skip to main content

DOE PAGESDOE PAGES

Title: Activation of the dimers and tetramers of metal amidinate atomic layer deposition precursors upon adsorption on silicon oxide surfaces

Authors:
 [1] ;  [2] ; ; ; ; ;  [2] ;  [1]
  1. Department of Chemistry, University of California, Riverside, California 92521
  2. Department of Chemistry and Biochemistry, University of Delaware, Newark, Delaware 19716
Publication Date:
Grant/Contract Number:
FG02-03ER46599
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films Journal Volume: 35 Journal Issue: 1; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1421264

Chen, Bo, Duan, Yichen, Yao, Yunxi, Ma, Qiang, Coyle, Jason P., Barry, Seán T., Teplyakov, Andrew V., and Zaera, Francisco. Activation of the dimers and tetramers of metal amidinate atomic layer deposition precursors upon adsorption on silicon oxide surfaces. United States: N. p., Web. doi:10.1116/1.4971990.
Chen, Bo, Duan, Yichen, Yao, Yunxi, Ma, Qiang, Coyle, Jason P., Barry, Seán T., Teplyakov, Andrew V., & Zaera, Francisco. Activation of the dimers and tetramers of metal amidinate atomic layer deposition precursors upon adsorption on silicon oxide surfaces. United States. doi:10.1116/1.4971990.
Chen, Bo, Duan, Yichen, Yao, Yunxi, Ma, Qiang, Coyle, Jason P., Barry, Seán T., Teplyakov, Andrew V., and Zaera, Francisco. 2017. "Activation of the dimers and tetramers of metal amidinate atomic layer deposition precursors upon adsorption on silicon oxide surfaces". United States. doi:10.1116/1.4971990.
@article{osti_1421264,
title = {Activation of the dimers and tetramers of metal amidinate atomic layer deposition precursors upon adsorption on silicon oxide surfaces},
author = {Chen, Bo and Duan, Yichen and Yao, Yunxi and Ma, Qiang and Coyle, Jason P. and Barry, Seán T. and Teplyakov, Andrew V. and Zaera, Francisco},
abstractNote = {},
doi = {10.1116/1.4971990},
journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
number = 1,
volume = 35,
place = {United States},
year = {2017},
month = {1}
}