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Title: Tuning oxidation level, electrical conductance and band gap structure on graphene sheets by cyclic atomic layer reduction technique

Journal Article · · Carbon
 [1];  [2];  [3];  [4]; ORCiD logo [5]; ORCiD logo [6]
  1. Xiamen Univ. of Technology, Xiamen, Fujian (China). Fujian Provincial Key Lab. of Functional Materials and Applications, Inst. of Material Preparation and Applied Technology, School of Materials Science and Engineering
  2. Yuan Ze Univ. Taoyuan (Taiwan). Dept. of Chemical Engineering and Materials Science; Univ. of Tennessee, Knoxville, TN (United States). Dept. of Mechanical, Aerospace, and Biomedical Engineering
  3. Yuan Ze Univ. Taoyuan (Taiwan). Dept. of Chemical Engineering and Materials Science
  4. Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States). Dept. of Nuclear Science and Engineering and Dept. of Materials Science and Engineering; National Central Univ., Taoyuan (Taiwan). Inst. of Materials Science and Engineering
  5. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Energy and Transportation Science Division
  6. Univ. of Tennessee, Knoxville, TN (United States). Dept. of Mechanical, Aerospace, and Biomedical Engineering
+ Show Author Affiliations

The present work develops an atomic layer reduction (ALR) method to accurately tune oxidation level, electrical conductance, band-gap structure, and photoluminescence (PL) response of graphene oxide (GO) sheets. The ALR route is carried out at 200 °C within ALR cycle number of 10–100. The ALR treatment is capable of striping surface functionalities (e.g., hydroxyl, carbonyl, and carboxylic groups), producing thermally-reduced GO sheets. The ALR cycle number serves as a controlling factor in adjusting the crystalline, surface chemistry, electrical, optical properties of GO sheets. With increasing the ALR cycle number, ALR-GO sheets display a high crystallinity, a low oxidation level, an improved electrical conductivity, a narrow band gap, and a tunable PL response. Finally, on the basis of the results, the ALR technique offers a great potential for accurately tune electrical and optical properties of carbon materials through the cyclic removal of oxygen functionalities, without any complicated thermal and chemical desorption processes.

Research Organization:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
Sponsoring Organization:
USDOE Office of Energy Efficiency and Renewable Energy (EERE)
Grant/Contract Number:
AC05-00OR22725
OSTI ID:
1439927
Journal Information:
Carbon, Journal Name: Carbon Journal Issue: C Vol. 137; ISSN 0008-6223
Publisher:
ElsevierCopyright Statement
Country of Publication:
United States
Language:
English

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Cited By (3)

Linear control of the oxidation level on graphene oxide sheets using the cyclic atomic layer reduction technique journal January 2019
Graphene materials as a superior platform for advanced sensing strategies against gaseous ammonia journal January 2018
Amino-functionalization on graphene oxide sheets using an atomic layer amidation technique journal January 2020

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