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Title: Vacancy-Rich Monolayer BiO 2-x as a Highly Efficient UV, Visible, and Near-Infrared Responsive Photocatalyst

Here in this paper, a full-spectrum responsive vacancy-rich monolayer BiO 2-x has been synthesized. The increased density of states at the conduction band (CB) minimum in the monolayer BiO 2-x is responsible for the enhanced photon response and photo-absorption, which were confirmed by UV/Vis-NIR diffuse reflectance spectra (DRS) and photocurrent measurements. Compared to bulk BiO 2-x, monolayer BiO 2-x has exhibited enhanced photocatalytic performance for rhodamine B and phenol removal under UV, visible, and near-infrared light (NIR) irradiation, which can be attributed to the vacancy VBi-O"' as confirmed by the positron annihilation spectra. The presence of V Bi-O"' defects in monolayer BiO 2-x promoted the separation of electrons and holes. This finding provides an atomic level understanding for developing highly efficient UV, visible, and NIR light responsive photocatalysts.
Authors:
 [1] ;  [2] ;  [3] ;  [2] ;  [4]
  1. Wuhan Univ. of Technology (China). Hubei Key Lab. of Mineral Resources Processing and Environment, State Key Lab. of Silicate Materials for Architectures
  2. Wuhan Univ. of Technology (China). Hubei Key Lab. of Mineral Resources Processing and Environment, State Key Lab. of Silicate Materials for Architectures
  3. Wuhan Univ. (China). Hubei Nuclear Solid Physics Key Lab., Dept. of Physics
  4. SLAC National Accelerator Lab., Menlo Park, CA (United States). Stanford Synchrotron Radiation Lightsource (SSRL); Stanford Univ., CA (United States)
Publication Date:
Grant/Contract Number:
AC02-76SF00515
Type:
Accepted Manuscript
Journal Name:
Angewandte Chemie (International Edition)
Additional Journal Information:
Journal Name: Angewandte Chemie (International Edition); Journal Volume: 57; Journal Issue: 2; Journal ID: ISSN 1433-7851
Publisher:
Wiley
Research Org:
SLAC National Accelerator Lab., Menlo Park, CA (United States)
Sponsoring Org:
USDOE; National Natural Science Foundation of China (NNSFC); Wallenberg Foundation
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; Band gap; bismuth oxides; monolayers; oxygen vacancies; photocatalysts
OSTI Identifier:
1427173