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This content will become publicly available on November 20, 2018

Title: Study of shot noise in photoresists for extreme ultraviolet lithography through comparative analysis of line edge roughness in electron beam and extreme ultraviolet lithography

Authors:
 [1] ;  [1] ;  [2]
  1. Department of Electrical Engineering and Computer Sciences, UC Berkeley, Berkeley, California 94720
  2. Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, California 94720
Publication Date:
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology. B, Nanotechnology and Microelectronics
Additional Journal Information:
Journal Volume: 35; Journal Issue: 6; Related Information: CHORUS Timestamp: 2018-02-14 21:13:48; Journal ID: ISSN 2166-2746
Publisher:
American Vacuum Society
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1421080