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Title: Focussed helium ion channeling through Si nanomembranes

Journal Article · · Journal of Vacuum Science and Technology B
DOI: https://doi.org/10.1116/1.5020667 · OSTI ID:1426006
 [1];  [1];  [1];  [2];  [3];  [1]
  1. Department of Physics, Simon Fraser University, Burnaby, British Columbia V5A 1S6, Canada
  2. Department of Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706
  3. Department of Physics, University of Montreal, Montreal, Quebec, Canada H3T 1J4

Sponsoring Organization:
USDOE
OSTI ID:
1426006
Journal Information:
Journal of Vacuum Science and Technology B, Journal Name: Journal of Vacuum Science and Technology B Vol. 36 Journal Issue: 2; ISSN 2166-2746
Publisher:
American Vacuum SocietyCopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 13 works
Citation information provided by
Web of Science

References (9)

Channeling in helium ion microscopy: Mapping of crystal orientation journal January 2012
Fundamental limits to detection of low-energy ions using silicon solid-state detectors journal May 2004
Dark-Field Scanning Transmission Ion Microscopy via Detection of Forward-Scattered Helium Ions with a Microchannel Plate journal May 2016
Subsurface damage from helium ions as a function of dose, beam energy, and dose rate
  • Livengood, Richard; Tan, Shida; Greenzweig, Yuval
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 27, Issue 6 https://doi.org/10.1116/1.3237101
journal January 2009
Reduction in Modulus of Suspended Sub-2 nm Single Crystalline Silicon Nanomembranes journal July 2017
50 years of ion channeling in materials science journal March 2016
Capturing Structural Dynamics in Crystalline Silicon Using Chirped Electrons from a Laser Wakefield Accelerator journal November 2016
Camera for transmission He+ ion microscopy
  • Kavanagh, Karen L.; Herrmann, Christoph; Notte, John A.
  • Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 35, Issue 6 https://doi.org/10.1116/1.4991898
journal November 2017
Edge-induced flattening in the fabrication of ultrathin freestanding crystalline silicon sheets journal January 2013

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