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This content will become publicly available on June 7, 2019

Title: The initial stages of ZnO atomic layer deposition on atomically flat In 0.53 Ga 0.47 As substrates

Growth per cycle. Visualizing the fabrication of a ZnO ultra-thin layer at the very early stage of ZnO ALD on InGaAs substrate, before the 3D growth mode begins.
Authors:
 [1] ;  [1] ;  [1] ; ORCiD logo [1] ;  [1] ;  [2] ;  [3] ; ORCiD logo [4] ; ORCiD logo [1]
  1. Univ. Grenoble Alpes, CNRS, F-38000 Grenoble, France
  2. Synchrotron SOLEIL - Beamline SIRIUS, L’ Orme des Merisiers, Saint-Aubin, France
  3. Materials Science Division, Argonne National Laboratory, Argonne, USA
  4. Aix-Marseille Université, CNRS, Université de Toulon, F-13397 Marseille, France
Publication Date:
Type:
Publisher's Accepted Manuscript
Journal Name:
Nanoscale
Additional Journal Information:
Journal Name: Nanoscale Journal Volume: 10 Journal Issue: 24; Journal ID: ISSN 2040-3364
Publisher:
Royal Society of Chemistry (RSC)
Sponsoring Org:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
Country of Publication:
United Kingdom
Language:
English
OSTI Identifier:
1441229