Tunable Antireflection Coating to Remove Index-Matching Requirement for Interference Lithography
Abstract
Abstract Interference lithography is a flexible technique for creating 3D periodic nano‐ and microstructures that can be used to make a wide variety of crystal lattices, but as it is found, some lattices require index‐matched substrates to eliminate reflections at the photoresist–substrate interface. In this study a tunable‐refractive index quarter wavelength‐thickness polystyrene/poly(vinyl methyl ether) homopolymer blend backside antireflection coating, which alleviates this issue, is presented. The coating's refractive index can be tuned from 1.47 to 1.6, drastically reducing reflections at the photoresist–substrate interface for substrates with refractive indices as low as 1.35 for normal incidence and even lower for angled illumination. By injecting the light through the substrate and applying the antireflection layer to the top of the photoresist, interference lithography can even be performed on high refractive index substrates, such as indium tin oxide (ITO)‐coated glass. Fabrication of hexagonal, face‐centered cubic, and simple cubic lattices in SU‐8 photoresist (refractive index of 1.59) is demonstrated using 532 nm laser light on nonindex matched substrates including ITO‐coated glass and borosilicate glass, and the effects of reflection interference on the photonic bandstructure are investigated.
- Authors:
-
- Univ. of Illinois at Urbana-Champaign, IL (United States)
- Publication Date:
- Research Org.:
- Energy Frontier Research Centers (EFRC) (United States). Light-Material Interactions in Energy Conversion (LMI)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- OSTI Identifier:
- 1470418
- Alternate Identifier(s):
- OSTI ID: 1422426
- Grant/Contract Number:
- SC0001293; DE‐SC0001293
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Advanced Optical Materials
- Additional Journal Information:
- Journal Volume: 6; Journal Issue: 8; Related Information: LMI partners with California Institute of Technology (lead); Harvard University; University of Illinois, Urbana-Champaign; Lawrence Berkeley National Laboratory; Journal ID: ISSN 2195-1071
- Publisher:
- Wiley
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; solar (photovoltaic); solid state lighting, phonons; thermal conductivity; electrodes - solar, materials and chemistry by design; optics; synthesis (novel materials); synthesis (self-assembly)
Citation Formats
Bacon-Brown, Daniel A., and Braun, Paul V. Tunable Antireflection Coating to Remove Index-Matching Requirement for Interference Lithography. United States: N. p., 2018.
Web. doi:10.1002/adom.201701049.
Bacon-Brown, Daniel A., & Braun, Paul V. Tunable Antireflection Coating to Remove Index-Matching Requirement for Interference Lithography. United States. https://doi.org/10.1002/adom.201701049
Bacon-Brown, Daniel A., and Braun, Paul V. Fri .
"Tunable Antireflection Coating to Remove Index-Matching Requirement for Interference Lithography". United States. https://doi.org/10.1002/adom.201701049. https://www.osti.gov/servlets/purl/1470418.
@article{osti_1470418,
title = {Tunable Antireflection Coating to Remove Index-Matching Requirement for Interference Lithography},
author = {Bacon-Brown, Daniel A. and Braun, Paul V.},
abstractNote = {Abstract Interference lithography is a flexible technique for creating 3D periodic nano‐ and microstructures that can be used to make a wide variety of crystal lattices, but as it is found, some lattices require index‐matched substrates to eliminate reflections at the photoresist–substrate interface. In this study a tunable‐refractive index quarter wavelength‐thickness polystyrene/poly(vinyl methyl ether) homopolymer blend backside antireflection coating, which alleviates this issue, is presented. The coating's refractive index can be tuned from 1.47 to 1.6, drastically reducing reflections at the photoresist–substrate interface for substrates with refractive indices as low as 1.35 for normal incidence and even lower for angled illumination. By injecting the light through the substrate and applying the antireflection layer to the top of the photoresist, interference lithography can even be performed on high refractive index substrates, such as indium tin oxide (ITO)‐coated glass. Fabrication of hexagonal, face‐centered cubic, and simple cubic lattices in SU‐8 photoresist (refractive index of 1.59) is demonstrated using 532 nm laser light on nonindex matched substrates including ITO‐coated glass and borosilicate glass, and the effects of reflection interference on the photonic bandstructure are investigated.},
doi = {10.1002/adom.201701049},
journal = {Advanced Optical Materials},
number = 8,
volume = 6,
place = {United States},
year = {Fri Feb 23 00:00:00 EST 2018},
month = {Fri Feb 23 00:00:00 EST 2018}
}
Web of Science
Works referenced in this record:
Anti-reflective coatings: A critical, in-depth review
journal, January 2011
- Raut, Hemant Kumar; Ganesh, V. Anand; Nair, A. Sreekumaran
- Energy & Environmental Science, Vol. 4, Issue 10
Hierarchical nanostructures created by interference of high-order diffraction beams
journal, January 2016
- Jeon, Tae Yoon; Jeon, Hwan Chul; Yang, Seung-Man
- Journal of Materials Chemistry C, Vol. 4, Issue 5
Optical losses in porous silicon waveguides in the near-infrared: Effects of scattering
journal, November 2000
- Ferrand, P.; Romestain, R.
- Applied Physics Letters, Vol. 77, Issue 22
Three-dimensional face-centered-cubic photonic crystal templates by laser holography: fabrication, optical characterization, and band-structure calculations
journal, February 2003
- Miklyaev, Yu. V.; Meisel, D. C.; Blanco, A.
- Applied Physics Letters, Vol. 82, Issue 8
Density, Viscosity, Refractive Index, and Speed of Sound in Binary Mixtures of 2-Chloroethanol with Methyl Acetate, Ethyl Acetate, n -Propyl Acetate, and n -Butyl Acetate
journal, May 1999
- Aralaguppi, M. I.; Jadar, C. V.; Aminabhavi, T. M.
- Journal of Chemical & Engineering Data, Vol. 44, Issue 3
Use of ATR-FTIR to study interdiffusion in polystyrene and poly(vinyl methyl ether)
journal, April 1993
- Jabbari, Esmaiel; Peppas, Nicholas A.
- Macromolecules, Vol. 26, Issue 9
Three-Dimensional Continuous Conductive Nanostructure for Highly Sensitive and Stretchable Strain Sensor
journal, May 2017
- Cho, Donghwi; Park, Junyong; Kim, Jin
- ACS Applied Materials & Interfaces, Vol. 9, Issue 20
Rational Control of Diffraction and Interference from Conformal Phase Gratings: Toward High-Resolution 3D Nanopatterning
journal, September 2014
- Hyun, Jerome K.; Park, Junyong; Kim, Eunhye
- Advanced Optical Materials, Vol. 2, Issue 12
Single laser exposure fabrication of diamond-like 3-dimensional photonic crystal microstructures using circularly polarized light
journal, June 2008
- Chanda, Debashis; Abolghasemi, Ladan E.; Herman, Peter R.
- Applied Physics A, Vol. 93, Issue 1
Flexible Holographic Fabrication of 3D Photonic Crystal Templates with Polarization Control through a 3D Printed Reflective Optical Element
journal, July 2016
- Lowell, David; George, David; Lutkenhaus, Jeffrey
- Micromachines, Vol. 7, Issue 7
Controlled three-dimensional interconnected capillary structures for liquid repellency engineering
journal, January 2016
- Bong, Jihye; Ahn, Changui; Lim, Taekyung
- RSC Advances, Vol. 6, Issue 66
Design and holographic fabrication of tetragonal and cubic photonic crystals with phase mask: toward the mass-production of three-dimensional photonic crystals
journal, January 2005
- Lin, Y.; Herman, P. R.; Darmawikarta, K.
- Applied Physics Letters, Vol. 86, Issue 7
Diamond photonic band gap synthesis by umbrella holographic lithography
journal, September 2006
- Toader, Ovidiu; Chan, Timothy Y. M.; John, Sajeev
- Applied Physics Letters, Vol. 89, Issue 10
Solid immersion optical lithography: index matching and resonant reflectors for large exposure field, high-aspect ratio imaging in the ultrahigh-numerical aperture regime
journal, October 2015
- Lowrey, Sam; Blaikie, Richard
- Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 14, Issue 4
Dual applications of free-standing holographic nanopatterns for lift-off and stencil lithography
journal, November 2012
- Du, Ke; Liu, Yuyang; Wathuthanthri, Ishan
- Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 30, Issue 6
Holographic photonic crystals
journal, September 2004
- Crawford, Gregory P.
- Optical Engineering, Vol. 43, Issue 9
Conformal phase masks made of polyurethane acrylate with optimized elastic modulus for 3D nanopatterning
journal, January 2014
- Park, Junyong; Tahk, Dongha; Ahn, Changui
- Journal of Materials Chemistry C, Vol. 2, Issue 13
Large-area achromatic interferometric lithography for 100 nm period gratings and grids
journal, November 1996
- Savas, T. A.
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 14, Issue 6
Three-dimensional nanonetworks for giant stretchability in dielectrics and conductors
journal, January 2012
- Park, Junyong; Wang, Shuodao; Li, Ming
- Nature Communications, Vol. 3, Issue 1
Algebraic Representation of Thermodynamic Properties and the Classification of Solutions
journal, February 1948
- Redlich, Otto; Kister, A. T.
- Industrial & Engineering Chemistry, Vol. 40, Issue 2
Fabrication of Three-Dimensional Photonic Crystals Using Multibeam Interference Lithography and Electrodeposition
journal, August 2009
- Miyake, Masao; Chen, Ying-Chieh; Braun, Paul V.
- Advanced Materials, Vol. 21, Issue 29
Fabrication of photonic crystals for the visible spectrum by holographic lithography
journal, March 2000
- Campbell, M.; Sharp, D. N.; Harrison, M. T.
- Nature, Vol. 404, Issue 6773, p. 53-56
Fabricating complex three-dimensional nanostructures with high-resolution conformable phase masks
journal, August 2004
- Jeon, S.; Park, J.-U.; Cirelli, R.
- Proceedings of the National Academy of Sciences, Vol. 101, Issue 34, p. 12428-12433
Effect of shear flow on the phase-separation behavior in a blend of polystyrene and polyvinyl methyl ether
journal, March 2003
- Lei, Caihong; Li, Guangxian; Yang, Qi
- Journal of Polymer Science Part B: Polymer Physics, Vol. 41, Issue 7
Layered nano-gratings by electron beam writing to form 3-level diffractive optical elements for 3D phase-offset holographic lithography
journal, January 2015
- Yuan, Liang (Leon); Herman, Peter R.
- Nanoscale, Vol. 7, Issue 47
Monolithic Bi 1.5 Sb 0.5 Te 3 ternary alloys with a periodic 3D nanostructure for enhancing thermoelectric performance
journal, January 2017
- Hong, Seokkyoon; Park, Junyong; Jeon, Seong Gi
- Journal of Materials Chemistry C, Vol. 5, Issue 35
Metal-induced fluorescence properties of three-dimensionally ordered macroporous silver inverse opal platforms
journal, February 2016
- Chae, Weon-Sik; Lee, Myung-Jin; Kim, Kisun
- Applied Physics Letters, Vol. 108, Issue 7
3D Holographic Photonic Crystals Containing Embedded Functional Features
journal, June 2016
- Zhang, Runyu; Ning, Hailong; Krueger, Neil A.
- Advanced Optical Materials, Vol. 4, Issue 10
Monolithic 3D titania with ultrathin nanoshell structures for enhanced photocatalytic activity and recyclability
journal, January 2013
- Ahn, Changui; Park, Junyong; Kim, Donghyuk
- Nanoscale, Vol. 5, Issue 21
Holographic Fabrication of Designed Functional Defect Lines in Photonic Crystal Lattice Using a Spatial Light Modulator
journal, April 2016
- Lutkenhaus, Jeffrey; Lowell, David; George, David
- Micromachines, Vol. 7, Issue 4
The use of high aspect ratio photoresist (SU-8) for super-hydrophobic pattern prototyping
journal, July 2004
- Shirtcliffe, Neil J.; Aqil, Sanaa; Evans, Carl
- Journal of Micromechanics and Microengineering, Vol. 14, Issue 10
Optical activities of large-area SU8 microspirals fabricated by multibeam holographic lithography
journal, January 2014
- Wang, Xia; Gao, Wensheng; Hung, Jenny
- Applied Optics, Vol. 53, Issue 11
Direct Optical Fabrication of Fluorescent, Multilevel 3D Nanostructures for Highly Efficient Chemosensing Platforms
journal, August 2016
- Park, Junyong; Seo, Jangwon; Jung, Ho Kuk
- Advanced Functional Materials, Vol. 26, Issue 39
Interference lithography: a powerful tool for fabricating periodic structures
journal, May 2009
- Lu, C.; Lipson, R. H.
- Laser & Photonics Reviews, Vol. 4, Issue 4
Use of antireflective coatings in deep-UV lithography
conference, July 1991
- Sethi, Satyendra S.; Distasio, Romelia G.; Ziger, David H.
- Optical/Laser Microlithography IV, SPIE Proceedings
Standing-Wave-Assisted Creation of Nanopillar Arrays with Vertically Integrated Nanogaps for SERS-Active Substrates
journal, June 2015
- Jeon, Tae Yoon; Park, Sung-Gyu; Kim, Dong-Ho
- Advanced Functional Materials, Vol. 25, Issue 29
Kinetics of phase separation in polymer blends for deep quenches
journal, April 1986
- Voigt-Martin, I. G.; Leister, K. -H.; Rosenau, R.
- Journal of Polymer Science Part B: Polymer Physics, Vol. 24, Issue 4
Highly absorbing ARC for DUV lithography
conference, June 1996
- Pavelchek, Edward K.; Meador, James D.; Guerrero, Douglas J.
- SPIE's 1996 International Symposium on Microlithography, SPIE Proceedings
Holographically fabricated photonic crystals with large reflectance
journal, December 2007
- Chen, Y. C.; Geddes, J. B.; Lee, J. T.
- Applied Physics Letters, Vol. 91, Issue 24
Photonic crystals through holographic lithography: Simple cubic, diamond-like, and gyroid-like structures
journal, June 2004
- Ullal, Chaitanya K.; Maldovan, Martin; Thomas, Edwin L.
- Applied Physics Letters, Vol. 84, Issue 26
Stacked-Disk Nanotower Arrays for Use as Omniphobic Surface-Enhanced Raman Scattering Substrates
journal, August 2016
- Jeon, Tae Yoon; Kim, Ju Hyeon; Park, Sung-Gyu
- Advanced Optical Materials, Vol. 4, Issue 11
Holographic realization of hexagonal two dimensional photonic crystal structures with elliptical geometry
journal, September 2010
- Hung, Yung-Jr; Lee, San-Liang; Pan, Yen-Ting
- Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 28, Issue 5
Dispersion Properties of Optical Polymers
journal, October 2009
- Sultanova, N.; Kasarova, S.; Nikolov, I.
- Acta Physica Polonica A, Vol. 116, Issue 4
Shrinkage Precompensation of Holographic Three-Dimensional Photonic-Crystal Templates
journal, November 2006
- Meisel, D. C.; Diem, M.; Deubel, M.
- Advanced Materials, Vol. 18, Issue 22
Direct Fabrication of Hexagonally Ordered Ridged Nanoarchitectures via Dual Interference Lithography for Efficient Sensing Applications
journal, December 2013
- Jeon, Hwan Chul; Jeon, Tae Yoon; Shim, Tae Soup
- Small, Vol. 10, Issue 8
Anomalous patterned scattering spectra of one-dimensional porous silicon photonic crystals
journal, January 2010
- de la Mora, M. B.; del Río, J. A.; Nava, R.
- Optics Express, Vol. 18, Issue 22
Distortion of 3D SU8 photonic structures fabricated by four-beam holographic lithography withumbrella configuration
journal, January 2007
- Zhu, Xuelian; Xu, Yongan; Yang, Shu
- Optics Express, Vol. 15, Issue 25
All fourteen Bravais lattices can be formed by interference of four noncoplanar beams
journal, January 2002
- Cai, L. Z.; Yang, X. L.; Wang, Y. R.
- Optics Letters, Vol. 27, Issue 11
Rapid, High-Resolution 3D Interference Printing of Multilevel Ultralong Nanochannel Arrays for High-Throughput Nanofluidic Transport
journal, November 2015
- Park, Junyong; Kim, Kyung-Il; Kim, Kisun
- Advanced Materials, Vol. 27, Issue 48
Femtosecond laser writing of phase-tuned volume gratings for symmetry control in 3D photonic crystal holographic lithography
journal, January 2015
- Yuan, Liang; Ng, Mi Li; Herman, Peter R.
- Optical Materials Express, Vol. 5, Issue 3
Fabrication of a dense array of tall nanostructures over a large sample area with sidewall profile and tip sharpness control
journal, October 2006
- Choi, Chang-Hwan; Kim, Chang-Jin
- Nanotechnology, Vol. 17, Issue 21
Fabrication of Nanoshell-Based 3D Periodic Structures by Templating Process using Solution-derived ZnO
journal, June 2017
- Araki, Shinji; Ishikawa, Yasuaki; Wang, Xudongfang
- Nanoscale Research Letters, Vol. 12, Issue 1
Some Aspects Of Anti-Reflective Coating For Optical Lithography
conference, May 1984
- Lin, Yi-Ching; Marriott, Vic; Orvek, Kevin
- 1984 Microlithography Conferences, SPIE Proceedings
Simple Holographic Patterning for High-Aspect-Ratio Three-Dimensional Nanostructures with Large Coverage Area
journal, September 2012
- Wathuthanthri, Ishan; Liu, Yuyang; Du, Ke
- Advanced Functional Materials, Vol. 23, Issue 5
Three-dimensional face-centered-cubic photonic crystal templates by laser holography: fabrication, optical characterization, and band-structure calculations
text, January 2003
- Miklyaev, Y. V.; Meisel, D. C.; Blanco, A.
- Karlsruhe
Works referencing / citing this record:
Light to Shape the Future: From Photolithography to 4D Printing
journal, June 2019
- del Barrio, Jesús; Sánchez‐Somolinos, Carlos
- Advanced Optical Materials, Vol. 7, Issue 16
Metasurface-generated complex 3-dimensional optical fields for interference lithography
journal, October 2019
- Kamali, Seyedeh Mahsa; Arbabi, Ehsan; Kwon, Hyounghan
- Proceedings of the National Academy of Sciences, Vol. 116, Issue 43