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Title: He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching

Authors:
 [1];  [1];  [2];  [2];  [1]
  1. Department of Materials Science and Engineering, and Institute for Research in Electronics and Applied Physics, University of Maryland, College Park, Maryland 20740
  2. IBM T. J. Watson Research Center, Yorktown Heights, New York 10598
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1421255
Grant/Contract Number:  
SC0001939
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Additional Journal Information:
Journal Name: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena Journal Volume: 34 Journal Issue: 4; Journal ID: ISSN 2166-2746
Publisher:
American Vacuum Society
Country of Publication:
United States
Language:
English

Citation Formats

Metzler, Dominik, Weilnboeck, Florian, Engelmann, Sebastian, Bruce, Robert L., and Oehrlein, Gottlieb S. He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching. United States: N. p., 2016. Web. doi:10.1116/1.4949274.
Metzler, Dominik, Weilnboeck, Florian, Engelmann, Sebastian, Bruce, Robert L., & Oehrlein, Gottlieb S. He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching. United States. doi:10.1116/1.4949274.
Metzler, Dominik, Weilnboeck, Florian, Engelmann, Sebastian, Bruce, Robert L., and Oehrlein, Gottlieb S. Wed . "He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching". United States. doi:10.1116/1.4949274.
@article{osti_1421255,
title = {He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching},
author = {Metzler, Dominik and Weilnboeck, Florian and Engelmann, Sebastian and Bruce, Robert L. and Oehrlein, Gottlieb S.},
abstractNote = {},
doi = {10.1116/1.4949274},
journal = {Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena},
number = 4,
volume = 34,
place = {United States},
year = {2016},
month = {5}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1116/1.4949274

Citation Metrics:
Cited by: 1 work
Citation information provided by
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