He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching
- Authors:
-
- Department of Materials Science and Engineering, and Institute for Research in Electronics and Applied Physics, University of Maryland, College Park, Maryland 20740
- IBM T. J. Watson Research Center, Yorktown Heights, New York 10598
- Publication Date:
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1421255
- Grant/Contract Number:
- SC0001939
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
- Additional Journal Information:
- Journal Name: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena Journal Volume: 34 Journal Issue: 4; Journal ID: ISSN 2166-2746
- Publisher:
- American Vacuum Society
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Metzler, Dominik, Weilnboeck, Florian, Engelmann, Sebastian, Bruce, Robert L., and Oehrlein, Gottlieb S. He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching. United States: N. p., 2016.
Web. doi:10.1116/1.4949274.
Metzler, Dominik, Weilnboeck, Florian, Engelmann, Sebastian, Bruce, Robert L., & Oehrlein, Gottlieb S. He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching. United States. https://doi.org/10.1116/1.4949274
Metzler, Dominik, Weilnboeck, Florian, Engelmann, Sebastian, Bruce, Robert L., and Oehrlein, Gottlieb S. Wed .
"He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching". United States. https://doi.org/10.1116/1.4949274.
@article{osti_1421255,
title = {He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching},
author = {Metzler, Dominik and Weilnboeck, Florian and Engelmann, Sebastian and Bruce, Robert L. and Oehrlein, Gottlieb S.},
abstractNote = {},
doi = {10.1116/1.4949274},
journal = {Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena},
number = 4,
volume = 34,
place = {United States},
year = {Wed May 11 00:00:00 EDT 2016},
month = {Wed May 11 00:00:00 EDT 2016}
}
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1116/1.4949274
https://doi.org/10.1116/1.4949274
Other availability
Cited by: 5 works
Citation information provided by
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