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Title: Coefficient of thermal expansion and biaxial Young's modulus in Si-rich silicon nitride thin films

Journal Article · · Journal of Vacuum Science and Technology A
DOI: https://doi.org/10.1116/1.5020432 · OSTI ID:1423386
 [1]
  1. Sandia National Laboratories, P. O Box 5800, MS1084, Albuquerque, New Mexico 87185

Sponsoring Organization:
USDOE
OSTI ID:
1423386
Journal Information:
Journal of Vacuum Science and Technology A, Journal Name: Journal of Vacuum Science and Technology A Vol. 36 Journal Issue: 2; ISSN 0734-2101
Publisher:
American Vacuum SocietyCopyright Statement
Country of Publication:
United States
Language:
English

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LPCVD silicon‐rich silicon nitride films for applications in micromechanics, studied with statistical experimental design*
  • Gardeniers, J. G. E.; Tilmans, H. A. C.; Visser, C. C. G.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 14, Issue 5 https://doi.org/10.1116/1.580239
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