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Title: Tuning Excitonic Properties of Pure and Mixed Halide Perovskite Thin Films via Interfacial Engineering

Authors:
 [1] ;  [1] ;  [1] ;  [2] ;  [2] ; ORCiD logo [1]
  1. School of Natural Sciences, University of California, Merced CA 95344 USA
  2. School of Engineering, University of California, Merced CA 95344 USA
Publication Date:
Grant/Contract Number:
AC02-05CH11231
Type:
Publisher's Accepted Manuscript
Journal Name:
Advanced Materials Interfaces
Additional Journal Information:
Journal Name: Advanced Materials Interfaces Journal Volume: 5 Journal Issue: 14; Journal ID: ISSN 2196-7350
Publisher:
Wiley Blackwell (John Wiley & Sons)
Sponsoring Org:
USDOE
Country of Publication:
Germany
Language:
English
OSTI Identifier:
1441052

Nikolaidou, Katerina, Sarang, Som, Martin, Denzal, Tung, Vincent, Lu, Jennifer Q., and Ghosh, Sayantani. Tuning Excitonic Properties of Pure and Mixed Halide Perovskite Thin Films via Interfacial Engineering. Germany: N. p., Web. doi:10.1002/admi.201800209.
Nikolaidou, Katerina, Sarang, Som, Martin, Denzal, Tung, Vincent, Lu, Jennifer Q., & Ghosh, Sayantani. Tuning Excitonic Properties of Pure and Mixed Halide Perovskite Thin Films via Interfacial Engineering. Germany. doi:10.1002/admi.201800209.
Nikolaidou, Katerina, Sarang, Som, Martin, Denzal, Tung, Vincent, Lu, Jennifer Q., and Ghosh, Sayantani. 2018. "Tuning Excitonic Properties of Pure and Mixed Halide Perovskite Thin Films via Interfacial Engineering". Germany. doi:10.1002/admi.201800209.
@article{osti_1441052,
title = {Tuning Excitonic Properties of Pure and Mixed Halide Perovskite Thin Films via Interfacial Engineering},
author = {Nikolaidou, Katerina and Sarang, Som and Martin, Denzal and Tung, Vincent and Lu, Jennifer Q. and Ghosh, Sayantani},
abstractNote = {},
doi = {10.1002/admi.201800209},
journal = {Advanced Materials Interfaces},
number = 14,
volume = 5,
place = {Germany},
year = {2018},
month = {6}
}

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