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Title: Laser acceleration and deflection of 963 keV electrons with a silicon dielectric structure

Abstract

Radio frequency particle accelerators are ubiquitous in ultrasmall and ultrafast science, but their size and cost have prompted exploration of compact and scalable alternatives such as the dielectric laser accelerator. We present the first demonstration, to the best of our knowledge, of high gradient laser acceleration and deflection of electrons with a silicon structure. Driven by a 5 nJ, 130 fs mode-locked Ti:sapphire laser at 907 nm wavelength, our devices achieve accelerating gradients in excess of 200 MeV/m and suboptical cycle streaking of 96.30 keV electrons. Lastly, these results pave the way for high gradient silicon dielectric laser accelerators using commercial lasers and subfemtosecond electron beam experiments.

Authors:
 [1];  [1];  [2];  [3]
  1. Stanford Univ., CA (United States). Dept. of Electrical Engineering
  2. Stanford Univ., CA (United States). Dept. of Applied Physics
  3. Stanford Univ., CA (United States). Dept. of Electrical Engineering; Stanford Univ., CA (United States). Dept. of Applied Physics
Publication Date:
Research Org.:
Stanford Univ., CA (United States)
Sponsoring Org.:
USDOE; US Air Force Office of Scientific Research (AFOSR); Defense Advanced Research Projects Agency (DARPA)
OSTI Identifier:
1440981
Grant/Contract Number:  
SC0010511
Resource Type:
Accepted Manuscript
Journal Name:
Optica
Additional Journal Information:
Journal Volume: 2; Journal Issue: 2; Journal ID: ISSN 2334-2536
Publisher:
Optical Society of America
Country of Publication:
United States
Language:
English
Subject:
47 OTHER INSTRUMENTATION; 43 PARTICLE ACCELERATORS

Citation Formats

Leedle, Kenneth J., Fabian Pease, R., Byer, Robert L., and Harris, James S. Laser acceleration and deflection of 963 keV electrons with a silicon dielectric structure. United States: N. p., 2015. Web. doi:10.1364/OPTICA.2.000158.
Leedle, Kenneth J., Fabian Pease, R., Byer, Robert L., & Harris, James S. Laser acceleration and deflection of 963 keV electrons with a silicon dielectric structure. United States. doi:10.1364/OPTICA.2.000158.
Leedle, Kenneth J., Fabian Pease, R., Byer, Robert L., and Harris, James S. Thu . "Laser acceleration and deflection of 963 keV electrons with a silicon dielectric structure". United States. doi:10.1364/OPTICA.2.000158. https://www.osti.gov/servlets/purl/1440981.
@article{osti_1440981,
title = {Laser acceleration and deflection of 963 keV electrons with a silicon dielectric structure},
author = {Leedle, Kenneth J. and Fabian Pease, R. and Byer, Robert L. and Harris, James S.},
abstractNote = {Radio frequency particle accelerators are ubiquitous in ultrasmall and ultrafast science, but their size and cost have prompted exploration of compact and scalable alternatives such as the dielectric laser accelerator. We present the first demonstration, to the best of our knowledge, of high gradient laser acceleration and deflection of electrons with a silicon structure. Driven by a 5 nJ, 130 fs mode-locked Ti:sapphire laser at 907 nm wavelength, our devices achieve accelerating gradients in excess of 200 MeV/m and suboptical cycle streaking of 96.30 keV electrons. Lastly, these results pave the way for high gradient silicon dielectric laser accelerators using commercial lasers and subfemtosecond electron beam experiments.},
doi = {10.1364/OPTICA.2.000158},
journal = {Optica},
number = 2,
volume = 2,
place = {United States},
year = {2015},
month = {2}
}

Journal Article:
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Cited by: 19 works
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