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Title: Optimization of a chlorine-based deep vertical etch of GaN demonstrating low damage and low roughness

Authors:
 [1];  [1];  [1];  [1];  [1];  [1];  [1];  [1]
  1. Electrical and Computer Engineering Department, UC Santa Barbara, Santa Barbara, California 93106
Publication Date:
Sponsoring Org.:
USDOE Advanced Research Projects Agency - Energy (ARPA-E)
OSTI Identifier:
1421145
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology A
Additional Journal Information:
Journal Name: Journal of Vacuum Science and Technology A Journal Volume: 34 Journal Issue: 3; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Country of Publication:
United States
Language:
English

Citation Formats

Tahhan, Maher, Nedy, Joseph, Chan, Silvia H., Lund, Cory, Li, Haoran, Gupta, Geetak, Keller, Stacia, and Mishra, Umesh. Optimization of a chlorine-based deep vertical etch of GaN demonstrating low damage and low roughness. United States: N. p., 2016. Web. doi:10.1116/1.4944054.
Tahhan, Maher, Nedy, Joseph, Chan, Silvia H., Lund, Cory, Li, Haoran, Gupta, Geetak, Keller, Stacia, & Mishra, Umesh. Optimization of a chlorine-based deep vertical etch of GaN demonstrating low damage and low roughness. United States. doi:10.1116/1.4944054.
Tahhan, Maher, Nedy, Joseph, Chan, Silvia H., Lund, Cory, Li, Haoran, Gupta, Geetak, Keller, Stacia, and Mishra, Umesh. Sun . "Optimization of a chlorine-based deep vertical etch of GaN demonstrating low damage and low roughness". United States. doi:10.1116/1.4944054.
@article{osti_1421145,
title = {Optimization of a chlorine-based deep vertical etch of GaN demonstrating low damage and low roughness},
author = {Tahhan, Maher and Nedy, Joseph and Chan, Silvia H. and Lund, Cory and Li, Haoran and Gupta, Geetak and Keller, Stacia and Mishra, Umesh},
abstractNote = {},
doi = {10.1116/1.4944054},
journal = {Journal of Vacuum Science and Technology A},
number = 3,
volume = 34,
place = {United States},
year = {2016},
month = {5}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1116/1.4944054

Citation Metrics:
Cited by: 5 works
Citation information provided by
Web of Science

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