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Title: High-Fidelity 3D-Nanoprinting via Focused Electron Beams: Computer-Aided Design (3BID)

Currently, there are few techniques that allow true 3D-printing on the nanoscale. The most promising candidate to fill this void is focused electron-beam-induced deposition (FEBID), a resist-free, nanofabrication compatible, direct-write method. The basic working principles of a computer-aided design (CAD) program (3BID) enabling 3D-FEBID is presented and simultaneously released for download. The 3BID capability significantly expands the currently limited toolbox for 3D-nanoprinting, providing access to geometries for optoelectronic, plasmonic, and nanomagnetic applications that were previously unattainable due to the lack of a suitable method for synthesis. In conclusion, the CAD approach supplants trial and error toward more precise/accurate FEBID required for real applications/device prototyping.
ORCiD logo [1] ;  [2] ;  [3] ; ORCiD logo [4] ;  [4] ; ORCiD logo [4] ; ORCiD logo [3] ;  [3] ; ORCiD logo [1] ; ORCiD logo [5]
  1. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); The Univ. of Tennessee, Knoxville, TN (United States)
  2. Graz Centre for Electron Microscopy, Graz (Austria)
  3. The Univ. of Tennessee, Knoxville, TN (United States)
  4. Univ. of Cambridge, Cambridge (United Kingdom)
  5. Graz Centre for Electron Microscopy, Graz (Austria); Graz Univ. of Technology, Graz (Austria)
Publication Date:
Grant/Contract Number:
Accepted Manuscript
Journal Name:
ACS Applied Nano Materials
Additional Journal Information:
Journal Volume: 1; Journal Issue: 3; Journal ID: ISSN 2574-0970
Research Org:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Sponsoring Org:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
Country of Publication:
United States
77 NANOSCIENCE AND NANOTECHNOLOGY; 3D-nanoprinting; additive manufacturing; computer-aided design; direct write; focused electron beam induced deposition
OSTI Identifier: