He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching
Journal Article
·
· Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
- Department of Materials Science and Engineering, and Institute for Research in Electronics and Applied Physics, University of Maryland, College Park, Maryland 20740
- IBM T. J. Watson Research Center, Yorktown Heights, New York 10598
- Sponsoring Organization:
- USDOE
- Grant/Contract Number:
- SC0001939
- OSTI ID:
- 1421255
- Journal Information:
- Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Journal Name: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena Vol. 34 Journal Issue: 4; ISSN 2166-2746
- Publisher:
- American Vacuum SocietyCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Cited by: 5 works
Citation information provided by
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Web of Science
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