Negligible Electronic Interaction between Photoexcited Electron–Hole Pairs and Free Electrons in Phosphorus–Boron Co-Doped Silicon Nanocrystals
Abstract
Phosphorus (P) and boron (B) co-doped Si nanocrystals (NCs) have raised interest in the optoelectronic industry due to their electronic tunability, optimal carrier multiplication properties, and straightforward dispersibility in polar solvents. Yet a basic understanding of the interaction of photoexcited electron-hole (e-h) pairs with new physical features that are introduced by the co-doping process (free carriers, defect states, and surface chemistry) is missing. Here, we present the first study of the ultrafast carrier dynamics in SiO2-embedded P-B co-doped Si NC ensembles using induced absorption spectroscopy through a two-step approach. First, the induced absorption data show that the large fraction of the dopants residing on the NC surface slows down carrier relaxation dynamics within the first 20 ps relative to intrinsic (undoped) Si NCs, which we interpret as enhanced surface passivation. On longer time-scales (picosecond to nanosecond regime), we observe a speeding up of the carrier relaxation dynamics and ascribe it to doping-induced trap states. This argument is deduced from the second part of the study, where we investigate multiexciton interactions. From a stochastic modeling approach we show that localized carriers, which are introduced by the P or B dopants, have minor electronic interactions with the photoexcited e-h pairs. This ismore »
- Authors:
-
- National Renewable Energy Laboratory, 15013 Denver West Parkway, Golden, Colorado 80401, United States
- Department of Electrical and Electronic Engineering, Kobe University, Rokkodai, Nada, Kobe 657-8501, Japan
- Van der Waals-Zeeman, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, The Netherlands
- Publication Date:
- Research Org.:
- National Renewable Energy Laboratory (NREL), Golden, CO (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES). Chemical Sciences, Geosciences, and Biosciences Division
- OSTI Identifier:
- 1427876
- Alternate Identifier(s):
- OSTI ID: 1435709; OSTI ID: 1508756
- Report Number(s):
- NREL/JA-5900-70658
Journal ID: ISSN 1932-7447
- Grant/Contract Number:
- AC36- 08GO28308; AC36-08GO28308
- Resource Type:
- Published Article
- Journal Name:
- Journal of Physical Chemistry. C
- Additional Journal Information:
- Journal Name: Journal of Physical Chemistry. C Journal Volume: 122 Journal Issue: 11; Journal ID: ISSN 1932-7447
- Publisher:
- American Chemical Society
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 14 SOLAR ENERGY; 36 MATERIALS SCIENCE; ultrafast; phosphorous-boron; nanocrystals
Citation Formats
Limpens, Rens, Fujii, Minoru, Neale, Nathan R., and Gregorkiewicz, Tom. Negligible Electronic Interaction between Photoexcited Electron–Hole Pairs and Free Electrons in Phosphorus–Boron Co-Doped Silicon Nanocrystals. United States: N. p., 2018.
Web. doi:10.1021/acs.jpcc.7b12313.
Limpens, Rens, Fujii, Minoru, Neale, Nathan R., & Gregorkiewicz, Tom. Negligible Electronic Interaction between Photoexcited Electron–Hole Pairs and Free Electrons in Phosphorus–Boron Co-Doped Silicon Nanocrystals. United States. https://doi.org/10.1021/acs.jpcc.7b12313
Limpens, Rens, Fujii, Minoru, Neale, Nathan R., and Gregorkiewicz, Tom. Mon .
"Negligible Electronic Interaction between Photoexcited Electron–Hole Pairs and Free Electrons in Phosphorus–Boron Co-Doped Silicon Nanocrystals". United States. https://doi.org/10.1021/acs.jpcc.7b12313.
@article{osti_1427876,
title = {Negligible Electronic Interaction between Photoexcited Electron–Hole Pairs and Free Electrons in Phosphorus–Boron Co-Doped Silicon Nanocrystals},
author = {Limpens, Rens and Fujii, Minoru and Neale, Nathan R. and Gregorkiewicz, Tom},
abstractNote = {Phosphorus (P) and boron (B) co-doped Si nanocrystals (NCs) have raised interest in the optoelectronic industry due to their electronic tunability, optimal carrier multiplication properties, and straightforward dispersibility in polar solvents. Yet a basic understanding of the interaction of photoexcited electron-hole (e-h) pairs with new physical features that are introduced by the co-doping process (free carriers, defect states, and surface chemistry) is missing. Here, we present the first study of the ultrafast carrier dynamics in SiO2-embedded P-B co-doped Si NC ensembles using induced absorption spectroscopy through a two-step approach. First, the induced absorption data show that the large fraction of the dopants residing on the NC surface slows down carrier relaxation dynamics within the first 20 ps relative to intrinsic (undoped) Si NCs, which we interpret as enhanced surface passivation. On longer time-scales (picosecond to nanosecond regime), we observe a speeding up of the carrier relaxation dynamics and ascribe it to doping-induced trap states. This argument is deduced from the second part of the study, where we investigate multiexciton interactions. From a stochastic modeling approach we show that localized carriers, which are introduced by the P or B dopants, have minor electronic interactions with the photoexcited e-h pairs. This is understood in light of the strong localization of the introduced carriers on their original P- or B-dopant atoms, due to the strong quantum confinement regime in these relatively small NCs (<6 nm).},
doi = {10.1021/acs.jpcc.7b12313},
journal = {Journal of Physical Chemistry. C},
number = 11,
volume = 122,
place = {United States},
year = {Mon Mar 05 00:00:00 EST 2018},
month = {Mon Mar 05 00:00:00 EST 2018}
}
https://doi.org/10.1021/acs.jpcc.7b12313
Web of Science
Figures / Tables:
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