Measured radial dependence of the peak sheath voltages present in very high frequency capacitive discharges

Barnat, E. V.; Miller, P. A.; Hebner, G. A.; Paterson, A. M.; Panagopoulos, Theodoros; Hammond, Edward; Holland, J.

doi:10.1063/1.2735934

Title: Measured radial dependence of the peak sheath voltages present in very high frequency capacitive discharges

Abstract

In this paper, the radial distribution of the measured voltage drop across a sheath formed between a 300mm electrode and an argon plasma discharge is shown to depend on the excitation radio frequency, under constant power and pressure conditions. At a lower frequency of 13.56MHz, the voltage drop across the sheath is uniform across the 300mm electrode, while at higher frequencies of 60 and 162MHz the voltage drop becomes radially nonuniform. Finally, the magnitude and spatial extent of the nonuniformity become greater with increasing frequency.

Authors:

Barnat, E. V. ^[1]; Miller, P. A. ^[1]; Hebner, G. A. ^[1]; Paterson, A. M. ^[2]; Panagopoulos, Theodoros ^[2]; Hammond, Edward ^[2]; Holland, J. ^[2]

Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Applied Materials, Sunnyvale, CA (United States)

Publication Date:: Wed May 16 00:00:00 EDT 2007

Research Org.:: Sandia National Lab. (SNL-NM), Albuquerque, NM (United States); Applied Materials, Sunnyvale, CA (United States)

Sponsoring Org.:: USDOE National Nuclear Security Administration (NNSA)

OSTI Identifier:: 1426990

Report Number(s):: SAND2007-0647J
Journal ID: ISSN 0003-6951; 524095

Grant/Contract Number:: AC04-94AL85000

Resource Type:: Accepted Manuscript

Journal Name:: Applied Physics Letters

Additional Journal Information:: Journal Volume: 90; Journal Issue: 20; Journal ID: ISSN 0003-6951

Publisher:: American Institute of Physics (AIP)

Country of Publication:: United States

Language:: English

Subject:: 70 PLASMA PHYSICS AND FUSION TECHNOLOGY

Citation Formats


                    Barnat, E. V., Miller, P. A., Hebner, G. A., Paterson, A. M., Panagopoulos, Theodoros, Hammond, Edward, and Holland, J. Measured radial dependence of the peak sheath voltages present in very high frequency capacitive discharges.  United States: N. p., 2007. 
Web.  doi:10.1063/1.2735934.

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                    Barnat, E. V., Miller, P. A., Hebner, G. A., Paterson, A. M., Panagopoulos, Theodoros, Hammond, Edward, & Holland, J. Measured radial dependence of the peak sheath voltages present in very high frequency capacitive discharges.  United States.  https://doi.org/10.1063/1.2735934

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                    Barnat, E. V., Miller, P. A., Hebner, G. A., Paterson, A. M., Panagopoulos, Theodoros, Hammond, Edward, and Holland, J. Wed .  
"Measured radial dependence of the peak sheath voltages present in very high frequency capacitive discharges".  United States.  https://doi.org/10.1063/1.2735934.  https://www.osti.gov/servlets/purl/1426990.

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@article{osti_1426990,

  title        = {Measured radial dependence of the peak sheath voltages present in very high frequency capacitive discharges},

  author       = {Barnat, E. V. and Miller, P. A. and Hebner, G. A. and Paterson, A. M. and Panagopoulos, Theodoros and Hammond, Edward and Holland, J.},

  abstractNote = {In this paper, the radial distribution of the measured voltage drop across a sheath formed between a 300mm electrode and an argon plasma discharge is shown to depend on the excitation radio frequency, under constant power and pressure conditions. At a lower frequency of 13.56MHz, the voltage drop across the sheath is uniform across the 300mm electrode, while at higher frequencies of 60 and 162MHz the voltage drop becomes radially nonuniform. Finally, the magnitude and spatial extent of the nonuniformity become greater with increasing frequency.},

  doi          = {10.1063/1.2735934},

  journal      = {Applied Physics Letters},

  number       = 20,

  volume       = 90,

  place        = {United States},

  year         = {Wed May 16 00:00:00 EDT 2007},

  month        = {Wed May 16 00:00:00 EDT 2007}

}

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Works referenced in this record:

Capacitively coupled glow discharges at frequencies above 13.56 MHz
journal, October 1991

Surendra, M.; Graves, D. B.
Applied Physics Letters, Vol. 59, Issue 17
DOI: 10.1063/1.106112

Self-consistent nonlinear transmission line model of standing wave effects in a capacitive discharge
journal, May 2004

Chabert, P.; Raimbault, J. L.; Rax, J. M.
Physics of Plasmas, Vol. 11, Issue 5
DOI: 10.1063/1.1688334

rf Electrode Sheath Formation near a Concave Electrode
journal, February 2004

Orlov, K. E.; Malik, D. A.; Chernoiziumskaya, T. V.
Physical Review Letters, Vol. 92, Issue 5
DOI: 10.1103/PhysRevLett.92.055001

Frequency effects in plasma etching
journal, May 1986

Flamm, Daniel L.
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 4, Issue 3
DOI: 10.1116/1.573821

A computational investigation of the RF plasma structures and their production efficiency in the frequency range from HF to VHF
journal, February 1993

Kitamura, T.; Nakano, N.; Makabe, T.
Plasma Sources Science and Technology, Vol. 2, Issue 1
DOI: 10.1088/0963-0252/2/1/010

Electron heating mode transition observed in a very high frequency capacitive discharge
journal, August 2003

Abdel-Fattah, E.; Sugai, H.
Applied Physics Letters, Vol. 83, Issue 8
DOI: 10.1063/1.1604941

Probe measurements of plasma potential nonuniformity due to edge asymmetry in large-area radio-frequency reactors: The telegraph effect
journal, June 2005

Howling, A. A.; Derendinger, L.; Sansonnens, L.
Journal of Applied Physics, Vol. 97, Issue 12
DOI: 10.1063/1.1940136

Standing wave and skin effects in large-area, high-frequency capacitive discharges
journal, June 2002

Lieberman, M. A.; Booth, J. P.; Chabert, P.
Plasma Sources Science and Technology, Vol. 11, Issue 3
DOI: 10.1088/0963-0252/11/3/310

Electric fields in the sheath formed in a 300 mm, dual frequency capacitive argon discharge
journal, March 2007

Barnat, E. V.; Miller, P. A.; Hebner, G. A.
Plasma Sources Science and Technology, Vol. 16, Issue 2
DOI: 10.1088/0963-0252/16/2/016

Influence of Excitation Frequency on the Electron Distribution Function in Capacitively Coupled Discharges in Argon and Helium
journal, October 2003

Abdel-Fattah, Essam; Sugai, Hideo
Japanese Journal of Applied Physics, Vol. 42, Issue Part 1, No. 10
DOI: 10.1143/JJAP.42.6569

Uniformity of radio frequency bias voltages along conducting surfaces in a plasma
journal, January 1996

Stevens, J. E.; Sowa, M. J.; Cecchi, J. L.
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 14, Issue 1
DOI: 10.1116/1.579909

Frequency effects in processing plasmas of the VHF band
journal, February 1993

Oda, S.
Plasma Sources Science and Technology, Vol. 2, Issue 1
DOI: 10.1088/0963-0252/2/1/007

Improving plasma uniformity using lens-shaped electrodes in a large area very high frequency reactor
journal, May 2004

Schmidt, H.; Sansonnens, L.; Howling, A. A.
Journal of Applied Physics, Vol. 95, Issue 9
DOI: 10.1063/1.1690096

Plasma nonuniformities induced by dissimilar electrode metals
journal, July 2005

Barnat, E. V.; Hebner, G. A.
Journal of Applied Physics, Vol. 98, Issue 1
DOI: 10.1063/1.1941481

Experimental and numerical studies on voltage distribution in capacitively coupled very high-frequency plasmas
journal, June 2004

Satake, Koji; Yamakoshi, Hideo; Noda, Matsuhei
Plasma Sources Science and Technology, Vol. 13, Issue 3
DOI: 10.1088/0963-0252/13/3/010

A voltage uniformity study in large-area reactors for RF plasma deposition
journal, May 1997

Sansonnens, L.; Pletzer, A.; Magni, D.
Plasma Sources Science and Technology, Vol. 6, Issue 2
DOI: 10.1088/0963-0252/6/2/010

Spatial and frequency dependence of plasma currents in a 300 mm capacitively coupled plasma reactor
journal, October 2006

Miller, Paul A.; Barnat, Edward V.; Hebner, Gregory A.
Plasma Sources Science and Technology, Vol. 15, Issue 4
DOI: 10.1088/0963-0252/15/4/036

Frequency variation under constant power conditions in hydrogen radio frequency discharges
journal, January 2001

Amanatides, E.; Mataras, D.
Journal of Applied Physics, Vol. 89, Issue 3
DOI: 10.1063/1.1337597

Frequency dependent plasma characteristics in a capacitively coupled 300 mm wafer plasma processing chamber
journal, October 2006

Hebner, Gregory A.; Barnat, Edward V.; Miller, Paul A.
Plasma Sources Science and Technology, Vol. 15, Issue 4
DOI: 10.1088/0963-0252/15/4/035

Works referencing / citing this record:

Study of dual radio frequency capacitively coupled plasma: an analytical treatment matched to an experiment
journal, January 2018

Saikia, P.; Bhuyan, H.; Escalona, M.
Plasma Sources Science and Technology, Vol. 27, Issue 1
DOI: 10.1088/1361-6595/aaa565

Plasma non-uniformity in a symmetric radiofrequency capacitively-coupled reactor with dielectric side-wall: a two dimensional particle-in-cell/Monte Carlo collision simulation
journal, February 2018

Liu, Yue; Booth, Jean-Paul; Chabert, Pascal
Plasma Sources Science and Technology, Vol. 27, Issue 2
DOI: 10.1088/1361-6595/aaa86e

Effect of frequency on the uniformity of symmetrical RF CCP discharges
journal, May 2018

Liu, Yue; Booth, Jean-Paul; Chabert, Pascal
Plasma Sources Science and Technology, Vol. 27, Issue 5
DOI: 10.1088/1361-6595/aabfb4

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Similar Records

Title: Measured radial dependence of the peak sheath voltages present in very high frequency capacitive discharges

Abstract

Citation Formats

Capacitively coupled glow discharges at frequencies above 13.56 MHz journal, October 1991

Self-consistent nonlinear transmission line model of standing wave effects in a capacitive discharge journal, May 2004

rf Electrode Sheath Formation near a Concave Electrode journal, February 2004

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Frequency effects in processing plasmas of the VHF band journal, February 1993

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Capacitively coupled glow discharges at frequencies above 13.56 MHz
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Self-consistent nonlinear transmission line model of standing wave effects in a capacitive discharge
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rf Electrode Sheath Formation near a Concave Electrode
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Frequency effects in plasma etching
journal, May 1986

A computational investigation of the RF plasma structures and their production efficiency in the frequency range from HF to VHF
journal, February 1993

Electron heating mode transition observed in a very high frequency capacitive discharge
journal, August 2003

Probe measurements of plasma potential nonuniformity due to edge asymmetry in large-area radio-frequency reactors: The telegraph effect
journal, June 2005

Standing wave and skin effects in large-area, high-frequency capacitive discharges
journal, June 2002

Electric fields in the sheath formed in a 300 mm, dual frequency capacitive argon discharge
journal, March 2007

Influence of Excitation Frequency on the Electron Distribution Function in Capacitively Coupled Discharges in Argon and Helium
journal, October 2003

Uniformity of radio frequency bias voltages along conducting surfaces in a plasma
journal, January 1996

Frequency effects in processing plasmas of the VHF band
journal, February 1993

Improving plasma uniformity using lens-shaped electrodes in a large area very high frequency reactor
journal, May 2004

Plasma nonuniformities induced by dissimilar electrode metals
journal, July 2005

Experimental and numerical studies on voltage distribution in capacitively coupled very high-frequency plasmas
journal, June 2004

A voltage uniformity study in large-area reactors for RF plasma deposition
journal, May 1997

Spatial and frequency dependence of plasma currents in a 300 mm capacitively coupled plasma reactor
journal, October 2006

Frequency variation under constant power conditions in hydrogen radio frequency discharges
journal, January 2001

Frequency dependent plasma characteristics in a capacitively coupled 300 mm wafer plasma processing chamber
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Study of dual radio frequency capacitively coupled plasma: an analytical treatment matched to an experiment
journal, January 2018

Plasma non-uniformity in a symmetric radiofrequency capacitively-coupled reactor with dielectric side-wall: a two dimensional particle-in-cell/Monte Carlo collision simulation
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Effect of frequency on the uniformity of symmetrical RF CCP discharges
journal, May 2018