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This content will become publicly available on February 23, 2019

Title: Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods

Authors:
 [1] ;  [2] ;  [3] ;  [4] ;  [5] ;  [6] ;  [2] ;  [7]
  1. Physics Department, Illinois Institute of Technology, Chicago, Illinois 60616
  2. Lawrence Berkley National Laboratory, Berkley, California 94720
  3. European Synchrotron Radiation Facility, Grenoble 38000, France
  4. GSECARS, University of Chicago, Argonne, Illinois 60439
  5. X-Ray Science Department, Advanced Photon Source, Argonne National Laboratory, Lemont, Illinois 60439
  6. Material Science Division, Argonne National Laboratory, Argonne, Illinois 60439
  7. Commissariat de l'énergie atomique, Centre de Saclay, Gif-sur-Yvette 91191, France
Publication Date:
Grant/Contract Number:
AC02-05CH11231; AC02-06CH11357; FWP50335
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Volume: 36; Journal Issue: 2; Related Information: CHORUS Timestamp: 2018-02-23 09:47:55; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1422434