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Title: Molded transparent photopolymers and phase shift optics for fabricating three dimensional nanostructures

Abstract

This paper introduces approaches that combine micro/nanomolding, or nanoimprinting, techniques with proximity optical phase mask lithographic methods to form three dimensional (3D) nanostructures in thick, transparent layers of photopolymers. The results demonstrate three strategies of this type, where molded relief structures in these photopolymers represent (i) fine (<1 μm) features that serve as the phase masks for their own exposure, (ii) coarse features (>1 μm) that are used with phase masks to provide access to large structure dimensions, and (iii) fine structures that are used together phase masks to achieve large, multilevel phase modulations. Several examples are provided, together with optical modeling of the fabrication process and the transmission properties of certain of the fabricated structures. Lastly, these approaches provide capabilities in 3D fabrication that complement those of other techniques, with potential applications in photonics, microfluidics, drug delivery and other areas.

Authors:
 [1];  [1];  [1];  [1];  [1];  [1];  [1];  [2];  [3];  [2];  [4]
  1. Univ. of Illinois, Urbana, IL (United States). Department of Materials Science and Engineering, Electrical and Computer Engineering, and Chemistry, Beckman Institute and Seitz Materials Research Laboratory
  2. Univ. of New Mexico, Albuquerque, NM (United States). Department of Electrical and Computer Engineering
  3. Univ. of New Mexico, Albuquerque, NM (United States). Department of Electrical and Computer Engineering ; Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
  4. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA); USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1426957
Report Number(s):
SAND-2007-1409J
Journal ID: ISSN 1094-4087; OPEXFF; 526802
Grant/Contract Number:  
AC04-94AL85000; FG02-91ER45439
Resource Type:
Accepted Manuscript
Journal Name:
Optics Express
Additional Journal Information:
Journal Volume: 15; Journal Issue: 10; Journal ID: ISSN 1094-4087
Publisher:
Optical Society of America (OSA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; Diffraction and gratings; Microstructure fabrication; Ultrafast nonlinear optics

Citation Formats

Jeon, Seokwoo, Shir, Daniel J., Nam, Yun Suk, Nidetz, Robert, Highland, Matthew, Cahill, David G., Rogers, John A., Su, Mehmet F., El-Kady, Ihab F., Christodoulou, Christos G., and Bogart, Gregory R. Molded transparent photopolymers and phase shift optics for fabricating three dimensional nanostructures. United States: N. p., 2007. Web. doi:10.1364/OE.15.006358.
Jeon, Seokwoo, Shir, Daniel J., Nam, Yun Suk, Nidetz, Robert, Highland, Matthew, Cahill, David G., Rogers, John A., Su, Mehmet F., El-Kady, Ihab F., Christodoulou, Christos G., & Bogart, Gregory R. Molded transparent photopolymers and phase shift optics for fabricating three dimensional nanostructures. United States. doi:10.1364/OE.15.006358.
Jeon, Seokwoo, Shir, Daniel J., Nam, Yun Suk, Nidetz, Robert, Highland, Matthew, Cahill, David G., Rogers, John A., Su, Mehmet F., El-Kady, Ihab F., Christodoulou, Christos G., and Bogart, Gregory R. Tue . "Molded transparent photopolymers and phase shift optics for fabricating three dimensional nanostructures". United States. doi:10.1364/OE.15.006358. https://www.osti.gov/servlets/purl/1426957.
@article{osti_1426957,
title = {Molded transparent photopolymers and phase shift optics for fabricating three dimensional nanostructures},
author = {Jeon, Seokwoo and Shir, Daniel J. and Nam, Yun Suk and Nidetz, Robert and Highland, Matthew and Cahill, David G. and Rogers, John A. and Su, Mehmet F. and El-Kady, Ihab F. and Christodoulou, Christos G. and Bogart, Gregory R.},
abstractNote = {This paper introduces approaches that combine micro/nanomolding, or nanoimprinting, techniques with proximity optical phase mask lithographic methods to form three dimensional (3D) nanostructures in thick, transparent layers of photopolymers. The results demonstrate three strategies of this type, where molded relief structures in these photopolymers represent (i) fine (<1 μm) features that serve as the phase masks for their own exposure, (ii) coarse features (>1 μm) that are used with phase masks to provide access to large structure dimensions, and (iii) fine structures that are used together phase masks to achieve large, multilevel phase modulations. Several examples are provided, together with optical modeling of the fabrication process and the transmission properties of certain of the fabricated structures. Lastly, these approaches provide capabilities in 3D fabrication that complement those of other techniques, with potential applications in photonics, microfluidics, drug delivery and other areas.},
doi = {10.1364/OE.15.006358},
journal = {Optics Express},
number = 10,
volume = 15,
place = {United States},
year = {2007},
month = {5}
}

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