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Title: Focussed helium ion channeling through Si nanomembranes

Authors:
 [1] ;  [1] ;  [1] ;  [2] ;  [3] ;  [1]
  1. Department of Physics, Simon Fraser University, Burnaby, British Columbia V5A 1S6, Canada
  2. Department of Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706
  3. Department of Physics, University of Montreal, Montreal, Quebec, Canada H3T 1J4
Publication Date:
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology. B, Nanotechnology and Microelectronics
Additional Journal Information:
Journal Name: Journal of Vacuum Science and Technology. B, Nanotechnology and Microelectronics Journal Volume: 36 Journal Issue: 2; Journal ID: ISSN 2166-2746
Publisher:
American Vacuum Society
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1426006

Wang, Jiaming, Huang, Symphony H. Y., Herrmann, Christoph, Scott, Shelley A., Schiettekatte, François, and Kavanagh, Karen L.. Focussed helium ion channeling through Si nanomembranes. United States: N. p., Web. doi:10.1116/1.5020667.
Wang, Jiaming, Huang, Symphony H. Y., Herrmann, Christoph, Scott, Shelley A., Schiettekatte, François, & Kavanagh, Karen L.. Focussed helium ion channeling through Si nanomembranes. United States. doi:10.1116/1.5020667.
Wang, Jiaming, Huang, Symphony H. Y., Herrmann, Christoph, Scott, Shelley A., Schiettekatte, François, and Kavanagh, Karen L.. 2018. "Focussed helium ion channeling through Si nanomembranes". United States. doi:10.1116/1.5020667.
@article{osti_1426006,
title = {Focussed helium ion channeling through Si nanomembranes},
author = {Wang, Jiaming and Huang, Symphony H. Y. and Herrmann, Christoph and Scott, Shelley A. and Schiettekatte, François and Kavanagh, Karen L.},
abstractNote = {},
doi = {10.1116/1.5020667},
journal = {Journal of Vacuum Science and Technology. B, Nanotechnology and Microelectronics},
number = 2,
volume = 36,
place = {United States},
year = {2018},
month = {3}
}