10.1016/j.mssp.2018.04.016.

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                    Hollowell, Andrew E., Arrington, Christian L., Finnegan, Patrick, Musick, Kate, Resnick, Paul, Volk, Steve, & Dagel, Amber L. Double sided grating fabrication for high energy X-ray phase contrast imaging.  United States.  https://doi.org/10.1016/j.mssp.2018.04.016

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                    Hollowell, Andrew E., Arrington, Christian L., Finnegan, Patrick, Musick, Kate, Resnick, Paul, Volk, Steve, and Dagel, Amber L. Thu .  
"Double sided grating fabrication for high energy X-ray phase contrast imaging".  United States.  https://doi.org/10.1016/j.mssp.2018.04.016.  https://www.osti.gov/servlets/purl/1457363.

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@article{osti_1457363,

  title        = {Double sided grating fabrication for high energy X-ray phase contrast imaging},

  author       = {Hollowell, Andrew E. and Arrington, Christian L. and Finnegan, Patrick and Musick, Kate and Resnick, Paul and Volk, Steve and Dagel, Amber L.},

  abstractNote = {State of the art grating fabrication currently limits the maximum source energy that can be used in lab based x-ray phase contrast imaging (XPCI) systems. In order to move to higher source energies, and image high density materials or image through encapsulating barriers, new grating fabrication methods are needed. In this work we have analyzed a new modality for grating fabrication that involves precision alignment of etched gratings on both sides of a substrate, effectively doubling the thickness of the grating. Furthermore, we have achieved a front-to-backside feature alignment accuracy of 0.5 µm demonstrating a methodology that can be applied to any grating fabrication approach extending the attainable aspect ratios allowing higher energy lab based XPCI systems.},

  doi          = {10.1016/j.mssp.2018.04.016},

  journal      = {Materials Science in Semiconductor Processing},

  number       = 2019,

  volume       = 92,

  place        = {United States},

  year         = {Thu Apr 19 00:00:00 EDT 2018},

  month        = {Thu Apr 19 00:00:00 EDT 2018}

}

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https://doi.org/10.1016/j.mssp.2018.04.016

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Cited by: 10 works

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Figures / Tables:

Figure 1: Integration approach for front to back aligned XPCI gratings. (a) Align, pattern and etch front and backside alignment marks. (b) Etch topside Si grating and fill with oxide to support fragile Si bars. (c) Flip substrate, pattern and etch backside Si grating. (d) Selectively etch oxide. (e) Depositmore »

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