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This content will become publicly available on March 5, 2019

Title: Polymer etching by atmospheric-pressure plasma jet and surface micro-discharge sources: Activation energy analysis and etching directionality

Authors:
ORCiD logo [1] ;  [1] ;  [1] ;  [2] ;  [1]
  1. Department of Materials Science and Engineering and the Institute for Research in Electronics and Applied Physics, University of Maryland, College Park Maryland
  2. IBM TJ Watson Research Center, Yorktown Heights New York
Publication Date:
Grant/Contract Number:
SC0001939
Type:
Publisher's Accepted Manuscript
Journal Name:
Plasma Processes and Polymers
Additional Journal Information:
Journal Name: Plasma Processes and Polymers Journal Volume: 15 Journal Issue: 5; Journal ID: ISSN 1612-8850
Publisher:
Wiley Blackwell (John Wiley & Sons)
Sponsoring Org:
USDOE Office of Science (SC), Fusion Energy Sciences (FES) (SC-24)
Country of Publication:
Country unknown/Code not available
Language:
English
OSTI Identifier:
1423710