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Title: Origin of dielectric relaxor behavior in PVDF-based copolymer and terpolymer films

Authors:
 [1] ; ORCiD logo [2] ;  [3] ;  [4] ;  [2] ;  [2] ;  [5] ;  [6] ; ORCiD logo [2]
  1. Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, Hong Kong
  2. Neutron Scattering Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, United States of America
  3. Neutron Scattering Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, United States of America, Juelich Center for Neutron Scattering (JCNS -1), Forschungszentrum Juelich, Juelich 52425, Germany
  4. Kazuo Inamori School of Engineering, Alfred University, Alfred, New York 14802, United States of America
  5. Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, United States of America
  6. Neutron Scattering Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, United States of America, Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, United States of America
Publication Date:
Type:
Publisher's Accepted Manuscript
Journal Name:
AIP Advances
Additional Journal Information:
Journal Name: AIP Advances Journal Volume: 8 Journal Issue: 4; Journal ID: ISSN 2158-3226
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1431385

Pramanick, Abhijit, Osti, Naresh C., Jalarvo, Niina, Misture, Scott T., Diallo, Souleymane Omar, Mamontov, Eugene, Luo, Y., Keum, Jong-Kahk, and Littrell, Ken. Origin of dielectric relaxor behavior in PVDF-based copolymer and terpolymer films. United States: N. p., Web. doi:10.1063/1.5014992.
Pramanick, Abhijit, Osti, Naresh C., Jalarvo, Niina, Misture, Scott T., Diallo, Souleymane Omar, Mamontov, Eugene, Luo, Y., Keum, Jong-Kahk, & Littrell, Ken. Origin of dielectric relaxor behavior in PVDF-based copolymer and terpolymer films. United States. doi:10.1063/1.5014992.
Pramanick, Abhijit, Osti, Naresh C., Jalarvo, Niina, Misture, Scott T., Diallo, Souleymane Omar, Mamontov, Eugene, Luo, Y., Keum, Jong-Kahk, and Littrell, Ken. 2018. "Origin of dielectric relaxor behavior in PVDF-based copolymer and terpolymer films". United States. doi:10.1063/1.5014992.
@article{osti_1431385,
title = {Origin of dielectric relaxor behavior in PVDF-based copolymer and terpolymer films},
author = {Pramanick, Abhijit and Osti, Naresh C. and Jalarvo, Niina and Misture, Scott T. and Diallo, Souleymane Omar and Mamontov, Eugene and Luo, Y. and Keum, Jong-Kahk and Littrell, Ken},
abstractNote = {},
doi = {10.1063/1.5014992},
journal = {AIP Advances},
number = 4,
volume = 8,
place = {United States},
year = {2018},
month = {4}
}