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Title: In situ observation of atomic movement in a ferroelectric film under an external electric field and stress

Atomic movement under application of external stimuli (i.e., electric field or mechanical stress) in oxide materials has not been observed due to a lack of experimental methods but has been well known to determine the electric polarization. Here, we investigated atomic movement arising from the ferroelectric response of BiFeO 3 thin films under the effect of an electric field and stress in real time using a combination of switching spectroscopy, time-resolved X-ray microdiffraction, and in situ stress engineering. Under an electric field applied to a BiFeO 3 film, the hysteresis loop of the reflected X-ray intensity was found to result from the opposing directions of displaced atoms between the up and down polarization states. An additional shift of atoms arising from the linearly increased dielectric component of the polarization in BiFeO 3 was confirmed through gradual reduction of the diffracted X-ray intensity. The electric-fieldinduced displacement of oxygen atoms was found to be larger than that of Fe atom for both ferroelectric switching and increase of the polarization. In conclusion, the effect of external stress on the BiFeO 3 thin film, which was controlled by applying an electric field to the highly piezoelectric substrate, showed smaller atomic shifts than for themore » case of applying an electric field to the film, despite the similar tetragonality.« less
 [1] ; ORCiD logo [2] ;  [3] ;  [1] ;  [4] ;  [5] ;  [3] ;  [1]
  1. Gwangju Institute of Science and Technology, Gwangju (Republic of Korea)
  2. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Martin-Luther-Univ., Halle (Germany)
  3. Pusan National Univ., Busan (Republic of Korea)
  4. Pohang Accelerator Lab., Pohang (Republic of Korea)
  5. Martin-Luther-Univ., Halle (Germany)
Publication Date:
Grant/Contract Number:
Accepted Manuscript
Journal Name:
Nano Research
Additional Journal Information:
Journal Name: Nano Research; Journal ID: ISSN 1998-0124
Research Org:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Sponsoring Org:
Country of Publication:
United States
74 ATOMIC AND MOLECULAR PHYSICS; in situ measurement; atomic displacement under electric field; time-resolved X-ray microdiffraction; ferroelectrics; in situ strain engineering
OSTI Identifier: