Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods

Becker, Nicholas G.; Butterworth, Anna L.; Salome, Murielle; Sutton, Stephen R.; De Andrade, Vincent; Sokolov, Andrey; Westphal, Andrew J.; Proslier, Thomas

doi:10.1116/1.5025240

Title: Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods

Abstract

Atomic layer deposition (ALD) is a scalable deposition technique known for producing uniform, conformal films of a wide range of compounds on nearly any substrate material. These traits make it an ideal deposition method for producing films to replace the National Institute of Standards and Technology (NIST) standards and create Standard Reference Materials (SRMs) on a wide range of relevant two-dimensional and three-dimensional substrates. The use of SRM from NIST for quantitative analysis of chemical composition using synchrotron based x-ray fluorescence (SR-XRF) and scanning transmission x-ray microscopy (STXM) is common. Such standards, however, can suffer from inhomogeneity in chemical composition and thickness and often require further calculations, based on sample mounting and detector geometry, to obtain quantitative results. These inhomogeneities negatively impact the reproducibility of the measurements and the quantitative measure itself. Utilizing Rutherford backscattering, x-ray reflectivity, quartz crystal microbalance, STXM, and SR-XRF, the authors show here that ALD is capable of producing high quality standards that are homogenous over scales ranging from nanometers to 100s of micrometers.

Authors:

Becker, Nicholas G. ^[1]; Butterworth, Anna L. ^[2]; Salome, Murielle ^[3]; Sutton, Stephen R. ^[4]; De Andrade, Vincent ^[5]; Sokolov, Andrey ^[6]; Westphal, Andrew J. ^[2]; Proslier, Thomas ^[7]

Illinois Inst. of Technology, Chicago, IL (United States). Physics Dept.
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
European Synchrotron Radiation Facility (ESRF), Grenoble (France)
Univ. of Chicago, Argonne, IL (United States). GSECARS
Argonne National Lab. (ANL), Argonne, IL (United States). X-Ray Science Dept. Advanced Photon Source
Argonne National Lab. (ANL), Argonne, IL (United States). Material Science Division
Alternative Energies and Atomic Energy Commission (CEA), Saclay (France)

Publication Date:: Fri Feb 23 00:00:00 EST 2018

Research Org.:: Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States); Argonne National Lab. (ANL), Argonne, IL (United States); Univ. of Chicago, Argonne, IL (United States)

Sponsoring Org.:: USDOE Office of Science (SC), High Energy Physics (HEP); USDOE Office of Science (SC), Basic Energy Sciences (BES); National Science Foundation (NSF)

OSTI Identifier:: 1493253

Alternate Identifier(s):: OSTI ID: 1422434

Grant/Contract Number:: AC02-05CH11231; AC02-06CH11357; FG02-94ER14466; EAR-1634415

Resource Type:: Accepted Manuscript

Journal Name:: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films

Additional Journal Information:: Journal Volume: 36; Journal Issue: 2; Journal ID: ISSN 0734-2101

Publisher:: American Vacuum Society

Country of Publication:: United States

Language:: English

Subject:: 74 ATOMIC AND MOLECULAR PHYSICS; synchrotrons; Rutherford backscattering spectroscopy; X-ray microscopy; metal oxides; transition metals; multilayers; X-ray reflectivity; 3D printing; quartz crystal microbalance; atomic layer deposition

Citation Formats


                    Becker, Nicholas G., Butterworth, Anna L., Salome, Murielle, Sutton, Stephen R., De Andrade, Vincent, Sokolov, Andrey, Westphal, Andrew J., and Proslier, Thomas. Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods.  United States: N. p., 2018. 
Web.  doi:10.1116/1.5025240.

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                    Becker, Nicholas G., Butterworth, Anna L., Salome, Murielle, Sutton, Stephen R., De Andrade, Vincent, Sokolov, Andrey, Westphal, Andrew J., & Proslier, Thomas. Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods.  United States.  https://doi.org/10.1116/1.5025240

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                    Becker, Nicholas G., Butterworth, Anna L., Salome, Murielle, Sutton, Stephen R., De Andrade, Vincent, Sokolov, Andrey, Westphal, Andrew J., and Proslier, Thomas. Fri .  
"Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods".  United States.  https://doi.org/10.1116/1.5025240.  https://www.osti.gov/servlets/purl/1493253.

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@article{osti_1493253,

  title        = {Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods},

  author       = {Becker, Nicholas G. and Butterworth, Anna L. and Salome, Murielle and Sutton, Stephen R. and De Andrade, Vincent and Sokolov, Andrey and Westphal, Andrew J. and Proslier, Thomas},

  abstractNote = {Atomic layer deposition (ALD) is a scalable deposition technique known for producing uniform, conformal films of a wide range of compounds on nearly any substrate material. These traits make it an ideal deposition method for producing films to replace the National Institute of Standards and Technology (NIST) standards and create Standard Reference Materials (SRMs) on a wide range of relevant two-dimensional and three-dimensional substrates. The use of SRM from NIST for quantitative analysis of chemical composition using synchrotron based x-ray fluorescence (SR-XRF) and scanning transmission x-ray microscopy (STXM) is common. Such standards, however, can suffer from inhomogeneity in chemical composition and thickness and often require further calculations, based on sample mounting and detector geometry, to obtain quantitative results. These inhomogeneities negatively impact the reproducibility of the measurements and the quantitative measure itself. Utilizing Rutherford backscattering, x-ray reflectivity, quartz crystal microbalance, STXM, and SR-XRF, the authors show here that ALD is capable of producing high quality standards that are homogenous over scales ranging from nanometers to 100s of micrometers.},

  doi          = {10.1116/1.5025240},

  journal      = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},

  number       = 2,

  volume       = 36,

  place        = {United States},

  year         = {Fri Feb 23 00:00:00 EST 2018},

  month        = {Fri Feb 23 00:00:00 EST 2018}

}

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Figures / Tables:

Table 1: Precursor chemistries, dose time, purge time, and deposition temperature for all compounds measured. These parameters are for 2D standards unless otherwise noted.

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