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Title: Large-Area Subwavelength Aperture Arrays Fabricated Using Nanoimprint Lithography

Abstract

In this paper, we report on the fabrication and characterization of large-area 2-D square arrays of subwavelength holes in Ag and Al films. Fabrication is based on thermal nanoimprint lithography and metal evaporation, without the need for etching, and is compatible with low-cost, large-scale production. Reflectance spectra for these arrays display an intensity minimum whose amplitude, center wavelength, and line width depend on the geometry of the array and the reflectivity of the metal film. By placing various fluids in contact with the subwavelength aperture arrays, we observe that the center wavelength of the reflectance minimum varies linearly with the refractive index of the fluid with a sensitivity of over 500 nm per refractive index unit. Lastly, the surface plasmon theory is used to predict sensitivities to refractive index change with accuracies better than 0.5%.

Authors:
 [1];  [2];  [3];  [4];  [5]
  1. Berkeley Sensor and Actuator Center, Berkeley, CA (United States); Univ. of California, Davis, CA (United States). Department of Mechanical and Aeronautical Engineering; Sandia National Lab. (SNL-CA), Livermore, CA (United States)
  2. Sandia National Lab. (SNL-CA), Livermore, CA (United States); Xradia, Inc., Concord, CA (United States)
  3. Sandia National Lab. (SNL-CA), Livermore, CA (United States)
  4. Stanford Univ., CA (United States). Department of Electrical Engineering
  5. Berkeley Sensor and Actuator Center, Berkeley, CA (United States); Univ. of California, Davis, CA (United States). Department of Mechanical and Aeronautical Engineering
Publication Date:
Research Org.:
Sandia National Lab. (SNL-CA), Livermore, CA (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA); USDOE Office of Science (SC), Basic Energy Sciences (BES)
OSTI Identifier:
1426959
Report Number(s):
SAND-2007-1398J
Journal ID: ISSN 1536-125X; 526793
Grant/Contract Number:  
AC04-94AL85000
Resource Type:
Accepted Manuscript
Journal Name:
IEEE Transactions on Nanotechnology
Additional Journal Information:
Journal Volume: 7; Journal Issue: 5; Journal ID: ISSN 1536-125X
Publisher:
IEEE
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 42 ENGINEERING; surface plasmons (SPs); Nanoimprint lithography (NIL); nanotechnology; refractive index measurement; subwavelength optics

Citation Formats

Skinner, J. L., Hunter, L. L., Talin, A. A., Provine, J., and Horsley, D. A. Large-Area Subwavelength Aperture Arrays Fabricated Using Nanoimprint Lithography. United States: N. p., 2008. Web. doi:10.1109/TNANO.2008.2002648.
Skinner, J. L., Hunter, L. L., Talin, A. A., Provine, J., & Horsley, D. A. Large-Area Subwavelength Aperture Arrays Fabricated Using Nanoimprint Lithography. United States. doi:10.1109/TNANO.2008.2002648.
Skinner, J. L., Hunter, L. L., Talin, A. A., Provine, J., and Horsley, D. A. Tue . "Large-Area Subwavelength Aperture Arrays Fabricated Using Nanoimprint Lithography". United States. doi:10.1109/TNANO.2008.2002648. https://www.osti.gov/servlets/purl/1426959.
@article{osti_1426959,
title = {Large-Area Subwavelength Aperture Arrays Fabricated Using Nanoimprint Lithography},
author = {Skinner, J. L. and Hunter, L. L. and Talin, A. A. and Provine, J. and Horsley, D. A.},
abstractNote = {In this paper, we report on the fabrication and characterization of large-area 2-D square arrays of subwavelength holes in Ag and Al films. Fabrication is based on thermal nanoimprint lithography and metal evaporation, without the need for etching, and is compatible with low-cost, large-scale production. Reflectance spectra for these arrays display an intensity minimum whose amplitude, center wavelength, and line width depend on the geometry of the array and the reflectivity of the metal film. By placing various fluids in contact with the subwavelength aperture arrays, we observe that the center wavelength of the reflectance minimum varies linearly with the refractive index of the fluid with a sensitivity of over 500 nm per refractive index unit. Lastly, the surface plasmon theory is used to predict sensitivities to refractive index change with accuracies better than 0.5%.},
doi = {10.1109/TNANO.2008.2002648},
journal = {IEEE Transactions on Nanotechnology},
number = 5,
volume = 7,
place = {United States},
year = {2008},
month = {7}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record

Figures / Tables:

Fig. 1 Fig. 1: Process flow for subwavelength aperture arrays. Fabrication proceeds as follows: (a) spin on 350 nm of PMMA and bake at 150 °C for 2 min, (b) imprint PMMA at 200 °C and 400 psi for 5 min, (c) cool to 60 °C and separate template from PMMA, andmore » (d) evaporate Ag or Al at a 45 degree angle while rotating substrate. Shadow evaporation is shown in (e).« less

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Works referencing / citing this record:

Dual Sensing Arrays for Surface Plasmon Resonance (SPR) and Surface-Enhanced Raman Scattering (SERS) Based on Nanowire/Nanorod Hybrid Nanostructures
journal, September 2018

  • Lee, Kuang-Li; Hung, Chia-Yu; Pan, Ming-Yang
  • Advanced Materials Interfaces, Vol. 5, Issue 21
  • DOI: 10.1002/admi.201801064

Highly Sensitive Aluminum-Based Biosensors using Tailorable Fano Resonances in Capped Nanostructures
journal, March 2017

  • Lee, Kuang-Li; Hsu, Hsuan-Yeh; You, Meng-Lin
  • Scientific Reports, Vol. 7, Issue 1
  • DOI: 10.1038/srep44104

Plasmonic components fabrication via nanoimprint
journal, September 2009


    Figures/Tables have been extracted from DOE-funded journal article accepted manuscripts.