Janus Membranes via Diffusion-Controlled Atomic Layer Deposition
Abstract
Abstract The first use of atomic layer deposition (ALD) to produce Janus membranes is reported, with an example system consisting of a compositional gradient ranging from hydrophilic Al 2 O 3 on one face to hydrophobic poly(propylene) on the opposite face. Alternating pulses of trimethyl aluminum and water vapor lead to the growth of covalently bonded Al 2 O 3 conforming to the membrane pore surfaces. Precise control of ALD parameters significantly affects the surface wetting of the modified membrane face and the depth of Al 2 O 3 infiltration into the porosity. This depth control derives from slow precursor diffusion through the 200 nm membrane pores compared to much faster ALD surface reactions. For a given precursor exposure and purge time, increasing the number of ALD cycles decreases the water contact angle at the modified surface from hydrophobic to hydrophilic, until the water droplet is completely imbibed by the membrane. To demonstrate the utility of these Janus membranes, a hydrophilic/superaerophobic Janus treatment is shown to greatly reduce the size of air bubbles generated through the membrane, enabling faster mixing. This technique represents the first application of vapor‐deposited covalently bonded metal oxides to form Janus membranes. Further opportunities are affordedmore »
- Authors:
-
- Univ. of Chicago, IL (United States). Inst. for Molecular Engineering
- (ANL), Argonne, IL (United States). Center for Nanoscale Materials
- Argonne National Lab. (ANL), Argonne, IL (United States). Center for Nanoscale Materials
- Argonne National Lab. (ANL), Argonne, IL (United States). Applied Materials Division
- (ANL), Argonne, IL (United States). Materials Science Division
- (ANL), Argonne, IL (United States). Inst. for Molecular Engineering
- Publication Date:
- Research Org.:
- Argonne National Laboratory (ANL), Argonne, IL (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- OSTI Identifier:
- 1466309
- Alternate Identifier(s):
- OSTI ID: 1452659
- Grant/Contract Number:
- AC02-06CH11357; DE‐AC02‐06CH11357
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Advanced Materials Interfaces
- Additional Journal Information:
- Journal Volume: 5; Journal Issue: 15; Journal ID: ISSN 2196-7350
- Publisher:
- Wiley-VCH
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; 37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY; atomic layer deposition; janus membranes; membranes; superaerophobic; wettability
Citation Formats
Waldman, Ruben Z., Argonne National Lab., Yang, Hao-Cheng, Mandia, David J., Nealey, Paul F., Argonne National Lab., Elam, Jeffrey W., Darling, Seth B., Argonne National Lab., and Argonne National Lab.. Janus Membranes via Diffusion-Controlled Atomic Layer Deposition. United States: N. p., 2018.
Web. doi:10.1002/admi.201800658.
Waldman, Ruben Z., Argonne National Lab., Yang, Hao-Cheng, Mandia, David J., Nealey, Paul F., Argonne National Lab., Elam, Jeffrey W., Darling, Seth B., Argonne National Lab., & Argonne National Lab.. Janus Membranes via Diffusion-Controlled Atomic Layer Deposition. United States. https://doi.org/10.1002/admi.201800658
Waldman, Ruben Z., Argonne National Lab., Yang, Hao-Cheng, Mandia, David J., Nealey, Paul F., Argonne National Lab., Elam, Jeffrey W., Darling, Seth B., Argonne National Lab., and Argonne National Lab.. Tue .
"Janus Membranes via Diffusion-Controlled Atomic Layer Deposition". United States. https://doi.org/10.1002/admi.201800658. https://www.osti.gov/servlets/purl/1466309.
@article{osti_1466309,
title = {Janus Membranes via Diffusion-Controlled Atomic Layer Deposition},
author = {Waldman, Ruben Z. and Argonne National Lab. and Yang, Hao-Cheng and Mandia, David J. and Nealey, Paul F. and Argonne National Lab. and Elam, Jeffrey W. and Darling, Seth B. and Argonne National Lab. and Argonne National Lab.},
abstractNote = {Abstract The first use of atomic layer deposition (ALD) to produce Janus membranes is reported, with an example system consisting of a compositional gradient ranging from hydrophilic Al 2 O 3 on one face to hydrophobic poly(propylene) on the opposite face. Alternating pulses of trimethyl aluminum and water vapor lead to the growth of covalently bonded Al 2 O 3 conforming to the membrane pore surfaces. Precise control of ALD parameters significantly affects the surface wetting of the modified membrane face and the depth of Al 2 O 3 infiltration into the porosity. This depth control derives from slow precursor diffusion through the 200 nm membrane pores compared to much faster ALD surface reactions. For a given precursor exposure and purge time, increasing the number of ALD cycles decreases the water contact angle at the modified surface from hydrophobic to hydrophilic, until the water droplet is completely imbibed by the membrane. To demonstrate the utility of these Janus membranes, a hydrophilic/superaerophobic Janus treatment is shown to greatly reduce the size of air bubbles generated through the membrane, enabling faster mixing. This technique represents the first application of vapor‐deposited covalently bonded metal oxides to form Janus membranes. Further opportunities are afforded by the ability to laterally pattern Al 2 O 3 across the membrane surface via physical masking.},
doi = {10.1002/admi.201800658},
journal = {Advanced Materials Interfaces},
number = 15,
volume = 5,
place = {United States},
year = {Tue Jun 12 00:00:00 EDT 2018},
month = {Tue Jun 12 00:00:00 EDT 2018}
}
Web of Science
Figures / Tables:
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