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Title: Stressor-layer-induced elastic strain sharing in SrTiO3 complex oxide sheets

Journal Article · · Applied Physics Letters
DOI: https://doi.org/10.1063/1.5019920 · OSTI ID:1423428
 [1];  [2];  [2]; ORCiD logo [2];  [3]; ORCiD logo [2]
  1. Univ. of Wisconsin-Madison, Madison, WI (United States). Dept. of Materials Science and Engineering; University of Wisconsin-Madison
  2. Univ. of Wisconsin-Madison, Madison, WI (United States). Dept. of Materials Science and Engineering
  3. Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)

A precisely selected elastic strain can be introduced in submicron-thick single-crystal SrTiO3 sheets using a silicon nitride stressor layer. A conformal stressor layer deposited using plasma-enhanced chemical vapor deposition produces an elastic strain in the sheet consistent with the magnitude of the nitride residual stress. Synchrotron x-ray nanodiffraction reveals that the strain introduced in the SrTiO3 sheets is on the order of 10-4, matching the predictions of an elastic model. Using this approach to elastic strain sharing in complex oxides allows the strain to be selected within a wide and continuous range of values, an effect not achievable in heteroepitaxy on rigid substrates.

Research Organization:
Univ. of Wisconsin-Madison, Madison, WI (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division; National Science Foundation (NSF); University of Wisconsin
Grant/Contract Number:
FG02-04ER46147; AC02-06CH11357
OSTI ID:
1423428
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 9 Vol. 112; ISSN 0003-6951
Publisher:
American Institute of Physics (AIP)Copyright Statement
Country of Publication:
United States
Language:
English

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