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Title: Invited Article: Progress in coherent lithography using table-top extreme ultraviolet lasers

Abstract

Compact (table top) lasers emitting at wavelengths below 50 nm had expanded the spectrum of applications in the extreme ultraviolet (EUV). Among them, the high-flux, highly coherent laser sources enabled lithographic approaches with distinctive characteristics. In this review, we will describe the implementation of a compact EUV lithography system capable of printing features with sub-50 nm resolution using Talbot imaging. This compact system is capable of producing consistent defect-free samples in a reliable and effective manner. Examples of different patterns and structures fabricated with this method will be presented.

Authors:
; ;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1421254
Grant/Contract Number:  
AC02-98CH10886
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Review of Scientific Instruments
Additional Journal Information:
Journal Name: Review of Scientific Instruments Journal Volume: 86 Journal Issue: 12; Journal ID: ISSN 0034-6748
Publisher:
American Institute of Physics
Country of Publication:
United States
Language:
English

Citation Formats

Li, W., Urbanski, L., and Marconi, M. C. Invited Article: Progress in coherent lithography using table-top extreme ultraviolet lasers. United States: N. p., 2015. Web. doi:10.1063/1.4937899.
Li, W., Urbanski, L., & Marconi, M. C. Invited Article: Progress in coherent lithography using table-top extreme ultraviolet lasers. United States. https://doi.org/10.1063/1.4937899
Li, W., Urbanski, L., and Marconi, M. C. Mon . "Invited Article: Progress in coherent lithography using table-top extreme ultraviolet lasers". United States. https://doi.org/10.1063/1.4937899.
@article{osti_1421254,
title = {Invited Article: Progress in coherent lithography using table-top extreme ultraviolet lasers},
author = {Li, W. and Urbanski, L. and Marconi, M. C.},
abstractNote = {Compact (table top) lasers emitting at wavelengths below 50 nm had expanded the spectrum of applications in the extreme ultraviolet (EUV). Among them, the high-flux, highly coherent laser sources enabled lithographic approaches with distinctive characteristics. In this review, we will describe the implementation of a compact EUV lithography system capable of printing features with sub-50 nm resolution using Talbot imaging. This compact system is capable of producing consistent defect-free samples in a reliable and effective manner. Examples of different patterns and structures fabricated with this method will be presented.},
doi = {10.1063/1.4937899},
journal = {Review of Scientific Instruments},
number = 12,
volume = 86,
place = {United States},
year = {2015},
month = {12}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1063/1.4937899

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Cited by: 7 works
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