In situ characterization of the deposition of anatase TiO 2 on rutile TiO 2 (110)
- Authors:
-
- MAX IV Laboratory, Lund University, Box 118, 22100 Lund, Sweden
- Chemical Sciences Division and Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720
- Publication Date:
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1422846
- Grant/Contract Number:
- AC02-05CH11231
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Journal of Vacuum Science and Technology A
- Additional Journal Information:
- Journal Name: Journal of Vacuum Science and Technology A Journal Volume: 36 Journal Issue: 2; Journal ID: ISSN 0734-2101
- Publisher:
- American Vacuum Society
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Head, Ashley R., Johansson, Niclas, Niu, Yuran, Snezhkova, Olesia, Chaudhary, Shilpi, Schnadt, Joachim, Bluhm, Hendrik, Chen, Chaoyu, Avila, José, and Asensio, Maria-Carmen. In situ characterization of the deposition of anatase TiO 2 on rutile TiO 2 (110). United States: N. p., 2018.
Web. doi:10.1116/1.5005533.
Head, Ashley R., Johansson, Niclas, Niu, Yuran, Snezhkova, Olesia, Chaudhary, Shilpi, Schnadt, Joachim, Bluhm, Hendrik, Chen, Chaoyu, Avila, José, & Asensio, Maria-Carmen. In situ characterization of the deposition of anatase TiO 2 on rutile TiO 2 (110). United States. https://doi.org/10.1116/1.5005533
Head, Ashley R., Johansson, Niclas, Niu, Yuran, Snezhkova, Olesia, Chaudhary, Shilpi, Schnadt, Joachim, Bluhm, Hendrik, Chen, Chaoyu, Avila, José, and Asensio, Maria-Carmen. Thu .
"In situ characterization of the deposition of anatase TiO 2 on rutile TiO 2 (110)". United States. https://doi.org/10.1116/1.5005533.
@article{osti_1422846,
title = {In situ characterization of the deposition of anatase TiO 2 on rutile TiO 2 (110)},
author = {Head, Ashley R. and Johansson, Niclas and Niu, Yuran and Snezhkova, Olesia and Chaudhary, Shilpi and Schnadt, Joachim and Bluhm, Hendrik and Chen, Chaoyu and Avila, José and Asensio, Maria-Carmen},
abstractNote = {},
doi = {10.1116/1.5005533},
journal = {Journal of Vacuum Science and Technology A},
number = 2,
volume = 36,
place = {United States},
year = {Thu Mar 01 00:00:00 EST 2018},
month = {Thu Mar 01 00:00:00 EST 2018}
}
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https://doi.org/10.1116/1.5005533
https://doi.org/10.1116/1.5005533
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Cited by: 10 works
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Works referenced in this record:
Observation of a two-dimensional liquid of Fröhlich polarons at the bare SrTiO3 surface
journal, October 2015
- Chen, Chaoyu; Avila, José; Frantzeskakis, Emmanouil
- Nature Communications, Vol. 6, Issue 1
LEED studies of surface imperfections
journal, July 1982
- Henzler, M.
- Applications of Surface Science, Vol. 11-12
Photoelectron spectroscopy under ambient pressure and temperature conditions
journal, March 2009
- Frank Ogletree, D.; Bluhm, Hendrik; Hebenstreit, Eleonore D.
- Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, Vol. 601, Issue 1-2
Selective Deposition of Dielectrics: Limits and Advantages of Alkanethiol Blocking Agents on Metal–Dielectric Patterns
journal, November 2016
- Minaye Hashemi, Fatemeh Sadat; Birchansky, Bradlee R.; Bent, Stacey F.
- ACS Applied Materials & Interfaces, Vol. 8, Issue 48
Near Ambient Pressure X-ray Photoelectron Spectroscopy Study of the Atomic Layer Deposition of TiO 2 on RuO 2 (110)
journal, December 2015
- Head, Ashley R.; Chaudhary, Shilpi; Olivieri, Giorgia
- The Journal of Physical Chemistry C, Vol. 120, Issue 1
Reaction Mechanism Studies on Titanium Isopropoxide–Water Atomic Layer Deposition Process
journal, January 2002
- Rahtu, A.; Ritala, M.
- Chemical Vapor Deposition, Vol. 8, Issue 1
Electronic structure of titania aerogels from soft x-ray absorption spectroscopy
journal, June 2004
- Kucheyev, S. O.; van Buuren, T.; Baumann, T. F.
- Physical Review B, Vol. 69, Issue 24
Atomic Layer Deposition of p-Type Epitaxial Thin Films of Undoped and N-Doped Anatase TiO 2
journal, March 2016
- Vasu, K.; Sreedhara, M. B.; Ghatak, J.
- ACS Applied Materials & Interfaces, Vol. 8, Issue 12
Microscopic structure of the /Si interface
journal, September 1988
- Himpsel, F. J.; McFeely, F. R.; Taleb-Ibrahimi, A.
- Physical Review B, Vol. 38, Issue 9
Atomic Layer Deposition (ALD) of ZrO2in Ultrahigh Vacuum (UHV)
journal, April 2013
- Roy, Probir Chandra; Jeong, Hyun Suck; Doh, Won Hui
- Bulletin of the Korean Chemical Society, Vol. 34, Issue 4
Does Chemistry Really Matter in the Chemical Vapor Deposition of Titanium Dioxide? Precursor and Kinetic Effects on the Microstructure of Polycrystalline Films
journal, June 1999
- Taylor, Charles J.; Gilmer, David C.; Colombo, Daniel G.
- Journal of the American Chemical Society, Vol. 121, Issue 22
Real-Time Study of CVD Growth of Silicon Oxide on Rutile TiO2(110) Using Tetraethyl Orthosilicate
journal, August 2015
- Chaudhary, Shilpi; Head, Ashley R.; Sánchez-de-Armas, Rocío
- The Journal of Physical Chemistry C, Vol. 119, Issue 33
Shape-selective sieving layers on an oxide catalyst surface
journal, October 2012
- Canlas, Christian P.; Lu, Junling; Ray, Natalie A.
- Nature Chemistry, Vol. 4, Issue 12, p. 1030-1036
The Nature of Water Nucleation Sites on TiO 2 (110) Surfaces Revealed by Ambient Pressure X-ray Photoelectron Spectroscopy
journal, June 2007
- Ketteler, Guido; Yamamoto, Susumu; Bluhm, Hendrik
- The Journal of Physical Chemistry C, Vol. 111, Issue 23
Growth of epitaxial oxides on silicon using atomic layer deposition: Crystallization and annealing of TiO2 on SrTiO3-buffered Si(001)
journal, July 2012
- McDaniel, Martin D.; Posadas, Agham; Ngo, Thong Q.
- Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 30, Issue 4
Solid phase epitaxial regrowth of (001) anatase titanium dioxide
journal, March 2016
- Barlaz, David Eitan; Seebauer, Edmund G.
- Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 34, Issue 2
Homo-epitaxial growth of rutile TiO2 film on step and terrace structured substrate
journal, November 2004
- Yamamoto, Y.; Matsumoto, Y.; Koinuma, H.
- Applied Surface Science, Vol. 238, Issue 1-4
Probing the influence from residual Ti interstitials on water adsorption on TiO2 (110)
journal, November 2012
- Walle, L. E.; Borg, A.; Uvdal, P.
- Physical Review B, Vol. 86, Issue 20
TiO2 chemical vapor deposition on Si(111) in ultrahigh vacuum: Transition from interfacial phase to crystalline phase in the reaction limited regime
journal, July 2011
- Karlsson, P. G.; Richter, J. H.; Andersson, M. P.
- Surface Science, Vol. 605, Issue 13-14
Growth and characterization of epitaxial anatase TiO2(001) on SrTiO3-buffered Si(001) using atomic layer deposition
journal, August 2012
- McDaniel, M. D.; Posadas, A.; Wang, T.
- Thin Solid Films, Vol. 520, Issue 21
In-situ X-ray Photoemission Spectroscopy Study of Atomic Layer Deposition of TiO2 on Silicon Substrate
journal, February 2012
- Lee, Seung Youb; Jeon, Cheolho; Kim, Seok Hwan
- Japanese Journal of Applied Physics, Vol. 51, Issue 3R
Templated Homoepitaxial Growth with Atomic Layer Deposition of Single-Crystal Anatase (101) and Rutile (110) TiO 2
journal, June 2014
- Kraus, Theodore J.; Nepomnyashchii, Alexander B.; Parkinson, B. A.
- ACS Applied Materials & Interfaces, Vol. 6, Issue 13
Pulse laser deposition of epitaxial TiO 2 thin films for high-performance ultraviolet photodetectors
journal, November 2015
- Zhang, Zifeng; Wong, Lai Mun; Zhang, Zhiwei
- Applied Surface Science, Vol. 355
Growth of epitaxial anatase (001) and (101) films
journal, October 2001
- Herman, G. S.; Gao, Y.
- Thin Solid Films, Vol. 397, Issue 1-2
Low Temperature Chemical Vapor Deposition Using Atomic Layer Deposition Chemistry
journal, January 2015
- Reinke, Michael; Kuzminykh, Yury; Hoffmann, Patrik
- Chemistry of Materials, Vol. 27, Issue 5
Surface Kinetics of Titanium Isopropoxide in High Vacuum Chemical Vapor Deposition
journal, October 2015
- Reinke, Michael; Kuzminykh, Yury; Hoffmann, Patrik
- The Journal of Physical Chemistry C, Vol. 119, Issue 50
A versatile instrument for ambient pressure x-ray photoelectron spectroscopy: The Lund cell approach
journal, April 2016
- Knudsen, Jan; Andersen, Jesper N.; Schnadt, Joachim
- Surface Science, Vol. 646
Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends
journal, January 2013
- Miikkulainen, Ville; Leskelä, Markku; Ritala, Mikko
- Journal of Applied Physics, Vol. 113, Issue 2, Article No. 021301
Soft X-ray microscopy and spectroscopy at the molecular environmental science beamline at the Advanced Light Source
journal, February 2006
- Bluhm, H.; Andersson, K.; Araki, T.
- Journal of Electron Spectroscopy and Related Phenomena, Vol. 150, Issue 2-3
Selective-Area Atomic Layer Deposition Using Poly(methyl methacrylate) Films as Mask Layers
journal, September 2008
- Färm, Elina; Kemell, Marianna; Ritala, Mikko
- The Journal of Physical Chemistry C, Vol. 112, Issue 40
Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
journal, January 2015
- Kraus, Theodore J.; Nepomnyashchii, Alexander B.; Parkinson, B. A.
- Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 33, Issue 1
Nanoscale oxygen nonstoichiometry in epitaxial TiO2 films grown by pulsed laser deposition
journal, November 2011
- Takata, Shintaro; Tanaka, Ryohei; Hachiya, Atsushi
- Journal of Applied Physics, Vol. 110, Issue 10
The surface science of titanium dioxide
journal, January 2003
- Diebold, Ulrike
- Surface Science Reports, Vol. 48, Issue 5-8
Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process
journal, July 2000
- Aarik, Jaan; Aidla, Aleks; Uustare, Teet
- Applied Surface Science, Vol. 161, Issue 3-4
Epitaxial TiO2/SnO2 core–shell heterostructure by atomic layer deposition
journal, January 2012
- Nie, Anmin; Liu, Jiabin; Li, Qianqian
- Journal of Materials Chemistry, Vol. 22, Issue 21
Alternative Low-Pressure Surface Chemistry of Titanium Tetraisopropoxide on Oxidized Molybdenum
journal, October 2014
- Johnson, Alexis M.; Stair, Peter C.
- The Journal of Physical Chemistry C, Vol. 118, Issue 50
Titanium Dioxide Nanomaterials: Self-Structural Modifications
journal, May 2014
- Liu, Lei; Chen, Xiaobo
- Chemical Reviews, Vol. 114, Issue 19
Sub-5 nm nanostructures fabricated by atomic layer deposition using a carbon nanotube template
journal, May 2016
- Woo, Ju Yeon; Han, Hyo; Kim, Ji Weon
- Nanotechnology, Vol. 27, Issue 26
Transformation of the Crystalline Structure of an ALD TiO[sub 2] Film on a Ru Electrode by O[sub 3] Pretreatment
journal, January 2006
- Kim, Seong Keun; Hwang, Gyu Weon; Kim, Wan-Don
- Electrochemical and Solid-State Letters, Vol. 9, Issue 1
Atomic Layer Deposition of TiO 2 on Mesoporous nanoITO: Conductive Core–Shell Photoanodes for Dye-Sensitized Solar Cells
journal, May 2014
- Alibabaei, Leila; Farnum, Byron H.; Kalanyan, Berç
- Nano Letters, Vol. 14, Issue 6