Electron energy distributions and electron impact source functions in Ar/N2 inductively coupled plasmas using pulsed power
Abstract
In plasma materials processing, such as plasma etching, control of the time-averaged electron energy distributions (EEDs) in the plasma allows for control of the time-averaged electron impact source functions of reactive species in the plasma and their fluxes to surfaces. One potential method for refining the control of EEDs is through the use of pulsed power. Inductively coupled plasmas (ICPs) are attractive for using pulsed power in this manner because the EEDs are dominantly controlled by the ICP power as opposed to the bias power applied to the substrate. In this paper, we discuss results from a computational investigation of EEDs and electron impact source functions in low pressure (5–50 mTorr) ICPs sustained in Ar/N2 for various duty cycles. We find there is an ability to control EEDs, and thus source functions, by pulsing the ICP power, with the greatest variability of the EEDs located within the skin depth of the electromagnetic field. The transit time of hot electrons produced in the skin depth at the onset of pulse power produces a delay in the response of the EEDs as a function of distance from the coils. The choice of ICP pressure has a large impact on the dynamics ofmore »
- Publication Date:
- Sponsoring Org.:
- USDOE Office of Science (SC), Fusion Energy Sciences (FES)
- OSTI Identifier:
- 1421247
- Grant/Contract Number:
- SC0001319
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Journal of Applied Physics
- Additional Journal Information:
- Journal Name: Journal of Applied Physics Journal Volume: 117 Journal Issue: 4; Journal ID: ISSN 0021-8979
- Publisher:
- American Institute of Physics
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Logue, Michael D., and Kushner, Mark J. Electron energy distributions and electron impact source functions in Ar/N2 inductively coupled plasmas using pulsed power. United States: N. p., 2015.
Web. doi:10.1063/1.4904935.
Logue, Michael D., & Kushner, Mark J. Electron energy distributions and electron impact source functions in Ar/N2 inductively coupled plasmas using pulsed power. United States. https://doi.org/10.1063/1.4904935
Logue, Michael D., and Kushner, Mark J. Thu .
"Electron energy distributions and electron impact source functions in Ar/N2 inductively coupled plasmas using pulsed power". United States. https://doi.org/10.1063/1.4904935.
@article{osti_1421247,
title = {Electron energy distributions and electron impact source functions in Ar/N2 inductively coupled plasmas using pulsed power},
author = {Logue, Michael D. and Kushner, Mark J.},
abstractNote = {In plasma materials processing, such as plasma etching, control of the time-averaged electron energy distributions (EEDs) in the plasma allows for control of the time-averaged electron impact source functions of reactive species in the plasma and their fluxes to surfaces. One potential method for refining the control of EEDs is through the use of pulsed power. Inductively coupled plasmas (ICPs) are attractive for using pulsed power in this manner because the EEDs are dominantly controlled by the ICP power as opposed to the bias power applied to the substrate. In this paper, we discuss results from a computational investigation of EEDs and electron impact source functions in low pressure (5–50 mTorr) ICPs sustained in Ar/N2 for various duty cycles. We find there is an ability to control EEDs, and thus source functions, by pulsing the ICP power, with the greatest variability of the EEDs located within the skin depth of the electromagnetic field. The transit time of hot electrons produced in the skin depth at the onset of pulse power produces a delay in the response of the EEDs as a function of distance from the coils. The choice of ICP pressure has a large impact on the dynamics of the EEDs, whereas duty cycle has a small influence on time-averaged EEDs and source functions.},
doi = {10.1063/1.4904935},
journal = {Journal of Applied Physics},
number = 4,
volume = 117,
place = {United States},
year = {Thu Jan 22 00:00:00 EST 2015},
month = {Thu Jan 22 00:00:00 EST 2015}
}
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