Focussed helium ion channeling through Si nanomembranes
- Authors:
-
- Department of Physics, Simon Fraser University, Burnaby, British Columbia V5A 1S6, Canada
- Department of Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706
- Department of Physics, University of Montreal, Montreal, Quebec, Canada H3T 1J4
- Publication Date:
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1426006
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Journal of Vacuum Science and Technology B
- Additional Journal Information:
- Journal Name: Journal of Vacuum Science and Technology B Journal Volume: 36 Journal Issue: 2; Journal ID: ISSN 2166-2746
- Publisher:
- American Vacuum Society
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Wang, Jiaming, Huang, Symphony H. Y., Herrmann, Christoph, Scott, Shelley A., Schiettekatte, François, and Kavanagh, Karen L. Focussed helium ion channeling through Si nanomembranes. United States: N. p., 2018.
Web. doi:10.1116/1.5020667.
Wang, Jiaming, Huang, Symphony H. Y., Herrmann, Christoph, Scott, Shelley A., Schiettekatte, François, & Kavanagh, Karen L. Focussed helium ion channeling through Si nanomembranes. United States. https://doi.org/10.1116/1.5020667
Wang, Jiaming, Huang, Symphony H. Y., Herrmann, Christoph, Scott, Shelley A., Schiettekatte, François, and Kavanagh, Karen L. Thu .
"Focussed helium ion channeling through Si nanomembranes". United States. https://doi.org/10.1116/1.5020667.
@article{osti_1426006,
title = {Focussed helium ion channeling through Si nanomembranes},
author = {Wang, Jiaming and Huang, Symphony H. Y. and Herrmann, Christoph and Scott, Shelley A. and Schiettekatte, François and Kavanagh, Karen L.},
abstractNote = {},
doi = {10.1116/1.5020667},
journal = {Journal of Vacuum Science and Technology B},
number = 2,
volume = 36,
place = {United States},
year = {2018},
month = {3}
}
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https://doi.org/10.1116/1.5020667
https://doi.org/10.1116/1.5020667
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Cited by: 11 works
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