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This content will become publicly available on February 23, 2019

Title: Tunable Antireflection Coating to Remove Index-Matching Requirement for Interference Lithography

Authors:
 [1] ; ORCiD logo [1]
  1. Department of Materials Science and Engineering, Frederick Seitz Materials Research Laboratory, and Beckman Institute for Advanced Science and Technology, University of Illinois at Urbana-Champaign, Urbana IL 61801 USA
Publication Date:
Grant/Contract Number:
SC0001293
Type:
Publisher's Accepted Manuscript
Journal Name:
Advanced Optical Materials
Additional Journal Information:
Journal Volume: 6; Journal Issue: 8; Related Information: CHORUS Timestamp: 2018-04-18 08:06:09; Journal ID: ISSN 2195-1071
Publisher:
Wiley Blackwell (John Wiley & Sons)
Sponsoring Org:
USDOE
Country of Publication:
Germany
Language:
English
OSTI Identifier:
1422426