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This content will become publicly available on January 9, 2019

Title: Unraveling the Role of Order-to-Disorder Transition in Shear Thickening Suspensions

Using high resolution in situ small angle x-ray scattering in conjunction with oscillatory shear on highly monodisperse silica suspensions, we demonstrate that an order-to-disorder transition leads to a dynamic shear thickening in a lower stress regime than the standard steady shear thickening. We show that the order-to-disorder transition is controlled by strain, which is distinguishably different from steady shear thickening which is a stress related phenomenon. The appearance of this two-step shear thinning and thickening transition is also influenced by particle size, monodispersity and measurement conditions (i.e. oscillatory shear vs. steady shear). Our results show definitively that the order-to-disorder transition induced thickening is completely unrelated to the mechanism that drives the steady shear thickening.
 [1] ;  [1] ;  [1] ;  [1] ;  [1] ;  [2]
  1. Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
  2. Argonne National Lab. (ANL), Argonne, IL (United States). Center for Nanoscale Materials
Publication Date:
Grant/Contract Number:
Accepted Manuscript
Journal Name:
Physical Review Letters
Additional Journal Information:
Journal Volume: 120; Journal Issue: 2; Journal ID: ISSN 0031-9007
American Physical Society (APS)
Research Org:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22); National Science Foundation (NSF)
Country of Publication:
United States
36 MATERIALS SCIENCE; Microstructure formation; Rheology; SAXS; Shear thickening; Shear thickening, Colloids, complex fluids, x-ray scattering; Shear thinning
OSTI Identifier:
Alternate Identifier(s):
OSTI ID: 1416226