Large-Area Subwavelength Aperture Arrays Fabricated Using Nanoimprint Lithography

doi:10.1109/TNANO.2008.2002648

Title: Large-Area Subwavelength Aperture Arrays Fabricated Using Nanoimprint Lithography

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Abstract

In this paper, we report on the fabrication and characterization of large-area 2-D square arrays of subwavelength holes in Ag and Al films. Fabrication is based on thermal nanoimprint lithography and metal evaporation, without the need for etching, and is compatible with low-cost, large-scale production. Reflectance spectra for these arrays display an intensity minimum whose amplitude, center wavelength, and line width depend on the geometry of the array and the reflectivity of the metal film. By placing various fluids in contact with the subwavelength aperture arrays, we observe that the center wavelength of the reflectance minimum varies linearly with the refractive index of the fluid with a sensitivity of over 500 nm per refractive index unit. Lastly, the surface plasmon theory is used to predict sensitivities to refractive index change with accuracies better than 0.5%.

Authors:

Skinner, J. L. ^[1]; Hunter, L. L. ^[2]; Talin, A. A. ^[3]; Provine, J. ^[4]; Horsley, D. A. ^[5]

Berkeley Sensor and Actuator Center, Berkeley, CA (United States); Univ. of California, Davis, CA (United States). Department of Mechanical and Aeronautical Engineering; Sandia National Lab. (SNL-CA), Livermore, CA (United States)
Sandia National Lab. (SNL-CA), Livermore, CA (United States); Xradia, Inc., Concord, CA (United States)
Sandia National Lab. (SNL-CA), Livermore, CA (United States)
Stanford Univ., CA (United States). Department of Electrical Engineering
Berkeley Sensor and Actuator Center, Berkeley, CA (United States); Univ. of California, Davis, CA (United States). Department of Mechanical and Aeronautical Engineering

Publication Date:: 2008-07-29

Research Org.:: Sandia National Lab. (SNL-CA), Livermore, CA (United States)

Sponsoring Org.:: USDOE National Nuclear Security Administration (NNSA); USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)

OSTI Identifier:: 1426959

Report Number(s):: SAND-2007-1398J
Journal ID: ISSN 1536-125X; 526793

Grant/Contract Number:: AC04-94AL85000

Resource Type:: Accepted Manuscript

Journal Name:: IEEE Transactions on Nanotechnology

Additional Journal Information:: Journal Volume: 7; Journal Issue: 5; Journal ID: ISSN 1536-125X

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE; 42 ENGINEERING; surface plasmons (SPs); Nanoimprint lithography (NIL); nanotechnology; refractive index measurement; subwavelength optics

Citation Formats


                    Skinner, J. L., Hunter, L. L., Talin, A. A., Provine, J., and Horsley, D. A. Large-Area Subwavelength Aperture Arrays Fabricated Using Nanoimprint Lithography.  United States: N. p., 2008. 
        Web.  doi:10.1109/TNANO.2008.2002648.

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                    Skinner, J. L., Hunter, L. L., Talin, A. A., Provine, J., & Horsley, D. A. Large-Area Subwavelength Aperture Arrays Fabricated Using Nanoimprint Lithography.  United States.  doi:10.1109/TNANO.2008.2002648.

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                    Skinner, J. L., Hunter, L. L., Talin, A. A., Provine, J., and Horsley, D. A. Tue .  
        "Large-Area Subwavelength Aperture Arrays Fabricated Using Nanoimprint Lithography".  United States.  doi:10.1109/TNANO.2008.2002648.  https://www.osti.gov/servlets/purl/1426959.

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@article{osti_1426959,

  title        = {Large-Area Subwavelength Aperture Arrays Fabricated Using Nanoimprint Lithography},

  author       = {Skinner, J. L. and Hunter, L. L. and Talin, A. A. and Provine, J. and Horsley, D. A.},

  abstractNote = {In this paper, we report on the fabrication and characterization of large-area 2-D square arrays of subwavelength holes in Ag and Al films. Fabrication is based on thermal nanoimprint lithography and metal evaporation, without the need for etching, and is compatible with low-cost, large-scale production. Reflectance spectra for these arrays display an intensity minimum whose amplitude, center wavelength, and line width depend on the geometry of the array and the reflectivity of the metal film. By placing various fluids in contact with the subwavelength aperture arrays, we observe that the center wavelength of the reflectance minimum varies linearly with the refractive index of the fluid with a sensitivity of over 500 nm per refractive index unit. Lastly, the surface plasmon theory is used to predict sensitivities to refractive index change with accuracies better than 0.5%.},

  doi          = {10.1109/TNANO.2008.2002648},

  journal      = {IEEE Transactions on Nanotechnology},

  number       = 5,

  volume       = 7,

  place        = {United States},

  year         = {2008},

  month        = {7}

}

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DOI: 10.1109/TNANO.2008.2002648

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