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Title: Phototunable Dielectric Huygens' Metasurfaces

Authors:
 [1];  [2];  [1];  [2];  [2]; ORCiD logo [1]
  1. Department of Electrical and Computer Engineering, Duke University, Box 90291 Durham NC 27708 USA
  2. Department of Physics, The University of California at San Diego, La Jolla CA 92093 USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1432591
Grant/Contract Number:  
SC0014372
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Advanced Materials
Additional Journal Information:
Journal Name: Advanced Materials Journal Volume: 30 Journal Issue: 22; Journal ID: ISSN 0935-9648
Publisher:
Wiley Blackwell (John Wiley & Sons)
Country of Publication:
Germany
Language:
English

Citation Formats

Fan, Kebin, Zhang, Jingdi, Liu, Xinyu, Zhang, Gu-Feng, Averitt, Richard D., and Padilla, Willie J. Phototunable Dielectric Huygens' Metasurfaces. Germany: N. p., 2018. Web. doi:10.1002/adma.201800278.
Fan, Kebin, Zhang, Jingdi, Liu, Xinyu, Zhang, Gu-Feng, Averitt, Richard D., & Padilla, Willie J. Phototunable Dielectric Huygens' Metasurfaces. Germany. doi:10.1002/adma.201800278.
Fan, Kebin, Zhang, Jingdi, Liu, Xinyu, Zhang, Gu-Feng, Averitt, Richard D., and Padilla, Willie J. Mon . "Phototunable Dielectric Huygens' Metasurfaces". Germany. doi:10.1002/adma.201800278.
@article{osti_1432591,
title = {Phototunable Dielectric Huygens' Metasurfaces},
author = {Fan, Kebin and Zhang, Jingdi and Liu, Xinyu and Zhang, Gu-Feng and Averitt, Richard D. and Padilla, Willie J.},
abstractNote = {},
doi = {10.1002/adma.201800278},
journal = {Advanced Materials},
number = 22,
volume = 30,
place = {Germany},
year = {2018},
month = {4}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1002/adma.201800278

Citation Metrics:
Cited by: 10 works
Citation information provided by
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