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This content will become publicly available on February 23, 2019

Title: Tunable Antireflection Coating to Remove Index-Matching Requirement for Interference Lithography

Authors:
 [1] ; ORCiD logo [1]
  1. Department of Materials Science and Engineering, Frederick Seitz Materials Research Laboratory, and Beckman Institute for Advanced Science and Technology, University of Illinois at Urbana-Champaign, Urbana IL 61801 USA
Publication Date:
Grant/Contract Number:
SC0001293
Type:
Publisher's Accepted Manuscript
Journal Name:
Advanced Optical Materials
Additional Journal Information:
Journal Name: Advanced Optical Materials Journal Volume: 6 Journal Issue: 8; Journal ID: ISSN 2195-1071
Publisher:
Wiley Blackwell (John Wiley & Sons)
Sponsoring Org:
USDOE
Country of Publication:
Germany
Language:
English
OSTI Identifier:
1422426

Bacon-Brown, Daniel A., and Braun, Paul V.. Tunable Antireflection Coating to Remove Index-Matching Requirement for Interference Lithography. Germany: N. p., Web. doi:10.1002/adom.201701049.
Bacon-Brown, Daniel A., & Braun, Paul V.. Tunable Antireflection Coating to Remove Index-Matching Requirement for Interference Lithography. Germany. doi:10.1002/adom.201701049.
Bacon-Brown, Daniel A., and Braun, Paul V.. 2018. "Tunable Antireflection Coating to Remove Index-Matching Requirement for Interference Lithography". Germany. doi:10.1002/adom.201701049.
@article{osti_1422426,
title = {Tunable Antireflection Coating to Remove Index-Matching Requirement for Interference Lithography},
author = {Bacon-Brown, Daniel A. and Braun, Paul V.},
abstractNote = {},
doi = {10.1002/adom.201701049},
journal = {Advanced Optical Materials},
number = 8,
volume = 6,
place = {Germany},
year = {2018},
month = {2}
}

Works referenced in this record:

Fabrication of photonic crystals for the visible spectrum by holographic lithography
journal, March 2000
  • Campbell, M.; Sharp, D. N.; Harrison, M. T.
  • Nature, Vol. 404, Issue 6773, p. 53-56
  • DOI: 10.1038/35003523

Fabricating complex three-dimensional nanostructures with high-resolution conformable phase masks
journal, August 2004
  • Jeon, S.; Park, J.-U.; Cirelli, R.
  • Proceedings of the National Academy of Sciences, Vol. 101, Issue 34, p. 12428-12433
  • DOI: 10.1073/pnas.0403048101