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This content will become publicly available on March 1, 2019

Title: Extreme ultraviolet mask roughness effects in high numerical aperture lithography

Authors:
; ;
Publication Date:
Grant/Contract Number:
AC02-05CH11231
Type:
Publisher's Accepted Manuscript
Journal Name:
Applied Optics
Additional Journal Information:
Journal Volume: 57; Journal Issue: 7; Related Information: CHORUS Timestamp: 2018-02-28 10:53:05; Journal ID: ISSN 1559-128X
Publisher:
Optical Society of America
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1423166