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Title: Interfacial phonon scattering and transmission loss in > 1 µm thick silicon-on-insulator thin films

Abstract

Scattering of phonons at boundaries of a crystal (grains, surfaces, or solid/solid interfaces) is characterized by the phonon wavelength, the angle of incidence, and the interface roughness, as historically evaluated using a specularity parameter p formulated by Ziman [Electrons and Phonons (Clarendon Press, Oxford, 1960)]. This parameter was initially defined to determine the probability of a phonon specularly reflecting or diffusely scattering from the rough surface of a material. The validity of Ziman's theory as extended to solid/solid interfaces has not been previously validated. Here, to better understand the interfacial scattering of phonons and to test the validity of Ziman's theory, we precisely measured the in-plane thermal conductivity of a series of Si films in silicon-on-insulator (SOI) wafers by time-domain thermoreflectance (TDTR) for a Si film thickness range of 1–10 μm and a temperature range of 100–300 K. The Si/SiO2 interface roughness was determined to be 0.11±0.04nm using transmission electron microscopy (TEM). Furthermore, we compared our in-plane thermal conductivity measurements to theoretical calculations that combine first-principles phonon transport with Ziman's theory. Calculations using Ziman's specularity parameter significantly overestimate values from the TDTR measurements. We attribute this discrepancy to phonon transmission through the solid/solid interface into the substrate, which is notmore » accounted for by Ziman's theory for surfaces. The phonons that are specularly transmitted into an amorphous layer will be sufficiently randomized by the time they come back to the crystalline Si layer, the effect of which is practically equivalent to a diffuse reflection at the interface. Finally, we derive a simple expression for the specularity parameter at solid/amorphous interfaces and achieve good agreement between calculations and measurement values.« less

Authors:
 [1]; ORCiD logo [2];  [1];  [1]
  1. National University of Singapore (Singapore). Department of Mechanical Engineering
  2. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Materials Science and Technology Division
Publication Date:
Research Org.:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1439937
Alternate Identifier(s):
OSTI ID: 1437515
Grant/Contract Number:  
AC05-00OR22725
Resource Type:
Accepted Manuscript
Journal Name:
Physical Review B
Additional Journal Information:
Journal Volume: 97; Journal Issue: 19; Journal ID: ISSN 2469-9950
Publisher:
American Physical Society (APS)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY

Citation Formats

Jiang, Puqing, Lindsay, Lucas R., Huang, Xi, and Koh, Yee Kan. Interfacial phonon scattering and transmission loss in >1 µm thick silicon-on-insulator thin films. United States: N. p., 2018. Web. doi:10.1103/PhysRevB.97.195308.
Jiang, Puqing, Lindsay, Lucas R., Huang, Xi, & Koh, Yee Kan. Interfacial phonon scattering and transmission loss in >1 µm thick silicon-on-insulator thin films. United States. https://doi.org/10.1103/PhysRevB.97.195308
Jiang, Puqing, Lindsay, Lucas R., Huang, Xi, and Koh, Yee Kan. Thu . "Interfacial phonon scattering and transmission loss in >1 µm thick silicon-on-insulator thin films". United States. https://doi.org/10.1103/PhysRevB.97.195308. https://www.osti.gov/servlets/purl/1439937.
@article{osti_1439937,
title = {Interfacial phonon scattering and transmission loss in >1 µm thick silicon-on-insulator thin films},
author = {Jiang, Puqing and Lindsay, Lucas R. and Huang, Xi and Koh, Yee Kan},
abstractNote = {Scattering of phonons at boundaries of a crystal (grains, surfaces, or solid/solid interfaces) is characterized by the phonon wavelength, the angle of incidence, and the interface roughness, as historically evaluated using a specularity parameter p formulated by Ziman [Electrons and Phonons (Clarendon Press, Oxford, 1960)]. This parameter was initially defined to determine the probability of a phonon specularly reflecting or diffusely scattering from the rough surface of a material. The validity of Ziman's theory as extended to solid/solid interfaces has not been previously validated. Here, to better understand the interfacial scattering of phonons and to test the validity of Ziman's theory, we precisely measured the in-plane thermal conductivity of a series of Si films in silicon-on-insulator (SOI) wafers by time-domain thermoreflectance (TDTR) for a Si film thickness range of 1–10 μm and a temperature range of 100–300 K. The Si/SiO2 interface roughness was determined to be 0.11±0.04nm using transmission electron microscopy (TEM). Furthermore, we compared our in-plane thermal conductivity measurements to theoretical calculations that combine first-principles phonon transport with Ziman's theory. Calculations using Ziman's specularity parameter significantly overestimate values from the TDTR measurements. We attribute this discrepancy to phonon transmission through the solid/solid interface into the substrate, which is not accounted for by Ziman's theory for surfaces. The phonons that are specularly transmitted into an amorphous layer will be sufficiently randomized by the time they come back to the crystalline Si layer, the effect of which is practically equivalent to a diffuse reflection at the interface. Finally, we derive a simple expression for the specularity parameter at solid/amorphous interfaces and achieve good agreement between calculations and measurement values.},
doi = {10.1103/PhysRevB.97.195308},
journal = {Physical Review B},
number = 19,
volume = 97,
place = {United States},
year = {Thu May 17 00:00:00 EDT 2018},
month = {Thu May 17 00:00:00 EDT 2018}
}

Journal Article:

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Cited by: 13 works
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Figures / Tables:

Figure 1 Figure 1: (a) Schematic of TDTR setup to measure the in-plane thermal conductivity of Si films; (b) Temperature profile in a 2-μm-thick SOI during TDTR measurements. (c) TEM image of the cross-section of our 5-μm-thick SOI wafer; (d) Digitized Si/SiO2 interface for roughness estimation. We obtained the RMS roughness $𝜂$more » as 0.11 ± 0.04 nm for this Si/SiO2 interface of our SOI wafer.« less

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