Very fast hot carrier diffusion in unconstrained MoS 2 on a glass substrate: discovered by picosecond ET-Raman
Abstract
The currently reported optical-phonon-scattering-limited carrier mobility of MoS2 is up to 417 cm2 V–1 s–1 with two-side dielectric screening: one normal-κ side and one high-κ side. Herein, using picosecond energy transport state-resolved Raman (ET-Raman), we demonstrated very fast hot carrier diffusion in μm-scale (lateral) unconstrained MoS2 (1.8–18 nm thick) on a glass substrate; this method enables only one-side normal-κ dielectric screening. The ET-Raman method directly probes the diffusion of the hot carrier and its contribution to phonon transfer without contact and additional sample preparation and provides unprecedented insight into the intrinsic D of MoS2. The calculated D values span from 0.76 to 9.7 cm2 s–1. A nonmonotonic thickness-dependent D trend is discovered, and it peaks at 3.0 nm thickness. This is explained by the competition between two physical phenomena: with an increase in sample thickness, the increased screening of the substrate results in higher mobility; moreover, thicker samples are subject to more surface contamination, loose substrate contact and weaker substrate dielectric screening. The corresponding carrier mobility varies from 31.0 to 388.5 cm2 V–1 s–1. This mobility is surprisingly high considering the normal-κ and single side dielectric screening by the glass substrate. This is a direct result of the less-damaged structuremore »
- Authors:
-
- Department of Mechanical Engineering, Iowa State University, Ames, USA
- School of Energy and Power Engineering, Nanjing University of Science and Technology, Nanjing, China
- Publication Date:
- Research Org.:
- Iowa State Univ., Ames, IA (United States)
- Sponsoring Org.:
- USDOE Office of Nuclear Energy (NE); National Science Foundation (NSF)
- OSTI Identifier:
- 1431157
- Alternate Identifier(s):
- OSTI ID: 1547353
- Grant/Contract Number:
- DENE0000671; NE0000671
- Resource Type:
- Published Article
- Journal Name:
- RSC Advances
- Additional Journal Information:
- Journal Name: RSC Advances Journal Volume: 8 Journal Issue: 23; Journal ID: ISSN 2046-2069
- Publisher:
- Royal Society of Chemistry (RSC)
- Country of Publication:
- United Kingdom
- Language:
- English
- Subject:
- 37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
Citation Formats
Yuan, Pengyu, Tan, Hong, Wang, Ridong, Wang, Tianyu, and Wang, Xinwei. Very fast hot carrier diffusion in unconstrained MoS 2 on a glass substrate: discovered by picosecond ET-Raman. United Kingdom: N. p., 2018.
Web. doi:10.1039/C8RA01106K.
Yuan, Pengyu, Tan, Hong, Wang, Ridong, Wang, Tianyu, & Wang, Xinwei. Very fast hot carrier diffusion in unconstrained MoS 2 on a glass substrate: discovered by picosecond ET-Raman. United Kingdom. https://doi.org/10.1039/C8RA01106K
Yuan, Pengyu, Tan, Hong, Wang, Ridong, Wang, Tianyu, and Wang, Xinwei. Mon .
"Very fast hot carrier diffusion in unconstrained MoS 2 on a glass substrate: discovered by picosecond ET-Raman". United Kingdom. https://doi.org/10.1039/C8RA01106K.
@article{osti_1431157,
title = {Very fast hot carrier diffusion in unconstrained MoS 2 on a glass substrate: discovered by picosecond ET-Raman},
author = {Yuan, Pengyu and Tan, Hong and Wang, Ridong and Wang, Tianyu and Wang, Xinwei},
abstractNote = {The currently reported optical-phonon-scattering-limited carrier mobility of MoS2 is up to 417 cm2 V–1 s–1 with two-side dielectric screening: one normal-κ side and one high-κ side. Herein, using picosecond energy transport state-resolved Raman (ET-Raman), we demonstrated very fast hot carrier diffusion in μm-scale (lateral) unconstrained MoS2 (1.8–18 nm thick) on a glass substrate; this method enables only one-side normal-κ dielectric screening. The ET-Raman method directly probes the diffusion of the hot carrier and its contribution to phonon transfer without contact and additional sample preparation and provides unprecedented insight into the intrinsic D of MoS2. The calculated D values span from 0.76 to 9.7 cm2 s–1. A nonmonotonic thickness-dependent D trend is discovered, and it peaks at 3.0 nm thickness. This is explained by the competition between two physical phenomena: with an increase in sample thickness, the increased screening of the substrate results in higher mobility; moreover, thicker samples are subject to more surface contamination, loose substrate contact and weaker substrate dielectric screening. The corresponding carrier mobility varies from 31.0 to 388.5 cm2 V–1 s–1. This mobility is surprisingly high considering the normal-κ and single side dielectric screening by the glass substrate. This is a direct result of the less-damaged structure of MoS2 that is superior to those of MoS2 samples reported in literature studies that are subjected to various post-processing techniques to facilitate measurement. The very high hot carrier mobility reduces the local carrier concentration and enhances the Raman signal, which is also validated by our Raman signal studies and comparison with theoretical studies.},
doi = {10.1039/C8RA01106K},
journal = {RSC Advances},
number = 23,
volume = 8,
place = {United Kingdom},
year = {Mon Jan 01 00:00:00 EST 2018},
month = {Mon Jan 01 00:00:00 EST 2018}
}
https://doi.org/10.1039/C8RA01106K
Web of Science
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